JPS59128730U - 液相成長装置 - Google Patents

液相成長装置

Info

Publication number
JPS59128730U
JPS59128730U JP2320183U JP2320183U JPS59128730U JP S59128730 U JPS59128730 U JP S59128730U JP 2320183 U JP2320183 U JP 2320183U JP 2320183 U JP2320183 U JP 2320183U JP S59128730 U JPS59128730 U JP S59128730U
Authority
JP
Japan
Prior art keywords
liquid phase
phase growth
melt
growth equipment
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2320183U
Other languages
English (en)
Japanese (ja)
Other versions
JPH025530Y2 (enrdf_load_stackoverflow
Inventor
山口　隆夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP2320183U priority Critical patent/JPS59128730U/ja
Publication of JPS59128730U publication Critical patent/JPS59128730U/ja
Application granted granted Critical
Publication of JPH025530Y2 publication Critical patent/JPH025530Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP2320183U 1983-02-18 1983-02-18 液相成長装置 Granted JPS59128730U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2320183U JPS59128730U (ja) 1983-02-18 1983-02-18 液相成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2320183U JPS59128730U (ja) 1983-02-18 1983-02-18 液相成長装置

Publications (2)

Publication Number Publication Date
JPS59128730U true JPS59128730U (ja) 1984-08-30
JPH025530Y2 JPH025530Y2 (enrdf_load_stackoverflow) 1990-02-09

Family

ID=30154288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2320183U Granted JPS59128730U (ja) 1983-02-18 1983-02-18 液相成長装置

Country Status (1)

Country Link
JP (1) JPS59128730U (enrdf_load_stackoverflow)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4937569A (enrdf_load_stackoverflow) * 1972-08-09 1974-04-08
JPS5515316U (enrdf_load_stackoverflow) * 1978-07-17 1980-01-31
JPS5651158A (en) * 1979-10-03 1981-05-08 Ricoh Co Ltd Reproducing method of binary picture
JPS5886723A (ja) * 1981-11-18 1983-05-24 Nec Corp 半導体結晶の成長装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4937569A (enrdf_load_stackoverflow) * 1972-08-09 1974-04-08
JPS5515316U (enrdf_load_stackoverflow) * 1978-07-17 1980-01-31
JPS5651158A (en) * 1979-10-03 1981-05-08 Ricoh Co Ltd Reproducing method of binary picture
JPS5886723A (ja) * 1981-11-18 1983-05-24 Nec Corp 半導体結晶の成長装置

Also Published As

Publication number Publication date
JPH025530Y2 (enrdf_load_stackoverflow) 1990-02-09

Similar Documents

Publication Publication Date Title
JPS59128730U (ja) 液相成長装置
JPS617578U (ja) 液相エピタキシヤル成長装置
JPS6094823U (ja) 液相成長用ボ−ト
JPS5837138U (ja) 半導体素子用キヤリアラツク
JPS6088537U (ja) 液相エピタキシヤル成長装置
JPS58173236U (ja) 結晶成長装置
JPS6093418U (ja) ケ−ブル保持具
JPS58168571U (ja) 液相エピタキシヤル成長用装置
JPS5821499U (ja) 貴石調モザイクダイヤル
JPS58138332U (ja) 液相成長装置
JPS59119549U (ja) 予備ヒユ−ズのホルダ−
JPS6038795U (ja) Ｘ−ｙプロツタ
JPS6088550U (ja) キヤリアテ−プ
JPS5946239U (ja) ガラス板
JPS5887772U (ja) 吊持金具
JPS5895634U (ja) アニ−ル装置
JPS58134743U (ja) 検出器保持装置
JPS6024566U (ja) セラミツク印刷版
JPS5961531U (ja) 液相エピタキシヤル成長装置
JPS606236U (ja) 半導体装置
JPS5916147U (ja) 半導体装置
JPS58121270U (ja) 吊り具
JPS60146645U (ja) 研摩装置
JPS58163570U (ja) 液相エピタキシヤル成長装置
JPS60151580U (ja) 回転塗布装置の基板ホルダ−