JPS5915244A - ポジ型感光性組成物 - Google Patents

ポジ型感光性組成物

Info

Publication number
JPS5915244A
JPS5915244A JP12384482A JP12384482A JPS5915244A JP S5915244 A JPS5915244 A JP S5915244A JP 12384482 A JP12384482 A JP 12384482A JP 12384482 A JP12384482 A JP 12384482A JP S5915244 A JPS5915244 A JP S5915244A
Authority
JP
Japan
Prior art keywords
group
general formula
photosensitive composition
naphthoquinone
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12384482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0328701B2 (enrdf_load_stackoverflow
Inventor
Masabumi Uehara
正文 上原
Atsuo Yamazaki
山崎 惇夫
Takeshi Yamamoto
毅 山本
Toru Aoki
亨 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12384482A priority Critical patent/JPS5915244A/ja
Publication of JPS5915244A publication Critical patent/JPS5915244A/ja
Publication of JPH0328701B2 publication Critical patent/JPH0328701B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP12384482A 1982-07-15 1982-07-15 ポジ型感光性組成物 Granted JPS5915244A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12384482A JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12384482A JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
JPS5915244A true JPS5915244A (ja) 1984-01-26
JPH0328701B2 JPH0328701B2 (enrdf_load_stackoverflow) 1991-04-19

Family

ID=14870785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12384482A Granted JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JPS5915244A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0328701B2 (enrdf_load_stackoverflow) 1991-04-19

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