JPS59195640A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS59195640A
JPS59195640A JP7072683A JP7072683A JPS59195640A JP S59195640 A JPS59195640 A JP S59195640A JP 7072683 A JP7072683 A JP 7072683A JP 7072683 A JP7072683 A JP 7072683A JP S59195640 A JPS59195640 A JP S59195640A
Authority
JP
Japan
Prior art keywords
methoxyacetophenone
photosensitive composition
azidobenzal
compound
aqueous solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7072683A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0259975B2 (enrdf_load_html_response
Inventor
Shigeru Koibuchi
滋 鯉渕
Asao Isobe
磯部　麻郎
Daisuke Makino
大輔 牧野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP7072683A priority Critical patent/JPS59195640A/ja
Priority to DE3415033A priority patent/DE3415033C2/de
Publication of JPS59195640A publication Critical patent/JPS59195640A/ja
Priority to US06/886,353 priority patent/US4698291A/en
Publication of JPH0259975B2 publication Critical patent/JPH0259975B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP7072683A 1983-04-20 1983-04-21 感光性組成物 Granted JPS59195640A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP7072683A JPS59195640A (ja) 1983-04-21 1983-04-21 感光性組成物
DE3415033A DE3415033C2 (de) 1983-04-20 1984-04-19 4'-Azidobenzal-2-methoxyacetophenon, Verfahren zu seiner Herstellung und dieses enthaltende photoempfindliche Masse
US06/886,353 US4698291A (en) 1983-04-20 1986-07-17 Photosensitive composition with 4-azido-2'-methoxychalcone

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7072683A JPS59195640A (ja) 1983-04-21 1983-04-21 感光性組成物

Publications (2)

Publication Number Publication Date
JPS59195640A true JPS59195640A (ja) 1984-11-06
JPH0259975B2 JPH0259975B2 (enrdf_load_html_response) 1990-12-14

Family

ID=13439832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7072683A Granted JPS59195640A (ja) 1983-04-20 1983-04-21 感光性組成物

Country Status (1)

Country Link
JP (1) JPS59195640A (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPH0259975B2 (enrdf_load_html_response) 1990-12-14

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