JPS5913072A - スパツタリング装置 - Google Patents

スパツタリング装置

Info

Publication number
JPS5913072A
JPS5913072A JP11955182A JP11955182A JPS5913072A JP S5913072 A JPS5913072 A JP S5913072A JP 11955182 A JP11955182 A JP 11955182A JP 11955182 A JP11955182 A JP 11955182A JP S5913072 A JPS5913072 A JP S5913072A
Authority
JP
Japan
Prior art keywords
film
substrate
sputtering
work roll
work
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11955182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6157908B2 (cs
Inventor
Tomoshiro Shioda
潮田　友四郎
Reiji Nishikawa
西川　羚二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tokuda Seisakusho Co Ltd
Original Assignee
Toshiba Corp
Tokuda Seisakusho Co Ltd
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokuda Seisakusho Co Ltd, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11955182A priority Critical patent/JPS5913072A/ja
Publication of JPS5913072A publication Critical patent/JPS5913072A/ja
Publication of JPS6157908B2 publication Critical patent/JPS6157908B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP11955182A 1982-07-09 1982-07-09 スパツタリング装置 Granted JPS5913072A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11955182A JPS5913072A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11955182A JPS5913072A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5913072A true JPS5913072A (ja) 1984-01-23
JPS6157908B2 JPS6157908B2 (cs) 1986-12-09

Family

ID=14764106

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11955182A Granted JPS5913072A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5913072A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6462932B1 (en) 1997-11-14 2002-10-08 Murata Manufacturing Co., Ltd Multilayer Capacitor
JP2008007790A (ja) * 2006-06-27 2008-01-17 Sumitomo Metal Mining Co Ltd 巻取式複合真空表面処理装置及びフィルムの表面処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57119548A (en) * 1980-12-01 1982-07-26 Philips Nv Conference telephone system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57119548A (en) * 1980-12-01 1982-07-26 Philips Nv Conference telephone system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6462932B1 (en) 1997-11-14 2002-10-08 Murata Manufacturing Co., Ltd Multilayer Capacitor
JP2008007790A (ja) * 2006-06-27 2008-01-17 Sumitomo Metal Mining Co Ltd 巻取式複合真空表面処理装置及びフィルムの表面処理方法

Also Published As

Publication number Publication date
JPS6157908B2 (cs) 1986-12-09

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