JPS59148002A - 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 - Google Patents
蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法Info
- Publication number
- JPS59148002A JPS59148002A JP58022031A JP2203183A JPS59148002A JP S59148002 A JPS59148002 A JP S59148002A JP 58022031 A JP58022031 A JP 58022031A JP 2203183 A JP2203183 A JP 2203183A JP S59148002 A JPS59148002 A JP S59148002A
- Authority
- JP
- Japan
- Prior art keywords
- zirconium oxide
- film
- oxide
- sputtering
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 title claims abstract description 45
- 229910001928 zirconium oxide Inorganic materials 0.000 title claims abstract description 45
- 230000003287 optical effect Effects 0.000 title claims abstract description 18
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 17
- 239000010409 thin film Substances 0.000 title claims abstract description 12
- 239000000203 mixture Substances 0.000 title claims description 14
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000007740 vapor deposition Methods 0.000 title description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 22
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 22
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000001704 evaporation Methods 0.000 claims abstract description 5
- 238000007738 vacuum evaporation Methods 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 13
- 230000008020 evaporation Effects 0.000 claims description 3
- 241000218657 Picea Species 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 51
- 239000000843 powder Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 239000008188 pellet Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012788 optical film Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58022031A JPS59148002A (ja) | 1983-02-15 | 1983-02-15 | 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58022031A JPS59148002A (ja) | 1983-02-15 | 1983-02-15 | 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59148002A true JPS59148002A (ja) | 1984-08-24 |
| JPS6151282B2 JPS6151282B2 (enrdf_load_stackoverflow) | 1986-11-08 |
Family
ID=12071603
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58022031A Granted JPS59148002A (ja) | 1983-02-15 | 1983-02-15 | 蒸着およびスパツタ用酸化ジルコニウム組成物およびそれを用いる光学用薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59148002A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0206780A3 (en) * | 1985-06-20 | 1988-05-11 | Tosoh Corporation | Zirconia sintered body of improved light transmittance |
| JPH02291502A (ja) * | 1989-04-28 | 1990-12-03 | Hoya Corp | プラスチックレンズ用多層反射防止膜 |
| EP1205774A3 (en) * | 2000-11-13 | 2004-06-09 | Hoya Corporation | Composition for vapor deposition, method for forming antireflection film using it, and optical element |
-
1983
- 1983-02-15 JP JP58022031A patent/JPS59148002A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0206780A3 (en) * | 1985-06-20 | 1988-05-11 | Tosoh Corporation | Zirconia sintered body of improved light transmittance |
| JPH02291502A (ja) * | 1989-04-28 | 1990-12-03 | Hoya Corp | プラスチックレンズ用多層反射防止膜 |
| EP1205774A3 (en) * | 2000-11-13 | 2004-06-09 | Hoya Corporation | Composition for vapor deposition, method for forming antireflection film using it, and optical element |
| US7106515B2 (en) | 2000-11-13 | 2006-09-12 | Hoya Corporation | Composition for vapor deposition, method for forming an antireflection film, and optical element |
| EP1801621A3 (en) * | 2000-11-13 | 2009-12-02 | Hoya Corporation | Composition for vapor deposition, method for forming antireflection film using it, and optical element |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6151282B2 (enrdf_load_stackoverflow) | 1986-11-08 |
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