JPS59119836A - アライメント方法 - Google Patents

アライメント方法

Info

Publication number
JPS59119836A
JPS59119836A JP57227086A JP22708682A JPS59119836A JP S59119836 A JPS59119836 A JP S59119836A JP 57227086 A JP57227086 A JP 57227086A JP 22708682 A JP22708682 A JP 22708682A JP S59119836 A JPS59119836 A JP S59119836A
Authority
JP
Japan
Prior art keywords
mask
wafer
pattern
alignment
alignment mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57227086A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0468766B2 (enExample
Inventor
Tetsuzo Tanimoto
谷本　哲三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57227086A priority Critical patent/JPS59119836A/ja
Publication of JPS59119836A publication Critical patent/JPS59119836A/ja
Publication of JPH0468766B2 publication Critical patent/JPH0468766B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57227086A 1982-12-27 1982-12-27 アライメント方法 Granted JPS59119836A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57227086A JPS59119836A (ja) 1982-12-27 1982-12-27 アライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57227086A JPS59119836A (ja) 1982-12-27 1982-12-27 アライメント方法

Publications (2)

Publication Number Publication Date
JPS59119836A true JPS59119836A (ja) 1984-07-11
JPH0468766B2 JPH0468766B2 (enExample) 1992-11-04

Family

ID=16855279

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57227086A Granted JPS59119836A (ja) 1982-12-27 1982-12-27 アライメント方法

Country Status (1)

Country Link
JP (1) JPS59119836A (enExample)

Also Published As

Publication number Publication date
JPH0468766B2 (enExample) 1992-11-04

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