JPS59108326A - Integrated circuit - Google Patents
Integrated circuitInfo
- Publication number
- JPS59108326A JPS59108326A JP21979482A JP21979482A JPS59108326A JP S59108326 A JPS59108326 A JP S59108326A JP 21979482 A JP21979482 A JP 21979482A JP 21979482 A JP21979482 A JP 21979482A JP S59108326 A JPS59108326 A JP S59108326A
- Authority
- JP
- Japan
- Prior art keywords
- potential
- substrate
- wiring
- region
- wiring layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/761—PN junctions
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Bipolar Transistors (AREA)
- Element Separation (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は集積回路の改良に関し、更に詳述丁tば大出力
のパワーアンプ用集積回路におけるブロッキング発振を
防止できる集積回路を提案するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to improvements in integrated circuits, and more specifically, to propose an integrated circuit that can prevent blocking oscillations in integrated circuits for high output power amplifiers.
大出力のパワーアンプ用集積回路においてはNPN型パ
ワートランジスタを飽和領域にまで追い込んで動作させ
るために本来高電位VC,!するコレクタ電位がベース
電位より低くなるという現象が生じる。In integrated circuits for high-output power amplifiers, in order to drive the NPN power transistor into the saturation region and operate it, the high potential VC,! A phenomenon occurs in which the collector potential becomes lower than the base potential.
こnによってベース−コレクターサブストレートの寄生
PNP トランジスタが形成さnることとなりその結果
寄生電流が大量に基板へ流n込み、サブストレート抵抗
の存在にエリ、その部分の電位が接地電位エフ高くなる
状態全招来してバイアス関係に異常全米たし、ブロッキ
ング発振を招来することがあるという難点を有していた
。As a result, a parasitic PNP transistor is formed in the base-collector substrate, and as a result, a large amount of parasitic current flows into the substrate, and due to the existence of the substrate resistance, the potential of that part becomes higher than the ground potential. However, it has the disadvantage that it may cause abnormalities in the bias relationship and may cause blocking oscillation.
本発明はこのような雌点を解消すべくなさnたものであ
って、アイソレーション領域の上層に接地電位に接続さ
せるべき配線層全形成し、こnによって上記寄生電流を
吸上げ、ブロッキング発振が生ずることを防止した集積
回路を提供することを目的とする。The present invention has been made to solve this problem, and the entire wiring layer to be connected to the ground potential is formed in the upper layer of the isolation region, thereby absorbing the parasitic current and preventing blocking oscillation. An object of the present invention is to provide an integrated circuit that prevents the occurrence of
以下本発明全その実施例を示す図面に基き真木的に説明
する。第1図は本発明に係る集積回路の装部の平面パタ
ーン図、第2図にその略示断面構造図である。第1図に
実線にて囲続して示す細長い領域はn型のコレクタ領域
lであって適長離隔させて多数条形成さnている。こn
らのコレクタ領域1.1間には第1図に実線にて囲続し
て示すよウニ広幅のp゛十型ベース領域2が形成さ扛て
おり、このベース領域2因に位置するようにしてn+型
のエミッタ領域(第1図に実線にて囲続して示す)3が
形成さ九ている。こnらの各領域]、2゜3は第2図に
示すようにp−型サブストレート4上のn−エピタキシ
ャル層5上に形成さnている。コレクタ領域l、ベース
領域2及びエミッタ領域3の上層には相互に絶縁膜6に
て分離絶縁さ7″したAI!のコレクタ配線7(第1図
に破線で示す)、ベース配線8(同じく2点鎖線で示−
j)及びエミッタ配線9(同じく一点鎖線で示す)が形
成さn、下層のコレクタ領域11ベース領域2及びエミ
ッタ領域3の夫々とはハツチングを付して示すコンタク
トホールを介して接続さnている。コレクタ配線7はコ
レクタ領域1の延設方向と直交する方向に長い取出部7
ai−側に有し、平面視で櫛目状のパターンを有してい
る。エミッタ配線9は取出部7aとは逆の側の端部に取
出部9a’に有し、コレクタ配線7と噛合する如き平面
視で櫛目状のパターンを有している。そしてコレクタ配
線7及びエミッタ配線9の櫛目のパターンの間隙全綴う
ようにしてジクザク状のパターンのベース配線8全形成
しである。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be explained in detail below based on drawings showing embodiments thereof. FIG. 1 is a plan pattern diagram of a mounting part of an integrated circuit according to the present invention, and FIG. 2 is a schematic cross-sectional structural diagram thereof. The elongated region shown surrounded by solid lines in FIG. 1 is an n-type collector region l, and is formed in multiple strips spaced apart by appropriate lengths. Kon
Between the collector regions 1.1 and 1.1, there is formed a wide p-shaped base region 2, which is shown surrounded by solid lines in FIG. An n+ type emitter region 3 (shown surrounded by solid lines in FIG. 1) is formed. Each of these regions], 2 and 3 are formed on an n-epitaxial layer 5 on a p-type substrate 4, as shown in FIG. In the upper layer of the collector region 1, base region 2, and emitter region 3, there is a collector wiring 7 (shown by a broken line in FIG. 1) and a base wiring 8 (also 2 Indicated by the dotted chain line.
j) and an emitter wiring 9 (also shown by a dashed line) are formed, and are connected to each of the lower collector region 11, base region 2, and emitter region 3 via contact holes shown with hatching. . The collector wiring 7 has a long lead-out portion 7 in a direction perpendicular to the direction in which the collector region 1 extends.
It is located on the ai- side and has a comb-like pattern in plan view. The emitter wiring 9 has a take-out part 9a' at the end opposite to the take-out part 7a, and has a comb-like pattern in plan view that meshes with the collector wiring 7. Then, the entire base wiring 8 is formed in a zigzag pattern so as to cover all the gaps between the comb patterns of the collector wiring 7 and the emitter wiring 9.
そしてベース配線8の取出部8aにエミッタ配線9の取
出部と同側の他端部に形成さ几ている。The lead-out portion 8a of the base wire 8 is formed at the other end on the same side as the lead-out portion of the emitter wire 9.
この工うな構成を有するパワートランジスタlOは第2
図に略示する工うにp+アイソレーション領域11.I
IKて相隣するトランジスタ10と分離さnている。そ
してこのアイソレーション領域11上にはAlの配線J
脅12を形成してあり、接地用のパッド13と一括して
配線層12を接地電位と丁べくなしである。配線層12
は1つのトランジスタの領域を囲続するように設けるの
が望ましいが配線層12そn自体又は配線層12をパッ
ド13へ導くための配線は他の配線の妨げになることが
ないようにパターン會定める必要がある。そnが不可能
な部分では第1図に或は第2図に示すようにサブストレ
ート4上にn十埋込層14(第1図では破線で示す)全
形成して一部はAI!の配線層12に替えてこfLヲ用
いてもよい。The power transistor IO having this unique configuration is the second
A p+ isolation region 11. I
IK is separated from adjacent transistors 10. And on this isolation region 11 there is an Al wiring J.
The wiring layer 12 is connected to the ground potential together with the grounding pad 13. Wiring layer 12
Although it is desirable to provide the wiring layer 12 so as to surround the area of one transistor, the wiring layer 12 itself or the wiring for guiding the wiring layer 12 to the pad 13 should be formed in a pattern so that it does not interfere with other wiring. It is necessary to establish In areas where this is not possible, as shown in FIG. 1 or FIG. 2, the buried layer 14 (indicated by a broken line in FIG. 1) is entirely formed on the substrate 4, and a portion is covered with AI! This fL may be used instead of the wiring layer 12.
而してコレクタ電位がベース電位よりも低くなった場合
には第2図に○で囲続して示すようにp+のベース領域
2、n−エピタキシャル層5及びサブストレート4に連
なるp+アイソレーション領域11の間で寄生PNP
)ランジスタが形成される。従来ではサブストレー)4
に電流が流扛、模式的に示すサブストレート抵抗4a[
工す接地用のパッド13から遠い方のアイソレーション
領域11に接地電位より高電位となっていたが、本発明
による場合は接地電位に繋る配線層12の存在にニジサ
ブストレート抵抗AaK流nる電流が吸上げらnる結果
、サブストレート4、アイソレーション領域11のt位
が接地電位より高くなる等のことが防止できフロラキン
グ発振をすることもなくなる。When the collector potential becomes lower than the base potential, the p+ isolation region connected to the p+ base region 2, the n- epitaxial layer 5, and the substrate 4, as shown surrounded by circles in FIG. Parasitic PNP between 11
) a transistor is formed. Previously, it was sub-stray) 4
A current flows through the substrate resistor 4a [
However, in the case of the present invention, the presence of the wiring layer 12 connected to the ground potential causes the substrate resistance AaK style n to increase. As a result, the t-potential of the substrate 4 and the isolation region 11 can be prevented from becoming higher than the ground potential, and floating oscillation can be prevented.
以上の1うに本発明に係る集積回路は複数のトランジス
タ全分離するアイソレーション領域の上層に、接地電位
に接続させるべき配線層を形成しであるこるを特徴とす
るものであるのでサブストレートに流れる寄生電流を有
効に吸い上ケ、フロラキング発振を防止することが可能
となる。As mentioned above, the integrated circuit according to the present invention is characterized in that a wiring layer to be connected to the ground potential is formed on the upper layer of the isolation region that completely isolates a plurality of transistors, so that the wiring layer that is connected to the ground potential flows to the substrate. It becomes possible to effectively absorb parasitic current and prevent floating oscillation.
なお、本発明はPNP型トランジスタにも適用できる。Note that the present invention can also be applied to PNP type transistors.
図面は本発明の笑施例す示すものであって、第1図は不
発明に係る集積回路の要部の平面パターン図、第2図は
その略示断面構造図である。
l・・コレクタ領域 2・・・ベース領域 3・・・エ
ミッタ領域 4・・・サブストレート 7・・・コレク
タ配線 8・・・ベース配線 9・・・エミッタ配線
10・・・パワートランジスタ 11・・・アイソレー
ション領域 12・・・配線層 13・1・接地用パッ
ド特許出願人 三洋電機株式会社 外1名代理人 弁理
士 河 野 登 天The drawings show embodiments of the present invention, in which FIG. 1 is a plan pattern diagram of a main part of an integrated circuit according to the invention, and FIG. 2 is a schematic cross-sectional structural diagram thereof. l...Collector area 2...Base area 3...Emitter area 4...Substrate 7...Collector wiring 8...Base wiring 9...Emitter wiring
10...Power transistor 11...Isolation region 12...Wiring layer 13.1.Grounding pad Patent applicant Sanyo Electric Co., Ltd. and one other representative Patent attorney Noboru Kono
Claims (1)
域の上Nに、接地電位に接続させるべき配線層を形成し
であることを特徴とする集積回路。1. An integrated circuit characterized in that a wiring layer to be connected to a ground potential is formed above an isolation region separating a plurality of transistors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21979482A JPS59108326A (en) | 1982-12-14 | 1982-12-14 | Integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21979482A JPS59108326A (en) | 1982-12-14 | 1982-12-14 | Integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59108326A true JPS59108326A (en) | 1984-06-22 |
Family
ID=16741125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21979482A Pending JPS59108326A (en) | 1982-12-14 | 1982-12-14 | Integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59108326A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03173169A (en) * | 1989-11-17 | 1991-07-26 | Sgs Thomson Microelectron Srl | Monolythic vertical semiconx ductor power device provided with protection from parasitic current |
JPH05326844A (en) * | 1992-05-20 | 1993-12-10 | Nec Yamagata Ltd | Semiconductor integrated circuit |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4919776A (en) * | 1972-02-28 | 1974-02-21 | ||
JPS5012665B1 (en) * | 1970-05-19 | 1975-05-13 | ||
JPS52139390A (en) * | 1976-05-17 | 1977-11-21 | Hitachi Ltd | Semiconductor integrated circuit device |
-
1982
- 1982-12-14 JP JP21979482A patent/JPS59108326A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5012665B1 (en) * | 1970-05-19 | 1975-05-13 | ||
JPS4919776A (en) * | 1972-02-28 | 1974-02-21 | ||
JPS52139390A (en) * | 1976-05-17 | 1977-11-21 | Hitachi Ltd | Semiconductor integrated circuit device |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03173169A (en) * | 1989-11-17 | 1991-07-26 | Sgs Thomson Microelectron Srl | Monolythic vertical semiconx ductor power device provided with protection from parasitic current |
JPH05326844A (en) * | 1992-05-20 | 1993-12-10 | Nec Yamagata Ltd | Semiconductor integrated circuit |
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