JPS59195644A - 露光マスク洗浄装置 - Google Patents
露光マスク洗浄装置Info
- Publication number
- JPS59195644A JPS59195644A JP58070493A JP7049383A JPS59195644A JP S59195644 A JPS59195644 A JP S59195644A JP 58070493 A JP58070493 A JP 58070493A JP 7049383 A JP7049383 A JP 7049383A JP S59195644 A JPS59195644 A JP S59195644A
- Authority
- JP
- Japan
- Prior art keywords
- exposure mask
- mask
- washing
- cleaning
- defect detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005406 washing Methods 0.000 title abstract 6
- 230000007547 defect Effects 0.000 claims abstract description 36
- 239000000428 dust Substances 0.000 claims abstract description 14
- 238000004140 cleaning Methods 0.000 claims description 32
- 238000003860 storage Methods 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 5
- 238000001514 detection method Methods 0.000 abstract description 15
- 239000004065 semiconductor Substances 0.000 abstract description 9
- 238000007689 inspection Methods 0.000 abstract description 7
- 238000011282 treatment Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070493A JPS59195644A (ja) | 1983-04-21 | 1983-04-21 | 露光マスク洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58070493A JPS59195644A (ja) | 1983-04-21 | 1983-04-21 | 露光マスク洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59195644A true JPS59195644A (ja) | 1984-11-06 |
| JPH045978B2 JPH045978B2 (enExample) | 1992-02-04 |
Family
ID=13433097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58070493A Granted JPS59195644A (ja) | 1983-04-21 | 1983-04-21 | 露光マスク洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59195644A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6373628A (ja) * | 1986-09-17 | 1988-04-04 | Dainippon Screen Mfg Co Ltd | 洗浄乾燥処理方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5027181A (enExample) * | 1973-07-14 | 1975-03-20 | ||
| JPS55102233A (en) * | 1979-01-30 | 1980-08-05 | Matsushita Electric Ind Co Ltd | Removing method of dust |
-
1983
- 1983-04-21 JP JP58070493A patent/JPS59195644A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5027181A (enExample) * | 1973-07-14 | 1975-03-20 | ||
| JPS55102233A (en) * | 1979-01-30 | 1980-08-05 | Matsushita Electric Ind Co Ltd | Removing method of dust |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6373628A (ja) * | 1986-09-17 | 1988-04-04 | Dainippon Screen Mfg Co Ltd | 洗浄乾燥処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH045978B2 (enExample) | 1992-02-04 |
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