JPS59177365A - 蒸発方法とその装置 - Google Patents

蒸発方法とその装置

Info

Publication number
JPS59177365A
JPS59177365A JP58049849A JP4984983A JPS59177365A JP S59177365 A JPS59177365 A JP S59177365A JP 58049849 A JP58049849 A JP 58049849A JP 4984983 A JP4984983 A JP 4984983A JP S59177365 A JPS59177365 A JP S59177365A
Authority
JP
Japan
Prior art keywords
evaporation
endless belt
vapor deposition
belt
org
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58049849A
Other languages
English (en)
Japanese (ja)
Other versions
JPH055894B2 (forum.php
Inventor
Koichi Shinohara
紘一 篠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58049849A priority Critical patent/JPS59177365A/ja
Publication of JPS59177365A publication Critical patent/JPS59177365A/ja
Publication of JPH055894B2 publication Critical patent/JPH055894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Physical Vapour Deposition (AREA)
JP58049849A 1983-03-24 1983-03-24 蒸発方法とその装置 Granted JPS59177365A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58049849A JPS59177365A (ja) 1983-03-24 1983-03-24 蒸発方法とその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58049849A JPS59177365A (ja) 1983-03-24 1983-03-24 蒸発方法とその装置

Publications (2)

Publication Number Publication Date
JPS59177365A true JPS59177365A (ja) 1984-10-08
JPH055894B2 JPH055894B2 (forum.php) 1993-01-25

Family

ID=12842503

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58049849A Granted JPS59177365A (ja) 1983-03-24 1983-03-24 蒸発方法とその装置

Country Status (1)

Country Link
JP (1) JPS59177365A (forum.php)

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62290862A (ja) * 1986-06-09 1987-12-17 Fuji Xerox Co Ltd 真空蒸着法
JPS62290863A (ja) * 1986-06-09 1987-12-17 Fuji Xerox Co Ltd 真空蒸着用蒸発方法
WO1987007848A1 (en) * 1986-06-23 1987-12-30 Spectrum Control, Inc. Flash evaporation of monomer fluids
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5811156A (en) * 1997-01-24 1998-09-22 Eastman Kodak Company Method of making a color filter array by colorant transfer and etch
US6291031B1 (en) * 1998-01-27 2001-09-18 Matsushita Electric Industrial Co., Ltd. Method for preparing optical recording medium and preparation apparatus therefor
WO2003085157A1 (en) * 2002-04-05 2003-10-16 Matsushita Electric Industrial Co., Ltd. Method and apparatus for preparing thin resin film
KR100639935B1 (ko) * 1999-01-14 2006-10-31 어플라이드 매터리얼스 게엠베하 운트 컴퍼니 카게 띠형 기판의 가스처리 장치
JP2007070687A (ja) * 2005-09-06 2007-03-22 Semiconductor Energy Lab Co Ltd 成膜装置
US7195848B2 (en) 2004-08-30 2007-03-27 Eastman Kodak Company Method of making inlaid color filter arrays
JP2007224394A (ja) * 2006-02-27 2007-09-06 Hitachi Zosen Corp 蒸着材料の蒸発方法および蒸発装置ならびに真空蒸着装置
WO2012121237A1 (ja) * 2011-03-09 2012-09-13 コニカミノルタホールディングス株式会社 蒸着装置及び薄膜形成方法
KR101239808B1 (ko) 2011-04-07 2013-03-06 순천향대학교 산학협력단 유기 발광 표시 장치의 제조 방법
US8911555B2 (en) 2009-02-05 2014-12-16 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060099344A1 (en) * 2004-11-09 2006-05-11 Eastman Kodak Company Controlling the vaporization of organic material
US7989021B2 (en) * 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118427A (en) * 1980-02-23 1981-09-17 Sadami Ito Apparatus for sticking metallized film
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56118427A (en) * 1980-02-23 1981-09-17 Sadami Ito Apparatus for sticking metallized film
JPS57134558A (en) * 1981-02-16 1982-08-19 Fuji Photo Film Co Ltd Production of organic vapor deposited thin film

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5097800A (en) * 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5125138A (en) * 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US4842893A (en) * 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5018048A (en) * 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US5032461A (en) * 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
JPS62290863A (ja) * 1986-06-09 1987-12-17 Fuji Xerox Co Ltd 真空蒸着用蒸発方法
JPS62290862A (ja) * 1986-06-09 1987-12-17 Fuji Xerox Co Ltd 真空蒸着法
US4954371A (en) * 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
WO1987007848A1 (en) * 1986-06-23 1987-12-30 Spectrum Control, Inc. Flash evaporation of monomer fluids
US5811156A (en) * 1997-01-24 1998-09-22 Eastman Kodak Company Method of making a color filter array by colorant transfer and etch
US6291031B1 (en) * 1998-01-27 2001-09-18 Matsushita Electric Industrial Co., Ltd. Method for preparing optical recording medium and preparation apparatus therefor
KR100639935B1 (ko) * 1999-01-14 2006-10-31 어플라이드 매터리얼스 게엠베하 운트 컴퍼니 카게 띠형 기판의 가스처리 장치
WO2003085157A1 (en) * 2002-04-05 2003-10-16 Matsushita Electric Industrial Co., Ltd. Method and apparatus for preparing thin resin film
US7195848B2 (en) 2004-08-30 2007-03-27 Eastman Kodak Company Method of making inlaid color filter arrays
JP2007070687A (ja) * 2005-09-06 2007-03-22 Semiconductor Energy Lab Co Ltd 成膜装置
JP2007224394A (ja) * 2006-02-27 2007-09-06 Hitachi Zosen Corp 蒸着材料の蒸発方法および蒸発装置ならびに真空蒸着装置
US8911555B2 (en) 2009-02-05 2014-12-16 Von Ardenne Anlagentechnik Gmbh Method and device for coating substrates from the vapor phase
WO2012121237A1 (ja) * 2011-03-09 2012-09-13 コニカミノルタホールディングス株式会社 蒸着装置及び薄膜形成方法
KR101239808B1 (ko) 2011-04-07 2013-03-06 순천향대학교 산학협력단 유기 발광 표시 장치의 제조 방법

Also Published As

Publication number Publication date
JPH055894B2 (forum.php) 1993-01-25

Similar Documents

Publication Publication Date Title
JPS59177365A (ja) 蒸発方法とその装置
US3754329A (en) Razor blade with rf sputtered coating
JPS5941511B2 (ja) 光学膜の製造方法
JPH10280135A (ja) 陰極アーク放電を用いた薄膜蒸着装置
JPH11140630A (ja) カソードアーク気相堆積装置
US5258074A (en) Evaporation apparatus comprising film substrate voltage applying means and current measurement means
JPH0610871B2 (ja) 磁気記録媒体
US4399013A (en) Method of producing a magnetic recording medium
JPH11140632A (ja) 陰極アーク蒸着により材料を基材に付着させる装置
JP4409015B2 (ja) アークイオンプレーティング装置
JP2002097569A (ja) 真空表面加工法
RU2065889C1 (ru) Установка для ионно-плазменного распыления
CN2934268Y (zh) 金属板带真空镀膜设备
JPH08260132A (ja) 真空アーク蒸着方法及び装置
JPH05209269A (ja) 薄膜形成装置におけるプラズマ走査装置
JP2004362699A (ja) 磁気記録媒体の製造方法および製造装置
JP3404065B2 (ja) 蒸着効率の高いイオンプレーティング装置
KR930001231B1 (ko) 다중극 자장억류 원리를 이용한 대용량 이온플레이팅 방법 및 그장치
JPH0672300B2 (ja) ハイブリツドイオンプレ−テイング装置
JPS59177364A (ja) 有機物蒸発方法とその装置
JPS61288068A (ja) 薄膜形成方法及びその装置
JPH0621349B2 (ja) 高速移動フイルムの連続的イオンプレ−テイング装置
JPH07116595B2 (ja) イオンプレ−テイング蒸発装置
JPS6338578A (ja) 高周波イオンプレ−テイング装置
JPH0411923B2 (forum.php)