JPS59105508A - 白色干渉膜厚測定方法 - Google Patents

白色干渉膜厚測定方法

Info

Publication number
JPS59105508A
JPS59105508A JP21590182A JP21590182A JPS59105508A JP S59105508 A JPS59105508 A JP S59105508A JP 21590182 A JP21590182 A JP 21590182A JP 21590182 A JP21590182 A JP 21590182A JP S59105508 A JPS59105508 A JP S59105508A
Authority
JP
Japan
Prior art keywords
film
film thickness
white
light
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21590182A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0449642B2 (en, 2012
Inventor
Mitsuo Takeda
光夫 武田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP21590182A priority Critical patent/JPS59105508A/ja
Publication of JPS59105508A publication Critical patent/JPS59105508A/ja
Publication of JPH0449642B2 publication Critical patent/JPH0449642B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP21590182A 1982-12-08 1982-12-08 白色干渉膜厚測定方法 Granted JPS59105508A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21590182A JPS59105508A (ja) 1982-12-08 1982-12-08 白色干渉膜厚測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21590182A JPS59105508A (ja) 1982-12-08 1982-12-08 白色干渉膜厚測定方法

Publications (2)

Publication Number Publication Date
JPS59105508A true JPS59105508A (ja) 1984-06-18
JPH0449642B2 JPH0449642B2 (en, 2012) 1992-08-12

Family

ID=16680124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21590182A Granted JPS59105508A (ja) 1982-12-08 1982-12-08 白色干渉膜厚測定方法

Country Status (1)

Country Link
JP (1) JPS59105508A (en, 2012)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61140806A (ja) * 1984-12-14 1986-06-27 Jeol Ltd 膜厚測定方法
JPS61200407A (ja) * 1985-03-01 1986-09-05 Hitachi Ltd フーリェ変換方式赤外線膜厚測定方法
US5227861A (en) * 1989-09-25 1993-07-13 Mitsubishi Denki Kabushiki Kaisha Apparatus for and method of evaluating multilayer thin film
JPH10325795A (ja) * 1996-08-04 1998-12-08 Matsushita Electric Ind Co Ltd 媒質の測定方法および測定装置
JP2001519190A (ja) * 1997-10-10 2001-10-23 マサチユセツツ・インスチチユート・オブ・テクノロジイ 組織形態の測定法
JP2007506071A (ja) * 2003-09-15 2007-03-15 ザイゴ　コーポレーション 表面の干渉分析のための方法およびシステムならびに関連する応用例
JP2007071685A (ja) * 2005-09-07 2007-03-22 Matsushita Electric Ind Co Ltd 界面の位置測定方法および位置測定装置
CN100432620C (zh) * 2005-06-16 2008-11-12 富士能株式会社 动体测定用干涉仪装置以及动体测定用光干涉测量方法
JP2017125685A (ja) * 2016-01-12 2017-07-20 レーザーテック株式会社 厚さ測定装置及び厚さ分布測定装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61140806A (ja) * 1984-12-14 1986-06-27 Jeol Ltd 膜厚測定方法
JPS61200407A (ja) * 1985-03-01 1986-09-05 Hitachi Ltd フーリェ変換方式赤外線膜厚測定方法
US5227861A (en) * 1989-09-25 1993-07-13 Mitsubishi Denki Kabushiki Kaisha Apparatus for and method of evaluating multilayer thin film
JPH10325795A (ja) * 1996-08-04 1998-12-08 Matsushita Electric Ind Co Ltd 媒質の測定方法および測定装置
JP2001519190A (ja) * 1997-10-10 2001-10-23 マサチユセツツ・インスチチユート・オブ・テクノロジイ 組織形態の測定法
JP2007506071A (ja) * 2003-09-15 2007-03-15 ザイゴ　コーポレーション 表面の干渉分析のための方法およびシステムならびに関連する応用例
CN100432620C (zh) * 2005-06-16 2008-11-12 富士能株式会社 动体测定用干涉仪装置以及动体测定用光干涉测量方法
JP2007071685A (ja) * 2005-09-07 2007-03-22 Matsushita Electric Ind Co Ltd 界面の位置測定方法および位置測定装置
JP2017125685A (ja) * 2016-01-12 2017-07-20 レーザーテック株式会社 厚さ測定装置及び厚さ分布測定装置

Also Published As

Publication number Publication date
JPH0449642B2 (en, 2012) 1992-08-12

Similar Documents

Publication Publication Date Title
CN100485312C (zh) 用于波前控制和改进的3d测量的方法和装置
US5398113A (en) Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms
US10635049B2 (en) Ellipsometry device and ellipsometry method
US20110149298A1 (en) Spatial wavefront analysis and 3d measurement
TW201944025A (zh) 多層堆疊結構之計量方法
Thompson Iv image formation with partially coherent light
EP1272823B1 (en) Spatial and spectral wavefront analysis and measurement
US10203195B2 (en) Noise reduction techniques, fractional bi-spectrum and fractional cross-correlation, and applications
US5452953A (en) Film thickness measurement of structures containing a scattering surface
US10054423B2 (en) Optical method and system for critical dimensions and thickness characterization
CN103592108A (zh) Ccd芯片调制传递函数测试装置及方法
TW202004121A (zh) 光學量測裝置及光學量測方法
US6535276B2 (en) Method for measuring the velocity of particles in a fluid medium in motion
JPS59105508A (ja) 白色干渉膜厚測定方法
JP2892075B2 (ja) 屈折率分布、透過波面の測定方法およびこの方法に用いる測定装置
JP3311497B2 (ja) フーリエ変換分光位相変調偏光解析法
CN110160624B (zh) 一种用于三维振动测量的光纤点衍射装置及测量方法
US10024783B2 (en) Interferometric ellipsometry and method using conical refraction
JPS59164914A (ja) 光学式スケ−ル読取装置
KR102494082B1 (ko) 간섭과 파수 고주파 변조를 이용한 박막 두께와 형상을 측정하는 장치 및 그 장치를 이용한 박막 두께와 형상 측정 방법
JPS6271804A (ja) 膜厚測定装置
JP2728773B2 (ja) 半導体多層薄膜の膜厚評価装置及び膜厚評価方法
JP3864719B2 (ja) 膜厚測定方法及び膜厚測定装置
JPH01320409A (ja) 膜厚測定方法
CN118190878B (zh) 光纤型光谱共焦相干层析光学系统及应用