JPS59105499A - 着衣の洗浄及び特に放射性粒子で汚染された着衣から粒状汚染物を除去する方法及び装置 - Google Patents
着衣の洗浄及び特に放射性粒子で汚染された着衣から粒状汚染物を除去する方法及び装置Info
- Publication number
- JPS59105499A JPS59105499A JP58218563A JP21856383A JPS59105499A JP S59105499 A JPS59105499 A JP S59105499A JP 58218563 A JP58218563 A JP 58218563A JP 21856383 A JP21856383 A JP 21856383A JP S59105499 A JPS59105499 A JP S59105499A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- tank
- boiler
- cleaning
- clothing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 17
- 239000002245 particle Substances 0.000 title claims description 11
- 239000000356 contaminant Substances 0.000 title claims description 9
- 230000002285 radioactive effect Effects 0.000 title claims description 6
- 239000002904 solvent Substances 0.000 claims description 107
- 238000004140 cleaning Methods 0.000 claims description 41
- 238000004821 distillation Methods 0.000 claims description 27
- 238000011084 recovery Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 19
- 239000002699 waste material Substances 0.000 claims description 15
- 238000011109 contamination Methods 0.000 claims description 14
- 230000008929 regeneration Effects 0.000 claims description 13
- 238000011069 regeneration method Methods 0.000 claims description 13
- 238000005202 decontamination Methods 0.000 claims description 8
- 230000003588 decontaminative effect Effects 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 8
- 230000005484 gravity Effects 0.000 claims description 8
- 238000001035 drying Methods 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- 239000000835 fiber Substances 0.000 claims description 5
- 238000005108 dry cleaning Methods 0.000 claims description 4
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 230000003247 decreasing effect Effects 0.000 claims description 3
- 239000011148 porous material Substances 0.000 claims description 3
- 238000011049 filling Methods 0.000 claims description 2
- 238000000746 purification Methods 0.000 claims description 2
- 230000005855 radiation Effects 0.000 claims description 2
- 230000002159 abnormal effect Effects 0.000 claims 1
- 230000003111 delayed effect Effects 0.000 claims 1
- 238000000605 extraction Methods 0.000 claims 1
- 239000012530 fluid Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229920001084 poly(chloroprene) Polymers 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000004891 communication Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- 229920001410 Microfiber Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000003028 elevating effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000003658 microfiber Substances 0.000 description 1
- 238000011045 prefiltration Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
- G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
- G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
- D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
- D06F43/08—Associated apparatus for handling and recovering the solvents
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S159/00—Concentrating evaporators
- Y10S159/12—Radioactive
Landscapes
- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Food Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Accessory Of Washing/Drying Machine, Commercial Washing/Drying Machine, Other Washing/Drying Machine (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8219457 | 1982-11-19 | ||
| FR8219457A FR2536433A1 (fr) | 1982-11-19 | 1982-11-19 | Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59105499A true JPS59105499A (ja) | 1984-06-18 |
Family
ID=9279359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58218563A Pending JPS59105499A (ja) | 1982-11-19 | 1983-11-18 | 着衣の洗浄及び特に放射性粒子で汚染された着衣から粒状汚染物を除去する方法及び装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4601181A (https=) |
| EP (1) | EP0110760A1 (https=) |
| JP (1) | JPS59105499A (https=) |
| FR (1) | FR2536433A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR200458209Y1 (ko) | 2009-07-23 | 2012-01-30 | 김원희 | 스포팅 머신 |
Families Citing this family (69)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4797128A (en) * | 1984-12-10 | 1989-01-10 | Quadrex Hps, Inc. | Method of and apparatus for cleaning garments and soft goods contaminated with nuclear, chemical and/or biological contaminants |
| US4781041A (en) * | 1984-12-10 | 1988-11-01 | Quadrex Hps, Inc. | Apparatus for cleaning garments and soft goods contaminated with nuclear, chemical and/or biological contaminants |
| US4917807A (en) * | 1986-02-21 | 1990-04-17 | Westinghouse Electric Corp. | Method for recovering solvent |
| US4770197A (en) * | 1986-02-21 | 1988-09-13 | Westinghouse Electric Corp. | Apparatus for recovering solvent |
| US4955403A (en) * | 1988-11-30 | 1990-09-11 | Westinghouse Electric Corp. | Closed loop system and method for cleaning articles with a volatile cleaning solvent |
| US5090221A (en) * | 1988-11-30 | 1992-02-25 | Westinghouse Electric Corp. | Continuous circulation water wash apparatus and method for cleaning radioactively contaminated garments |
| US4879888A (en) * | 1988-12-12 | 1989-11-14 | Moshe Suissa | Dry cleaning machine |
| US5248393A (en) * | 1990-01-31 | 1993-09-28 | S&K Products International, Inc. | Solvent reprocessing system |
| US5538025A (en) * | 1991-11-05 | 1996-07-23 | Serec Partners | Solvent cleaning system |
| US5702535A (en) * | 1991-11-05 | 1997-12-30 | Gebhard-Gray Associates | Dry cleaning and degreasing system |
| US5630434A (en) * | 1991-11-05 | 1997-05-20 | Gray; Donald J. | Filter regeneration system |
| US5308452A (en) * | 1992-01-31 | 1994-05-03 | Progressive Recovery, Inc. | Photopolymer washout fluid solvent distillation apparatus and method |
| US5377705A (en) * | 1993-09-16 | 1995-01-03 | Autoclave Engineers, Inc. | Precision cleaning system |
| JPH0882697A (ja) * | 1994-09-13 | 1996-03-26 | Morikawa Sangyo Kk | 放射性汚染物の除染方法及び除染装置 |
| US6045588A (en) | 1997-04-29 | 2000-04-04 | Whirlpool Corporation | Non-aqueous washing apparatus and method |
| US6306564B1 (en) | 1997-05-27 | 2001-10-23 | Tokyo Electron Limited | Removal of resist or residue from semiconductors using supercritical carbon dioxide |
| US6500605B1 (en) | 1997-05-27 | 2002-12-31 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| TW539918B (en) | 1997-05-27 | 2003-07-01 | Tokyo Electron Ltd | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| US5946945A (en) * | 1997-12-24 | 1999-09-07 | Kegler; Andrew | High pressure liquid/gas storage frame for a pressurized liquid cleaning apparatus |
| US6277753B1 (en) | 1998-09-28 | 2001-08-21 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
| US6334340B1 (en) * | 1999-10-08 | 2002-01-01 | Alliance Laundry Systems Llc | Liquified gas dry-cleaning machine with convertible installation configuration |
| US6748960B1 (en) * | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
| KR100744888B1 (ko) * | 1999-11-02 | 2007-08-01 | 동경 엘렉트론 주식회사 | 소재를 초임계 처리하기 위한 장치 및 방법 |
| US6890853B2 (en) * | 2000-04-25 | 2005-05-10 | Tokyo Electron Limited | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| US7513132B2 (en) * | 2003-10-31 | 2009-04-07 | Whirlpool Corporation | Non-aqueous washing machine with modular construction |
| AU2001290171A1 (en) * | 2000-07-26 | 2002-02-05 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
| EP1573779A4 (en) * | 2001-04-10 | 2006-11-15 | Tokyo Electron Ltd | HIGH PRESSURE PROCESSING CHAMBER FOR A SEMICONDUCTOR SUBSTRATE WITH FLOW IMPROVEMENT FEATURES |
| US20050115005A1 (en) * | 2001-07-17 | 2005-06-02 | Kohei Sawa | Dry cleaning machine and method of dry cleaning |
| US20040040660A1 (en) * | 2001-10-03 | 2004-03-04 | Biberger Maximilian Albert | High pressure processing chamber for multiple semiconductor substrates |
| US7001468B1 (en) | 2002-02-15 | 2006-02-21 | Tokyo Electron Limited | Pressure energized pressure vessel opening and closing device and method of providing therefor |
| JP2005517884A (ja) * | 2002-02-15 | 2005-06-16 | 東京エレクトロン株式会社 | 圧力強化ダイヤフラム弁 |
| US7387868B2 (en) * | 2002-03-04 | 2008-06-17 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
| US20040112409A1 (en) * | 2002-12-16 | 2004-06-17 | Supercritical Sysems, Inc. | Fluoride in supercritical fluid for photoresist and residue removal |
| US7021635B2 (en) * | 2003-02-06 | 2006-04-04 | Tokyo Electron Limited | Vacuum chuck utilizing sintered material and method of providing thereof |
| US20040154647A1 (en) * | 2003-02-07 | 2004-08-12 | Supercritical Systems, Inc. | Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing |
| US7077917B2 (en) * | 2003-02-10 | 2006-07-18 | Tokyo Electric Limited | High-pressure processing chamber for a semiconductor wafer |
| US7225820B2 (en) * | 2003-02-10 | 2007-06-05 | Tokyo Electron Limited | High-pressure processing chamber for a semiconductor wafer |
| US7270137B2 (en) | 2003-04-28 | 2007-09-18 | Tokyo Electron Limited | Apparatus and method of securing a workpiece during high-pressure processing |
| US7163380B2 (en) * | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
| US20050035514A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Vacuum chuck apparatus and method for holding a wafer during high pressure processing |
| US20050034660A1 (en) * | 2003-08-11 | 2005-02-17 | Supercritical Systems, Inc. | Alignment means for chamber closure to reduce wear on surfaces |
| US20050067002A1 (en) * | 2003-09-25 | 2005-03-31 | Supercritical Systems, Inc. | Processing chamber including a circulation loop integrally formed in a chamber housing |
| US7739891B2 (en) | 2003-10-31 | 2010-06-22 | Whirlpool Corporation | Fabric laundering apparatus adapted for using a select rinse fluid |
| US7186093B2 (en) * | 2004-10-05 | 2007-03-06 | Tokyo Electron Limited | Method and apparatus for cooling motor bearings of a high pressure pump |
| US20050224099A1 (en) * | 2004-04-13 | 2005-10-13 | Luckman Joel A | Method and apparatus for cleaning objects in an automatic cleaning appliance using an oxidizing agent |
| WO2005106105A1 (en) | 2004-04-29 | 2005-11-10 | Unilever N.V. | Dry cleaning method |
| US7250374B2 (en) | 2004-06-30 | 2007-07-31 | Tokyo Electron Limited | System and method for processing a substrate using supercritical carbon dioxide processing |
| US7307019B2 (en) | 2004-09-29 | 2007-12-11 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
| US20060065189A1 (en) * | 2004-09-30 | 2006-03-30 | Darko Babic | Method and system for homogenization of supercritical fluid in a high pressure processing system |
| US7491036B2 (en) | 2004-11-12 | 2009-02-17 | Tokyo Electron Limited | Method and system for cooling a pump |
| US20060134332A1 (en) * | 2004-12-22 | 2006-06-22 | Darko Babic | Precompressed coating of internal members in a supercritical fluid processing system |
| US7434590B2 (en) | 2004-12-22 | 2008-10-14 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
| US7140393B2 (en) | 2004-12-22 | 2006-11-28 | Tokyo Electron Limited | Non-contact shuttle valve for flow diversion in high pressure systems |
| US7435447B2 (en) | 2005-02-15 | 2008-10-14 | Tokyo Electron Limited | Method and system for determining flow conditions in a high pressure processing system |
| US7291565B2 (en) | 2005-02-15 | 2007-11-06 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
| US7767145B2 (en) * | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
| US7380984B2 (en) * | 2005-03-28 | 2008-06-03 | Tokyo Electron Limited | Process flow thermocouple |
| US20060225772A1 (en) * | 2005-03-29 | 2006-10-12 | Jones William D | Controlled pressure differential in a high-pressure processing chamber |
| US7494107B2 (en) * | 2005-03-30 | 2009-02-24 | Supercritical Systems, Inc. | Gate valve for plus-atmospheric pressure semiconductor process vessels |
| US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
| US7966684B2 (en) | 2005-05-23 | 2011-06-28 | Whirlpool Corporation | Methods and apparatus to accelerate the drying of aqueous working fluids |
| US20060260064A1 (en) * | 2005-05-23 | 2006-11-23 | Luckman Joel A | Methods and apparatus for laundering with aqueous and non-aqueous working fluid |
| US7524383B2 (en) | 2005-05-25 | 2009-04-28 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
| US20070044427A1 (en) * | 2005-08-26 | 2007-03-01 | Atomic Energy Council - Institute Of Nuclear Energy Research | Submarine ultrasonic cleaning machine |
| US8470136B2 (en) * | 2010-02-02 | 2013-06-25 | Safety-Kleen Systems, Inc. | Parts washer with recycler assembly |
| US8470137B2 (en) * | 2010-02-02 | 2013-06-25 | Safety-Kleen Systems, Inc. | Recycler assembly |
| US8506761B2 (en) * | 2010-02-02 | 2013-08-13 | Safety-Kleen Systems, Inc. | Recycler module for a recycler assembly |
| US8425732B2 (en) * | 2010-02-02 | 2013-04-23 | Safety-Kleen Systems, Inc. | Method of operation for a recycler assembly |
| US8470138B2 (en) * | 2010-02-02 | 2013-06-25 | Safety-Kleen Systems, Inc. | Odor mitigation in a recycler assembly |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1027563A (en) * | 1911-08-18 | 1912-05-28 | George W Priest | Apparatus for manufacturing varnish for coating leather. |
| FR516003A (fr) * | 1920-05-26 | 1921-04-12 | Marcel Gourdier | Alambic perfectionné pour la distillation des plantes aromatiques |
| US2053103A (en) * | 1929-09-26 | 1936-09-01 | Columbia Appliance Corp | Dry cleaning apparatus |
| US2357869A (en) * | 1942-04-01 | 1944-09-12 | Leo M Beckwith | Portable water still |
| US2404722A (en) * | 1942-06-17 | 1946-07-23 | Du Pont | Acrylonitrile polymer solutions |
| FR1055438A (fr) * | 1951-05-05 | 1954-02-18 | Faudi Feinbau | Dispositif et procédé pour la récupération des solvants |
| US3011956A (en) * | 1960-03-15 | 1961-12-05 | Detrex Chem Ind | Automatic drycleaning still |
| DE1410806C3 (de) * | 1960-12-23 | 1974-02-28 | Boewe Boehler & Weber Kg Maschinenfabrik, 8900 Augsburg | Chemische Reinigungsmaschine für Desinfektionszwecke |
| US3391550A (en) * | 1962-05-28 | 1968-07-09 | L T Ind Inc | Drycleaning machine |
| US3426555A (en) * | 1964-06-26 | 1969-02-11 | Charles E Mccutcheon Jr | Dry cleaning |
| FR1470582A (fr) * | 1966-03-03 | 1967-02-24 | Dispositif de contrôle de la distillation du solvant dans les machines de dégraissage et de nettoyage à sec | |
| US3404722A (en) * | 1966-07-19 | 1968-10-08 | Army Usa | Disposable radioactive liquid waste concentrator |
| DE1614497A1 (de) * | 1967-04-12 | 1970-08-20 | Siemens Ag | Verfahren zur Konzentrierung radioaktiver Abfaelle |
| DE1802621A1 (de) * | 1968-10-11 | 1970-07-16 | Express Reinigung Theo Flamm | Destillations-Rueckstand-Entleerer fuer chemische Reinigungsmaschinen |
| DE2004650A1 (de) * | 1969-02-13 | 1970-09-03 | Apaw S.A., Freiburg (Schweiz) | Maschine zur Trockenreinigung von Textilien, insbesondere von Kleidungsstücken |
| FR2116646A5 (https=) * | 1970-12-02 | 1972-07-21 | Bouffartigue Odette | |
| US3692467A (en) * | 1971-07-06 | 1972-09-19 | Textile Technology | Textile treating processes and apparatus involving both water and an immiscible solvent |
| GB1408263A (en) * | 1971-08-27 | 1975-10-01 | Neil & Spencer Ltd | Dry cleaning apparatus |
| FR2174760B1 (https=) * | 1972-03-06 | 1975-10-24 | Robatel Slpi | |
| US3992300A (en) * | 1972-09-27 | 1976-11-16 | Trw Inc. | Apparatus for controlling iron content of a zinc phosphating bath |
| US3974528A (en) * | 1975-08-07 | 1976-08-17 | Chrysler Corporation | Sewage system with reusable flush medium |
| DE2615188A1 (de) * | 1976-04-08 | 1977-10-13 | Rolf H Dipl Ing Huebner | Anlage zur ueberwachung des loesemittelgehaltes der luft |
| DE2830897A1 (de) * | 1977-07-22 | 1979-02-01 | Pelt & Hooykaas | Verfahren fuer die behandlung von aus mehreren stoffen zusammengesetzten, nassen filterrueckstaenden |
| GB2038885B (en) * | 1978-11-09 | 1983-07-20 | Health Physics Systems Inc | Method of and apparatus for decontaminating radioactive garments |
-
1982
- 1982-11-19 FR FR8219457A patent/FR2536433A1/fr active Granted
-
1983
- 1983-11-10 EP EP83402178A patent/EP0110760A1/fr not_active Ceased
- 1983-11-17 US US06/552,971 patent/US4601181A/en not_active Expired - Fee Related
- 1983-11-18 JP JP58218563A patent/JPS59105499A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR200458209Y1 (ko) | 2009-07-23 | 2012-01-30 | 김원희 | 스포팅 머신 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2536433B1 (https=) | 1985-05-03 |
| EP0110760A1 (fr) | 1984-06-13 |
| US4601181A (en) | 1986-07-22 |
| FR2536433A1 (fr) | 1984-05-25 |
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