JPS59143157A - 製版用感光性マスク材料および製版用マスク版の製造方法 - Google Patents

製版用感光性マスク材料および製版用マスク版の製造方法

Info

Publication number
JPS59143157A
JPS59143157A JP58017949A JP1794983A JPS59143157A JP S59143157 A JPS59143157 A JP S59143157A JP 58017949 A JP58017949 A JP 58017949A JP 1794983 A JP1794983 A JP 1794983A JP S59143157 A JPS59143157 A JP S59143157A
Authority
JP
Japan
Prior art keywords
layer
photosensitive
thin film
light
beer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58017949A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0339299B2 (enrdf_load_stackoverflow
Inventor
Takeo Moriya
守谷　武雄
Toshio Yamagata
山縣　敏雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP58017949A priority Critical patent/JPS59143157A/ja
Publication of JPS59143157A publication Critical patent/JPS59143157A/ja
Publication of JPH0339299B2 publication Critical patent/JPH0339299B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58017949A 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法 Granted JPS59143157A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58017949A JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58017949A JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Publications (2)

Publication Number Publication Date
JPS59143157A true JPS59143157A (ja) 1984-08-16
JPH0339299B2 JPH0339299B2 (enrdf_load_stackoverflow) 1991-06-13

Family

ID=11958014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58017949A Granted JPS59143157A (ja) 1983-02-04 1983-02-04 製版用感光性マスク材料および製版用マスク版の製造方法

Country Status (1)

Country Link
JP (1) JPS59143157A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6338941A (ja) * 1986-08-04 1988-02-19 Fuji Photo Film Co Ltd 製版用マスクの作成方法及びマスク形成フイルム
JPS63296048A (ja) * 1987-05-28 1988-12-02 Fuji Photo Film Co Ltd マスク形成用フイルム及び画像形成用マスクの作成方法
JP2019502143A (ja) * 2016-01-27 2019-01-24 エルジー・ケム・リミテッド フィルムマスク、その製造方法、これを用いたパターンの形成方法およびこれを用いて形成されたパターン
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6338941A (ja) * 1986-08-04 1988-02-19 Fuji Photo Film Co Ltd 製版用マスクの作成方法及びマスク形成フイルム
JPS63296048A (ja) * 1987-05-28 1988-12-02 Fuji Photo Film Co Ltd マスク形成用フイルム及び画像形成用マスクの作成方法
JP2019502143A (ja) * 2016-01-27 2019-01-24 エルジー・ケム・リミテッド フィルムマスク、その製造方法、これを用いたパターンの形成方法およびこれを用いて形成されたパターン
US10969677B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask
US10969686B2 (en) 2016-01-27 2021-04-06 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby
US11029596B2 (en) 2016-01-27 2021-06-08 Lg Chem, Ltd. Film mask, method for manufacturing same, and method for forming pattern using film mask and pattern formed thereby

Also Published As

Publication number Publication date
JPH0339299B2 (enrdf_load_stackoverflow) 1991-06-13

Similar Documents

Publication Publication Date Title
US3671236A (en) Presensitized color-proofing sheet
DE68926401T2 (de) Lichtempfindliches Material
JPS59104993A (ja) 画像記録材料及び該材料で実施可能な画像記録法
JPH0224624A (ja) 液晶表示装置用カラーフィルターアレー
JPS5965838A (ja) 多層構造を有する感材およびその製版方法
DE3750775T2 (de) Verfahren zur Herstellung von Halbtonbildern.
DE1572207B1 (de) Photographisches vor der Entwicklung Kontrollbilder lieferndes Aufzeichnungsmaterial
DE2660103B1 (de) Farbkorrektursystem fuer die Mehrfarbenbildreproduktion
JPS59143157A (ja) 製版用感光性マスク材料および製版用マスク版の製造方法
DE4125699A1 (de) Lichtempfindliches material umfassend eine auf einem traeger aufgebrachte lichtempfindliche schicht, polymerisierbare schicht und eine beschleunigungsschicht fuer die bilderzeugung
JPS6245547B2 (enrdf_load_stackoverflow)
JPS63147154A (ja) 画像形成材料
DE3032134A1 (de) Lichtempfindliches bildausbildungsmaterial
JPS6296905A (ja) 偏光膜積層体
US4355095A (en) Method for producing a photomechanical color image using a strippable photostencil and water-permeable, water-insoluble color media
EP0048160B1 (en) Photosensitive recording material, and method of half-tone etching
JP2901686B2 (ja) 画像形成材料及び画像形成方法
JPH0365538B2 (enrdf_load_stackoverflow)
DE3413103C2 (enrdf_load_stackoverflow)
JPS6043660A (ja) フオトマスキングフイルム
JPS60182443A (ja) 改良されたオペーク不要な製版用感光性マスキング材料
DE3546007C2 (enrdf_load_stackoverflow)
JPH0525677B2 (enrdf_load_stackoverflow)
JPS6199103A (ja) カラ−フイルタ−の製法
US1758185A (en) Cinematograph color film and method of manufacture