JPS59107515A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS59107515A
JPS59107515A JP57216853A JP21685382A JPS59107515A JP S59107515 A JPS59107515 A JP S59107515A JP 57216853 A JP57216853 A JP 57216853A JP 21685382 A JP21685382 A JP 21685382A JP S59107515 A JPS59107515 A JP S59107515A
Authority
JP
Japan
Prior art keywords
mask
wafer
gap
exposure method
displacement meter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57216853A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0454963B2 (enrdf_load_stackoverflow
Inventor
Motoya Taniguchi
素也 谷口
Ryuichi Funatsu
隆一 船津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57216853A priority Critical patent/JPS59107515A/ja
Publication of JPS59107515A publication Critical patent/JPS59107515A/ja
Publication of JPH0454963B2 publication Critical patent/JPH0454963B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57216853A 1982-12-13 1982-12-13 Ｘ線露光装置 Granted JPS59107515A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57216853A JPS59107515A (ja) 1982-12-13 1982-12-13 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57216853A JPS59107515A (ja) 1982-12-13 1982-12-13 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS59107515A true JPS59107515A (ja) 1984-06-21
JPH0454963B2 JPH0454963B2 (enrdf_load_stackoverflow) 1992-09-01

Family

ID=16694926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57216853A Granted JPS59107515A (ja) 1982-12-13 1982-12-13 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS59107515A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63155723A (ja) * 1986-12-19 1988-06-28 Canon Inc 露光装置
JP2009021393A (ja) * 2007-07-12 2009-01-29 Toyota Motor Corp ビーム照射方法とビーム照射装置
EP2053714A3 (de) * 2007-10-23 2010-07-14 Bagela Baumaschinen GmbH & Co. KG Verfahren und Vorrichtung zum Entfernen und Weiterbehandeln von biegsamen, strangförmigen Gegenständen aus ihren Nutzungs-Lagerorten

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5243692A (en) * 1975-09-30 1977-04-05 Sumiyoshi Heavy Ind Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member
JPS52108776A (en) * 1976-03-09 1977-09-12 Nippon Telegr & Teleph Corp <Ntt> Pattern sticking device
JPS5410827A (en) * 1977-06-23 1979-01-26 Bosch Gmbh Robert Controller of fuel feeder for external ignition internal combustion engine that compress mixture
JPS5516457A (en) * 1978-07-24 1980-02-05 Nippon Telegr & Teleph Corp <Ntt> Gap detecting method
JPS5698829A (en) * 1980-01-10 1981-08-08 Toshiba Corp Gap setting device
JPS577931A (en) * 1980-06-18 1982-01-16 Toshiba Corp Method for measuring gap
JPS5784306A (en) * 1980-11-14 1982-05-26 Toshiba Corp Method for providing gap

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5243692A (en) * 1975-09-30 1977-04-05 Sumiyoshi Heavy Ind Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member
JPS52108776A (en) * 1976-03-09 1977-09-12 Nippon Telegr & Teleph Corp <Ntt> Pattern sticking device
JPS5410827A (en) * 1977-06-23 1979-01-26 Bosch Gmbh Robert Controller of fuel feeder for external ignition internal combustion engine that compress mixture
JPS5516457A (en) * 1978-07-24 1980-02-05 Nippon Telegr & Teleph Corp <Ntt> Gap detecting method
JPS5698829A (en) * 1980-01-10 1981-08-08 Toshiba Corp Gap setting device
JPS577931A (en) * 1980-06-18 1982-01-16 Toshiba Corp Method for measuring gap
JPS5784306A (en) * 1980-11-14 1982-05-26 Toshiba Corp Method for providing gap

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63155723A (ja) * 1986-12-19 1988-06-28 Canon Inc 露光装置
JP2009021393A (ja) * 2007-07-12 2009-01-29 Toyota Motor Corp ビーム照射方法とビーム照射装置
EP2053714A3 (de) * 2007-10-23 2010-07-14 Bagela Baumaschinen GmbH & Co. KG Verfahren und Vorrichtung zum Entfernen und Weiterbehandeln von biegsamen, strangförmigen Gegenständen aus ihren Nutzungs-Lagerorten

Also Published As

Publication number Publication date
JPH0454963B2 (enrdf_load_stackoverflow) 1992-09-01

Similar Documents

Publication Publication Date Title
KR100632890B1 (ko) 리소그래피 장치 등을 위한 마스크 클램핑장치
US4907021A (en) Projection exposure apparatus
US5593800A (en) Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
CN103415811B (zh) 静电夹具设备和光刻设备
JPS6349892B2 (enrdf_load_stackoverflow)
JPS6352453B2 (enrdf_load_stackoverflow)
JP2012104853A (ja) リソグラフィ装置および二重露光オーバレイ制御を用いたデバイス製造方法
JP3251362B2 (ja) 露光装置及び露光方法
KR20230158096A (ko) 개선된 오버레이를 위한 클램프 전극 변경
US10558126B2 (en) Lithographic apparatus and method
KR100734589B1 (ko) 기판 테이블, 기판의 위치를 측정하는 방법, 및 리소그래피장치
US5894132A (en) Charged-particle-beam projection-exposure apparatus with focus and tilt adjustments
US5291023A (en) Position detecting system utilizing a weight coefficient to determine a gravity center of light
JPH0855785A (ja) 露光方法とこれを用いたデバイス製造方法
JP3983488B2 (ja) リソグラフィ投影装置のためのオブジェクト位置決め方法
WO2018153654A1 (en) Method and apparatus for transforming measurement data of a photolithographic mask for the euv range from first surroundings into second surroundings
JPS59107515A (ja) Ｘ線露光装置
JPS5917247A (ja) 露光装置
JP4023262B2 (ja) アライメント方法、露光方法、露光装置およびマスクの製造方法
US5325414A (en) X-ray mask alignment method and apparatus therefor as well as X-ray mask to be used to said method and said apparatus
US6816568B2 (en) X-ray projection exposure device, X-ray projection exposure method, and semiconductor device
JP2006191046A (ja) 傾斜された焦点合わせを行う方法及び露光装置、並びにそれにしたがって製造されたデバイス
JP2614863B2 (ja) Ｘ線縮小投影露光装置
KR20030080192A (ko) 리소그래피 장치 및 디바이스 제조방법
CN113066748A (zh) 晶圆对准检测装置、光刻机、键合机及压印机