JPS5698829A - Gap setting device - Google Patents

Gap setting device

Info

Publication number
JPS5698829A
JPS5698829A JP158680A JP158680A JPS5698829A JP S5698829 A JPS5698829 A JP S5698829A JP 158680 A JP158680 A JP 158680A JP 158680 A JP158680 A JP 158680A JP S5698829 A JPS5698829 A JP S5698829A
Authority
JP
Japan
Prior art keywords
mask
wafer
amplitude
distance
interference light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP158680A
Other languages
Japanese (ja)
Inventor
Akira Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP158680A priority Critical patent/JPS5698829A/en
Publication of JPS5698829A publication Critical patent/JPS5698829A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/703—Gap setting, e.g. in proximity printer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Abstract

PURPOSE:To set the distance between a mask and a wafer with high velocity and high accuracy without any damage by measuring the amplitude of a vibration of either one of a mask or a wafer. CONSTITUTION:When a mask 7 is allowed to vibrate by an oscillator 5, a mask 7 vibrates since the air between the mask 7 and a wafer 6 acts as a damper. The action of the damper changes corresponding to the distance (d) and when the frequency of the oscillator 5 is constant, the amplitude decreases. Accordingly, when the amplitude of the wafer 7 is measured and the hight of the wafer stand 3 is controlled so that it may be equal to the amplitude which corresponds to the optimum distance previously set, the distance (d) is always set accurately. The laser reflects with a scanning line 10 and radiates on the mask 7 and the wafer 2 vertically through the mirror 11, and reflective light thereof is catched by a sensor 12 as an interference light thereof is catched by a senser 12 as an interference light through the mirror 11. The interference light is photoelectric transformed and the vibration and the amplitude of the mask 7 are calculated, whereby the stand 2 is allowed to raise or lowered. By this method, the distance (d) is controlled with high accuracy and high velocity.
JP158680A 1980-01-10 1980-01-10 Gap setting device Pending JPS5698829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP158680A JPS5698829A (en) 1980-01-10 1980-01-10 Gap setting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP158680A JPS5698829A (en) 1980-01-10 1980-01-10 Gap setting device

Publications (1)

Publication Number Publication Date
JPS5698829A true JPS5698829A (en) 1981-08-08

Family

ID=11505615

Family Applications (1)

Application Number Title Priority Date Filing Date
JP158680A Pending JPS5698829A (en) 1980-01-10 1980-01-10 Gap setting device

Country Status (1)

Country Link
JP (1) JPS5698829A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107515A (en) * 1982-12-13 1984-06-21 Hitachi Ltd Gap control type exposure method
JPS59158521A (en) * 1983-02-26 1984-09-08 Nippon Telegr & Teleph Corp <Ntt> Positioning control method using double diffraction grating
JPS60143632A (en) * 1983-12-19 1985-07-29 Yokogawa Hewlett Packard Ltd Alignment device
JPS60173835A (en) * 1984-01-30 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Controlling method of gap by diffraction grating
JPS61168226A (en) * 1985-01-21 1986-07-29 Nippon Telegr & Teleph Corp <Ntt> Apparatus for adjusting gap between two bodies using diffraction grating
JP2007149722A (en) * 2005-11-24 2007-06-14 Canon Inc Pressurization processing equipment, pressurization processing method and pressurization processing mold

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107515A (en) * 1982-12-13 1984-06-21 Hitachi Ltd Gap control type exposure method
JPH0454963B2 (en) * 1982-12-13 1992-09-01 Hitachi Ltd
JPS59158521A (en) * 1983-02-26 1984-09-08 Nippon Telegr & Teleph Corp <Ntt> Positioning control method using double diffraction grating
JPS60143632A (en) * 1983-12-19 1985-07-29 Yokogawa Hewlett Packard Ltd Alignment device
JPH038098B2 (en) * 1983-12-19 1991-02-05 Hewlett Packard Co
JPS60173835A (en) * 1984-01-30 1985-09-07 Nippon Telegr & Teleph Corp <Ntt> Controlling method of gap by diffraction grating
JPH0263288B2 (en) * 1984-01-30 1990-12-27 Nippon Telegraph & Telephone
JPS61168226A (en) * 1985-01-21 1986-07-29 Nippon Telegr & Teleph Corp <Ntt> Apparatus for adjusting gap between two bodies using diffraction grating
JPH0317212B2 (en) * 1985-01-21 1991-03-07 Nippon Telegraph & Telephone
JP2007149722A (en) * 2005-11-24 2007-06-14 Canon Inc Pressurization processing equipment, pressurization processing method and pressurization processing mold

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