JPS59207811A - 層はく離性の改善された窒化ホウ素組成物 - Google Patents

層はく離性の改善された窒化ホウ素組成物

Info

Publication number
JPS59207811A
JPS59207811A JP58080061A JP8006183A JPS59207811A JP S59207811 A JPS59207811 A JP S59207811A JP 58080061 A JP58080061 A JP 58080061A JP 8006183 A JP8006183 A JP 8006183A JP S59207811 A JPS59207811 A JP S59207811A
Authority
JP
Japan
Prior art keywords
boron nitride
nitride
properties
sample
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58080061A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0310562B2 (enrdf_load_stackoverflow
Inventor
Hiroyuki Nakae
中江　博之
Toshiaki Matsuda
松田　敏紹
Naoki Uno
直樹 宇野
Yukio Matsunami
松波　幸男
Takeshi Masumoto
健 増本
Toshio Hirai
平井　敏雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Research Development Corp of Japan
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan, Shingijutsu Kaihatsu Jigyodan filed Critical Research Development Corp of Japan
Priority to JP58080061A priority Critical patent/JPS59207811A/ja
Publication of JPS59207811A publication Critical patent/JPS59207811A/ja
Publication of JPH0310562B2 publication Critical patent/JPH0310562B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)
  • Chemical Vapour Deposition (AREA)
JP58080061A 1983-05-10 1983-05-10 層はく離性の改善された窒化ホウ素組成物 Granted JPS59207811A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58080061A JPS59207811A (ja) 1983-05-10 1983-05-10 層はく離性の改善された窒化ホウ素組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58080061A JPS59207811A (ja) 1983-05-10 1983-05-10 層はく離性の改善された窒化ホウ素組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP16152584A Division JPS60155508A (ja) 1984-08-02 1984-08-02 耐湿性にすぐれた透明性非晶質窒化ホウ素組成物

Publications (2)

Publication Number Publication Date
JPS59207811A true JPS59207811A (ja) 1984-11-26
JPH0310562B2 JPH0310562B2 (enrdf_load_stackoverflow) 1991-02-14

Family

ID=13707712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58080061A Granted JPS59207811A (ja) 1983-05-10 1983-05-10 層はく離性の改善された窒化ホウ素組成物

Country Status (1)

Country Link
JP (1) JPS59207811A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62108718A (ja) * 1985-11-07 1987-05-20 Denki Kagaku Kogyo Kk 立方晶窒化ほう素焼結体の製造方法
US7238997B2 (en) 2005-02-07 2007-07-03 Kabushiki Kaisha Toshiba Semiconductor device and method of manufacturing the same
US20140340172A1 (en) * 2013-05-17 2014-11-20 Avago Technologies General Ip (Singapore) Pte. Ltd. Bulk acoustic wave resonator comprising a boron nitride piezoelectric layer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145665A (ja) * 1982-02-24 1983-08-30 平井　敏雄 透光性Ｓｉ―Ｎ―Ｂ系非晶質材料およびその製造方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58145665A (ja) * 1982-02-24 1983-08-30 平井　敏雄 透光性Ｓｉ―Ｎ―Ｂ系非晶質材料およびその製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62108718A (ja) * 1985-11-07 1987-05-20 Denki Kagaku Kogyo Kk 立方晶窒化ほう素焼結体の製造方法
US7238997B2 (en) 2005-02-07 2007-07-03 Kabushiki Kaisha Toshiba Semiconductor device and method of manufacturing the same
US20140340172A1 (en) * 2013-05-17 2014-11-20 Avago Technologies General Ip (Singapore) Pte. Ltd. Bulk acoustic wave resonator comprising a boron nitride piezoelectric layer
US9088265B2 (en) * 2013-05-17 2015-07-21 Avago Technologies General Ip (Singapore) Pte. Ltd. Bulk acoustic wave resonator comprising a boron nitride piezoelectric layer

Also Published As

Publication number Publication date
JPH0310562B2 (enrdf_load_stackoverflow) 1991-02-14

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