JPS59195829A - レジストパタ−ン形成方法及びレジスト処理装置 - Google Patents

レジストパタ−ン形成方法及びレジスト処理装置

Info

Publication number
JPS59195829A
JPS59195829A JP58070433A JP7043383A JPS59195829A JP S59195829 A JPS59195829 A JP S59195829A JP 58070433 A JP58070433 A JP 58070433A JP 7043383 A JP7043383 A JP 7043383A JP S59195829 A JPS59195829 A JP S59195829A
Authority
JP
Japan
Prior art keywords
resist
substrate
cooling
baking
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58070433A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0464171B2 (OSRAM
Inventor
Kei Kirita
桐田　慶
Yoshihide Kato
加藤　芳秀
Toshiaki Shinozaki
篠崎　俊昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58070433A priority Critical patent/JPS59195829A/ja
Publication of JPS59195829A publication Critical patent/JPS59195829A/ja
Publication of JPH0464171B2 publication Critical patent/JPH0464171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58070433A 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置 Granted JPS59195829A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58070433A JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070433A JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Publications (2)

Publication Number Publication Date
JPS59195829A true JPS59195829A (ja) 1984-11-07
JPH0464171B2 JPH0464171B2 (OSRAM) 1992-10-14

Family

ID=13431337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070433A Granted JPS59195829A (ja) 1983-04-21 1983-04-21 レジストパタ−ン形成方法及びレジスト処理装置

Country Status (1)

Country Link
JP (1) JPS59195829A (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333809A (ja) * 1993-05-20 1994-12-02 Toshiba Corp レジスト感度調整装置および方法
JP2011248381A (ja) * 2011-08-29 2011-12-08 Asahikogyosha Co Ltd ガラス基板温調用ノズル構造
JP2012027047A (ja) * 2010-05-21 2012-02-09 Asahi Kogyosha Co Ltd ガラス基板温調用ノズル構造

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948925A (ja) * 1982-09-14 1984-03-21 Dainippon Screen Mfg Co Ltd 加熱乾燥した薬液塗布用基板の冷却方法及び装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948925A (ja) * 1982-09-14 1984-03-21 Dainippon Screen Mfg Co Ltd 加熱乾燥した薬液塗布用基板の冷却方法及び装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333809A (ja) * 1993-05-20 1994-12-02 Toshiba Corp レジスト感度調整装置および方法
JP2012027047A (ja) * 2010-05-21 2012-02-09 Asahi Kogyosha Co Ltd ガラス基板温調用ノズル構造
JP2011248381A (ja) * 2011-08-29 2011-12-08 Asahikogyosha Co Ltd ガラス基板温調用ノズル構造

Also Published As

Publication number Publication date
JPH0464171B2 (OSRAM) 1992-10-14

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