JPS5915243A - レジスト材料 - Google Patents

レジスト材料

Info

Publication number
JPS5915243A
JPS5915243A JP57123865A JP12386582A JPS5915243A JP S5915243 A JPS5915243 A JP S5915243A JP 57123865 A JP57123865 A JP 57123865A JP 12386582 A JP12386582 A JP 12386582A JP S5915243 A JPS5915243 A JP S5915243A
Authority
JP
Japan
Prior art keywords
etching
pattern
resist
resist material
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57123865A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0365545B2 (en:Method
Inventor
Shigeyoshi Suzuki
成嘉 鈴木
Kazuhide Saigo
斉郷　和秀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57123865A priority Critical patent/JPS5915243A/ja
Priority to US06/501,201 priority patent/US4551417A/en
Priority to IE1339/83A priority patent/IE54731B1/en
Priority to CA000429834A priority patent/CA1207216A/en
Priority to EP83303324A priority patent/EP0096596B2/en
Priority to DE8383303324T priority patent/DE3363914D1/de
Publication of JPS5915243A publication Critical patent/JPS5915243A/ja
Publication of JPH0365545B2 publication Critical patent/JPH0365545B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/73—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57123865A 1982-06-08 1982-07-16 レジスト材料 Granted JPS5915243A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP57123865A JPS5915243A (ja) 1982-07-16 1982-07-16 レジスト材料
US06/501,201 US4551417A (en) 1982-06-08 1983-06-06 Method of forming patterns in manufacturing microelectronic devices
IE1339/83A IE54731B1 (en) 1982-06-08 1983-06-07 Microelectronic device manufacture
CA000429834A CA1207216A (en) 1982-06-08 1983-06-07 Method of forming patterns in manufacturing microelectronic devices
EP83303324A EP0096596B2 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture
DE8383303324T DE3363914D1 (en) 1982-06-08 1983-06-08 Microelectronic device manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57123865A JPS5915243A (ja) 1982-07-16 1982-07-16 レジスト材料

Publications (2)

Publication Number Publication Date
JPS5915243A true JPS5915243A (ja) 1984-01-26
JPH0365545B2 JPH0365545B2 (en:Method) 1991-10-14

Family

ID=14871293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57123865A Granted JPS5915243A (ja) 1982-06-08 1982-07-16 レジスト材料

Country Status (1)

Country Link
JP (1) JPS5915243A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62277728A (ja) * 1986-05-27 1987-12-02 Nec Corp パタ−ン形成方法
JPS62278545A (ja) * 1986-05-27 1987-12-03 Nec Corp パタ−ン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62277728A (ja) * 1986-05-27 1987-12-02 Nec Corp パタ−ン形成方法
JPS62278545A (ja) * 1986-05-27 1987-12-03 Nec Corp パタ−ン形成方法

Also Published As

Publication number Publication date
JPH0365545B2 (en:Method) 1991-10-14

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