JPS59127857A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JPS59127857A JPS59127857A JP58002218A JP221883A JPS59127857A JP S59127857 A JPS59127857 A JP S59127857A JP 58002218 A JP58002218 A JP 58002218A JP 221883 A JP221883 A JP 221883A JP S59127857 A JPS59127857 A JP S59127857A
- Authority
- JP
- Japan
- Prior art keywords
- conductivity type
- region
- type
- silicon substrate
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/387—Devices controllable only by the variation of applied heat
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/858—Complementary IGFETs, e.g. CMOS comprising a P-type well but not an N-type well
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Logic Circuits (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58002218A JPS59127857A (ja) | 1983-01-12 | 1983-01-12 | 半導体装置 |
EP84100232A EP0114061A3 (en) | 1983-01-12 | 1984-01-11 | Semiconductor device having cmos structures |
CA000445161A CA1205571A (en) | 1983-01-12 | 1984-01-12 | Semiconductor device having cmos structures |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58002218A JPS59127857A (ja) | 1983-01-12 | 1983-01-12 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59127857A true JPS59127857A (ja) | 1984-07-23 |
JPH0430188B2 JPH0430188B2 (en, 2012) | 1992-05-21 |
Family
ID=11523215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58002218A Granted JPS59127857A (ja) | 1983-01-12 | 1983-01-12 | 半導体装置 |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0114061A3 (en, 2012) |
JP (1) | JPS59127857A (en, 2012) |
CA (1) | CA1205571A (en, 2012) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104601164A (zh) * | 2015-02-04 | 2015-05-06 | 苏州大学 | 一种基于3只mos管设计的反相器和滤波电路 |
WO2017221292A1 (ja) * | 2016-06-20 | 2017-12-28 | 三菱電機株式会社 | 並列駆動回路 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4789917A (en) * | 1987-08-31 | 1988-12-06 | National Semiconductor Corp. | MOS I/O protection using switched body circuit design |
NL8802423A (nl) * | 1988-10-03 | 1990-05-01 | Imec Inter Uni Micro Electr | Werkwijze voor het bedrijven van een mos-structuur en daarvoor geschikte mos-structuur. |
IT1293736B1 (it) * | 1997-07-18 | 1999-03-10 | Flame Spray Snc | Apparecchiatura per l'applicazione di rivestimenti protettivi con tecnica a plasma |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3493824A (en) * | 1967-08-31 | 1970-02-03 | Gen Telephone & Elect | Insulated-gate field effect transistors utilizing a high resistivity substrate |
JPS5939904B2 (ja) * | 1978-09-28 | 1984-09-27 | 株式会社東芝 | 半導体装置 |
DE2947311C2 (de) * | 1978-11-24 | 1982-04-01 | Hitachi, Ltd., Tokyo | Integrierte Halbleiterschaltung |
-
1983
- 1983-01-12 JP JP58002218A patent/JPS59127857A/ja active Granted
-
1984
- 1984-01-11 EP EP84100232A patent/EP0114061A3/en not_active Withdrawn
- 1984-01-12 CA CA000445161A patent/CA1205571A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104601164A (zh) * | 2015-02-04 | 2015-05-06 | 苏州大学 | 一种基于3只mos管设计的反相器和滤波电路 |
WO2017221292A1 (ja) * | 2016-06-20 | 2017-12-28 | 三菱電機株式会社 | 並列駆動回路 |
JPWO2017221292A1 (ja) * | 2016-06-20 | 2018-09-20 | 三菱電機株式会社 | 並列駆動回路 |
Also Published As
Publication number | Publication date |
---|---|
CA1205571A (en) | 1986-06-03 |
JPH0430188B2 (en, 2012) | 1992-05-21 |
EP0114061A3 (en) | 1985-10-09 |
EP0114061A2 (en) | 1984-07-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6924560B2 (en) | Compact SRAM cell with FinFET | |
JP4954413B2 (ja) | 薄いゲート酸化膜用デカップリング・キャパシタ | |
US6646305B2 (en) | Grounded body SOI SRAM cell | |
US3609479A (en) | Semiconductor integrated circuit having mis and bipolar transistor elements | |
US5672995A (en) | High speed mis-type intergrated circuit with self-regulated back bias | |
JP2001352077A (ja) | Soi電界効果トランジスタ | |
JP2008193101A (ja) | 半導体装置 | |
JPH1168105A (ja) | 半導体装置 | |
JP2528794B2 (ja) | ラツチアツプ保護回路付き集積回路 | |
US5162889A (en) | Static random access memory cell | |
US5945715A (en) | Semiconductor memory device having a memory cell region and a peripheral circuit region and method of manufacturing the same | |
US4725875A (en) | Memory cell with diodes providing radiation hardness | |
JPS6388859A (ja) | ラツチアツプ保護回路付き集積回路 | |
JPS6050066B2 (ja) | Mos半導体集積回路装置 | |
JPS59127857A (ja) | 半導体装置 | |
US5969385A (en) | Ultra-low power-delay product NNN/PPP logic devices | |
US6713815B2 (en) | Semiconductor device with transistors that convert a voltage difference into a drain current difference | |
McNelly et al. | High performance 0.25/spl mu/m SRAM technology with tungsten interpoly plug | |
Rakús et al. | Analysis of bulk-driven technique for low-voltage IC design in 130 nm CMOS technology | |
JPS60246671A (ja) | 半導体メモリセル | |
JPH02129960A (ja) | 半導体メモリ | |
JPS54128295A (en) | Mis-type semiconductor integrated circuit device | |
JPS626347B2 (en, 2012) | ||
Cheroff et al. | IGFET circuit performance: N-channel vs P-channel | |
JPH0795032A (ja) | Cmos型インバータ回路 |