JPS59145778A - 光化学蒸着装置 - Google Patents

光化学蒸着装置

Info

Publication number
JPS59145778A
JPS59145778A JP1877883A JP1877883A JPS59145778A JP S59145778 A JPS59145778 A JP S59145778A JP 1877883 A JP1877883 A JP 1877883A JP 1877883 A JP1877883 A JP 1877883A JP S59145778 A JPS59145778 A JP S59145778A
Authority
JP
Japan
Prior art keywords
substrate
space
discharge
plasma
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1877883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6150152B2 (enExample
Inventor
Kazuya Tanaka
一也 田中
Shinji Sugioka
晋次 杉岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP1877883A priority Critical patent/JPS59145778A/ja
Priority to US06/566,790 priority patent/US4525381A/en
Publication of JPS59145778A publication Critical patent/JPS59145778A/ja
Publication of JPS6150152B2 publication Critical patent/JPS6150152B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP1877883A 1983-02-09 1983-02-09 光化学蒸着装置 Granted JPS59145778A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1877883A JPS59145778A (ja) 1983-02-09 1983-02-09 光化学蒸着装置
US06/566,790 US4525381A (en) 1983-02-09 1983-12-29 Photochemical vapor deposition apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1877883A JPS59145778A (ja) 1983-02-09 1983-02-09 光化学蒸着装置

Publications (2)

Publication Number Publication Date
JPS59145778A true JPS59145778A (ja) 1984-08-21
JPS6150152B2 JPS6150152B2 (enExample) 1986-11-01

Family

ID=11981088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1877883A Granted JPS59145778A (ja) 1983-02-09 1983-02-09 光化学蒸着装置

Country Status (1)

Country Link
JP (1) JPS59145778A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6156281A (ja) * 1984-08-25 1986-03-20 Yasuo Tarui 成膜方法
JPS6156279A (ja) * 1984-08-25 1986-03-20 Yasuo Tarui 成膜方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57159016A (en) * 1981-03-26 1982-10-01 Sumitomo Electric Ind Ltd Manufacture of amorphous silicon film
JPS58176923A (ja) * 1982-04-09 1983-10-17 Jeol Ltd プラズマｃｖｄ装置
JPS59126500A (ja) * 1982-11-16 1984-07-21 ユニリ−バ−・ナ−ムロ−ゼ・ベンノ−トシヤ−プ 洗剤組成物

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57159016A (en) * 1981-03-26 1982-10-01 Sumitomo Electric Ind Ltd Manufacture of amorphous silicon film
JPS58176923A (ja) * 1982-04-09 1983-10-17 Jeol Ltd プラズマｃｖｄ装置
JPS59126500A (ja) * 1982-11-16 1984-07-21 ユニリ−バ−・ナ−ムロ−ゼ・ベンノ−トシヤ−プ 洗剤組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6156281A (ja) * 1984-08-25 1986-03-20 Yasuo Tarui 成膜方法
JPS6156279A (ja) * 1984-08-25 1986-03-20 Yasuo Tarui 成膜方法

Also Published As

Publication number Publication date
JPS6150152B2 (enExample) 1986-11-01

Similar Documents

Publication Publication Date Title
US4525382A (en) Photochemical vapor deposition apparatus
JP3318336B2 (ja) 物品を直流アーク放電支援下の反応で処理する方法及び装置
US20130177847A1 (en) Photoresist for improved lithographic control
TW200915396A (en) Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor
JPS59139539A (ja) 空間変調密度を有する粒子ビ−ムを得るための方法および装置
US4525381A (en) Photochemical vapor deposition apparatus
JPS61164219A (ja) 薄膜トランジスタアレイの製造装置
JP3200393B2 (ja) ダイヤモンド膜の堆積方法と装置
US4500565A (en) Deposition process
JPS59145778A (ja) 光化学蒸着装置
EP0029747A1 (en) An apparatus for vacuum deposition and a method for forming a thin film by the use thereof
JPS59145780A (ja) 光化学蒸着装置
JPS6150151B2 (enExample)
JPS6037118A (ja) プラズマ気相反応方法
JPH079059B2 (ja) 炭素薄膜の製造方法
JP3064407B2 (ja) 光励起プロセス装置用光源
JP3805618B2 (ja) ダイヤモンド膜の製造方法
JPS6173881A (ja) 気相成長装置
JPS60212224A (ja) 光化学反応装置
JPS6150147B2 (enExample)
JPS60212222A (ja) 光化学反応装置
JPS6227575A (ja) 成膜方法
JPS6227574A (ja) 光化学反応装置
JPS6185818A (ja) 堆積膜形成法
JP3010065B2 (ja) 光励起プロセス装置