JPS59127857A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS59127857A
JPS59127857A JP58002218A JP221883A JPS59127857A JP S59127857 A JPS59127857 A JP S59127857A JP 58002218 A JP58002218 A JP 58002218A JP 221883 A JP221883 A JP 221883A JP S59127857 A JPS59127857 A JP S59127857A
Authority
JP
Japan
Prior art keywords
conductivity type
region
type
silicon substrate
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58002218A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430188B2 (en, 2012
Inventor
Takeshi Komoriya
小森谷 剛
Shoji Hanamura
花村 昭次
Masaaki Aoki
正明 青木
Osamu Minato
湊 修
Toshiaki Masuhara
増原 利明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58002218A priority Critical patent/JPS59127857A/ja
Priority to EP84100232A priority patent/EP0114061A3/en
Priority to CA000445161A priority patent/CA1205571A/en
Publication of JPS59127857A publication Critical patent/JPS59127857A/ja
Publication of JPH0430188B2 publication Critical patent/JPH0430188B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/387Devices controllable only by the variation of applied heat
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS
    • H10D84/858Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Memories (AREA)
  • Logic Circuits (AREA)
JP58002218A 1983-01-12 1983-01-12 半導体装置 Granted JPS59127857A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58002218A JPS59127857A (ja) 1983-01-12 1983-01-12 半導体装置
EP84100232A EP0114061A3 (en) 1983-01-12 1984-01-11 Semiconductor device having cmos structures
CA000445161A CA1205571A (en) 1983-01-12 1984-01-12 Semiconductor device having cmos structures

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58002218A JPS59127857A (ja) 1983-01-12 1983-01-12 半導体装置

Publications (2)

Publication Number Publication Date
JPS59127857A true JPS59127857A (ja) 1984-07-23
JPH0430188B2 JPH0430188B2 (en, 2012) 1992-05-21

Family

ID=11523215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58002218A Granted JPS59127857A (ja) 1983-01-12 1983-01-12 半導体装置

Country Status (3)

Country Link
EP (1) EP0114061A3 (en, 2012)
JP (1) JPS59127857A (en, 2012)
CA (1) CA1205571A (en, 2012)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104601164A (zh) * 2015-02-04 2015-05-06 苏州大学 一种基于3只mos管设计的反相器和滤波电路
WO2017221292A1 (ja) * 2016-06-20 2017-12-28 三菱電機株式会社 並列駆動回路

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4789917A (en) * 1987-08-31 1988-12-06 National Semiconductor Corp. MOS I/O protection using switched body circuit design
NL8802423A (nl) * 1988-10-03 1990-05-01 Imec Inter Uni Micro Electr Werkwijze voor het bedrijven van een mos-structuur en daarvoor geschikte mos-structuur.
IT1293736B1 (it) * 1997-07-18 1999-03-10 Flame Spray Snc Apparecchiatura per l'applicazione di rivestimenti protettivi con tecnica a plasma

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3493824A (en) * 1967-08-31 1970-02-03 Gen Telephone & Elect Insulated-gate field effect transistors utilizing a high resistivity substrate
JPS5939904B2 (ja) * 1978-09-28 1984-09-27 株式会社東芝 半導体装置
DE2947311C2 (de) * 1978-11-24 1982-04-01 Hitachi, Ltd., Tokyo Integrierte Halbleiterschaltung

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104601164A (zh) * 2015-02-04 2015-05-06 苏州大学 一种基于3只mos管设计的反相器和滤波电路
WO2017221292A1 (ja) * 2016-06-20 2017-12-28 三菱電機株式会社 並列駆動回路
JPWO2017221292A1 (ja) * 2016-06-20 2018-09-20 三菱電機株式会社 並列駆動回路

Also Published As

Publication number Publication date
CA1205571A (en) 1986-06-03
JPH0430188B2 (en, 2012) 1992-05-21
EP0114061A3 (en) 1985-10-09
EP0114061A2 (en) 1984-07-25

Similar Documents

Publication Publication Date Title
US6924560B2 (en) Compact SRAM cell with FinFET
JP4954413B2 (ja) 薄いゲート酸化膜用デカップリング・キャパシタ
US6646305B2 (en) Grounded body SOI SRAM cell
US3609479A (en) Semiconductor integrated circuit having mis and bipolar transistor elements
US5672995A (en) High speed mis-type intergrated circuit with self-regulated back bias
JP2001352077A (ja) Soi電界効果トランジスタ
JP2008193101A (ja) 半導体装置
JPH1168105A (ja) 半導体装置
JP2528794B2 (ja) ラツチアツプ保護回路付き集積回路
US5162889A (en) Static random access memory cell
US5945715A (en) Semiconductor memory device having a memory cell region and a peripheral circuit region and method of manufacturing the same
US4725875A (en) Memory cell with diodes providing radiation hardness
JPS6388859A (ja) ラツチアツプ保護回路付き集積回路
JPS6050066B2 (ja) Mos半導体集積回路装置
JPS59127857A (ja) 半導体装置
US5969385A (en) Ultra-low power-delay product NNN/PPP logic devices
US6713815B2 (en) Semiconductor device with transistors that convert a voltage difference into a drain current difference
McNelly et al. High performance 0.25/spl mu/m SRAM technology with tungsten interpoly plug
Rakús et al. Analysis of bulk-driven technique for low-voltage IC design in 130 nm CMOS technology
JPS60246671A (ja) 半導体メモリセル
JPH02129960A (ja) 半導体メモリ
JPS54128295A (en) Mis-type semiconductor integrated circuit device
JPS626347B2 (en, 2012)
Cheroff et al. IGFET circuit performance: N-channel vs P-channel
JPH0795032A (ja) Cmos型インバータ回路