JPS5918673Y2 - 半導体装置用熱処理炉 - Google Patents
半導体装置用熱処理炉Info
- Publication number
- JPS5918673Y2 JPS5918673Y2 JP1977083000U JP8300077U JPS5918673Y2 JP S5918673 Y2 JPS5918673 Y2 JP S5918673Y2 JP 1977083000 U JP1977083000 U JP 1977083000U JP 8300077 U JP8300077 U JP 8300077U JP S5918673 Y2 JPS5918673 Y2 JP S5918673Y2
- Authority
- JP
- Japan
- Prior art keywords
- core tube
- heat treatment
- semiconductor devices
- furnace
- treatment furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Furnace Details (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977083000U JPS5918673Y2 (ja) | 1977-06-23 | 1977-06-23 | 半導体装置用熱処理炉 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977083000U JPS5918673Y2 (ja) | 1977-06-23 | 1977-06-23 | 半導体装置用熱処理炉 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS549666U JPS549666U (enrdf_load_stackoverflow) | 1979-01-22 |
| JPS5918673Y2 true JPS5918673Y2 (ja) | 1984-05-30 |
Family
ID=29004377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1977083000U Expired JPS5918673Y2 (ja) | 1977-06-23 | 1977-06-23 | 半導体装置用熱処理炉 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5918673Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5824436Y2 (ja) * | 1978-08-24 | 1983-05-25 | 九州日本電気株式会社 | 半導体基板熱処理用ボ−ト |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS50159252A (enrdf_load_stackoverflow) * | 1974-06-12 | 1975-12-23 |
-
1977
- 1977-06-23 JP JP1977083000U patent/JPS5918673Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS549666U (enrdf_load_stackoverflow) | 1979-01-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3125199B2 (ja) | 縦型熱処理装置 | |
| KR100395996B1 (ko) | 열처리방법 | |
| US5431561A (en) | Method and apparatus for heat treating | |
| JPH11176822A (ja) | 半導体処理装置 | |
| JP2003324045A (ja) | 熱処理装置 | |
| US20050112907A1 (en) | Gas-assisted rapid thermal processing | |
| US5500388A (en) | Heat treatment process for wafers | |
| JPS5918673Y2 (ja) | 半導体装置用熱処理炉 | |
| TWI548016B (zh) | A substrate stage, a substrate processing apparatus, and a semiconductor device | |
| JP2000133606A (ja) | 半導体装置の製造方法 | |
| TW200407946A (en) | Forced convection assisted rapid thermal furnace | |
| JPS6095917A (ja) | 熱処理炉 | |
| JP4070832B2 (ja) | 半導体製造装置 | |
| US6091889A (en) | Rapid thermal processor for heating a substrate | |
| JP2001257167A (ja) | 半導体製造装置 | |
| JP2001156011A (ja) | 半導体ウェーハ熱処理装置 | |
| JPH06216056A (ja) | 縦型炉 | |
| JPH0799164A (ja) | 熱処理装置及び熱処理方法 | |
| JP3118760B2 (ja) | 熱処理装置 | |
| WO2001082342A1 (en) | Gas assisted rapid thermal annealing | |
| JP2007059606A (ja) | 縦型ウエハボート及び縦型熱処理炉 | |
| JPH0917739A (ja) | 半導体装置の製造方法 | |
| JPH0794435A (ja) | 拡散装置 | |
| JPS6223085Y2 (enrdf_load_stackoverflow) | ||
| JPH02909Y2 (enrdf_load_stackoverflow) |