JPH0328701B2 - - Google Patents

Info

Publication number
JPH0328701B2
JPH0328701B2 JP12384482A JP12384482A JPH0328701B2 JP H0328701 B2 JPH0328701 B2 JP H0328701B2 JP 12384482 A JP12384482 A JP 12384482A JP 12384482 A JP12384482 A JP 12384482A JP H0328701 B2 JPH0328701 B2 JP H0328701B2
Authority
JP
Japan
Prior art keywords
group
general formula
photosensitive
naphthoquinone
compound represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12384482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5915244A (ja
Inventor
Masabumi Uehara
Atsuo Yamazaki
Takeshi Yamamoto
Tooru Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP12384482A priority Critical patent/JPS5915244A/ja
Publication of JPS5915244A publication Critical patent/JPS5915244A/ja
Publication of JPH0328701B2 publication Critical patent/JPH0328701B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP12384482A 1982-07-15 1982-07-15 ポジ型感光性組成物 Granted JPS5915244A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12384482A JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12384482A JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Publications (2)

Publication Number Publication Date
JPS5915244A JPS5915244A (ja) 1984-01-26
JPH0328701B2 true JPH0328701B2 (enrdf_load_stackoverflow) 1991-04-19

Family

ID=14870785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12384482A Granted JPS5915244A (ja) 1982-07-15 1982-07-15 ポジ型感光性組成物

Country Status (1)

Country Link
JP (1) JPS5915244A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS5915244A (ja) 1984-01-26

Similar Documents

Publication Publication Date Title
US4306011A (en) Photosensitive composite and photosensitive lithographic printing plate
US4308368A (en) Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
US4467025A (en) Photosensitive compositions
US4306010A (en) Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate
JPH0117564B2 (enrdf_load_stackoverflow)
JPH05158230A (ja) ポジ型感光性組成物
US4460674A (en) Posi-type quinone diazide photosensitive composition with sensitizer therefor
JPH0451018B2 (enrdf_load_stackoverflow)
JP2599007B2 (ja) ポジ型感光性組成物
US5225310A (en) Photosensitive mixture containing an ester or amide of 1,2-naphthoquinone diazide sulfonic or carboxylic acid, a phenolic binder resin and a bis-(4-hydroxyphenyl) speed enhancing compound
JPH0145901B2 (enrdf_load_stackoverflow)
JPH0140338B2 (enrdf_load_stackoverflow)
US4229514A (en) Photosensitive composition
JP2541736B2 (ja) オルトナフトキノンジアジドスルフォン酸エステルを含む感光性混合物、およびそれでつくった記録材料
JPH0328701B2 (enrdf_load_stackoverflow)
US5200293A (en) Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPS6358335B2 (enrdf_load_stackoverflow)
JPH01280748A (ja) ポジ型感光性組成物
JPH0128369B2 (enrdf_load_stackoverflow)
US3776735A (en) Light-sensitive copying composition containing a light insensitive polymer and a light sensitive heterocyclic compound
JPH0677149B2 (ja) 感光性混合物及び感光性複写材料
JPS6358336B2 (enrdf_load_stackoverflow)
JPH04328552A (ja) 感光性組成物
JPH01293341A (ja) ポジ型感光性組成物
JPH0469661A (ja) 感光性組成物