JPH0142627B2 - - Google Patents

Info

Publication number
JPH0142627B2
JPH0142627B2 JP9217683A JP9217683A JPH0142627B2 JP H0142627 B2 JPH0142627 B2 JP H0142627B2 JP 9217683 A JP9217683 A JP 9217683A JP 9217683 A JP9217683 A JP 9217683A JP H0142627 B2 JPH0142627 B2 JP H0142627B2
Authority
JP
Japan
Prior art keywords
level
surface treatment
target level
detection
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9217683A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59215727A (ja
Inventor
Nobutoshi Ookami
Masaru Kitagawa
Hisao Nishizawa
Masakazu Saida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Screen Manufacturing Co Ltd filed Critical Dainippon Screen Manufacturing Co Ltd
Priority to JP58092176A priority Critical patent/JPS59215727A/ja
Priority to US06/611,420 priority patent/US4569717A/en
Publication of JPS59215727A publication Critical patent/JPS59215727A/ja
Publication of JPH0142627B2 publication Critical patent/JPH0142627B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
JP58092176A 1983-05-24 1983-05-24 表面処理方法 Granted JPS59215727A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58092176A JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法
US06/611,420 US4569717A (en) 1983-05-24 1984-05-17 Method of surface treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58092176A JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法

Publications (2)

Publication Number Publication Date
JPS59215727A JPS59215727A (ja) 1984-12-05
JPH0142627B2 true JPH0142627B2 (enrdf_load_stackoverflow) 1989-09-13

Family

ID=14047119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58092176A Granted JPS59215727A (ja) 1983-05-24 1983-05-24 表面処理方法

Country Status (1)

Country Link
JP (1) JPS59215727A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS59215727A (ja) 1984-12-05

Similar Documents

Publication Publication Date Title
US4569717A (en) Method of surface treatment
GB2121167A (en) Detection of end point in thin film etching
US4660979A (en) Method and apparatus for automatically measuring semiconductor etching process parameters
JPH032546A (ja) 異物検査装置
US4179622A (en) Method and system for in situ control of material removal processes
JPH0142627B2 (enrdf_load_stackoverflow)
JPS6240701B2 (enrdf_load_stackoverflow)
JPH0142628B2 (enrdf_load_stackoverflow)
JPS6240702B2 (enrdf_load_stackoverflow)
JPS6216523A (ja) レジストパタ−ンの現像方法および現像装置
JPH0322531A (ja) 現像方法および現像装置
JPS5650515A (en) Endpoint detecting method
JPH0239520A (ja) レジスト膜厚の測定方法
KR100931298B1 (ko) 현상 공정 조건 설정 유닛 및 방법, 그리고 기판 처리 장치
JPS56146138A (en) Method and apparatus for exposing photomask
JPS63104331A (ja) 現像処理方法
JPS59144134A (ja) フオトマスクエツチング終点判定装置
JPS5870530A (ja) レジストパタ−ン形成方法
JPS62193247A (ja) 現像終点決定方法
JPS5861277A (ja) 金属薄膜の化学エツチング方法
JPH06104216A (ja) 金属膜エッチング工法
JPH0722382A (ja) エッチングモニタ方法
JPS62183523A (ja) 現像装置
JPH05267424A (ja) 熱処理効果の測定方法
JPH02233177A (ja) 塗布装置