FR2536433B1 - - Google Patents

Info

Publication number
FR2536433B1
FR2536433B1 FR8219457A FR8219457A FR2536433B1 FR 2536433 B1 FR2536433 B1 FR 2536433B1 FR 8219457 A FR8219457 A FR 8219457A FR 8219457 A FR8219457 A FR 8219457A FR 2536433 B1 FR2536433 B1 FR 2536433B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8219457A
Other languages
French (fr)
Other versions
FR2536433A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR8219457A priority Critical patent/FR2536433A1/fr
Priority to EP83402178A priority patent/EP0110760A1/fr
Priority to US06/552,971 priority patent/US4601181A/en
Priority to JP58218563A priority patent/JPS59105499A/ja
Publication of FR2536433A1 publication Critical patent/FR2536433A1/fr
Application granted granted Critical
Publication of FR2536433B1 publication Critical patent/FR2536433B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21F—PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F9/00—Treating radioactively contaminated material; Decontamination arrangements therefor
    • G21F9/001—Decontamination of contaminated objects, apparatus, clothes, food; Preventing contamination thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06F—LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILE ARTICLES
    • D06F43/00—Dry-cleaning apparatus or methods using volatile solvents
    • D06F43/08—Associated apparatus for handling and recovering the solvents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S159/00—Concentrating evaporators
    • Y10S159/12—Radioactive

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Food Science & Technology (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Accessory Of Washing/Drying Machine, Commercial Washing/Drying Machine, Other Washing/Drying Machine (AREA)
FR8219457A 1982-11-19 1982-11-19 Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives Granted FR2536433A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8219457A FR2536433A1 (fr) 1982-11-19 1982-11-19 Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives
EP83402178A EP0110760A1 (fr) 1982-11-19 1983-11-10 Installation de nettoyage et décontamination particulaire de vêtements, notamment de vêtements contaminés par des particules radioactives
US06/552,971 US4601181A (en) 1982-11-19 1983-11-17 Installation for cleaning clothes and removal of particulate contaminants especially from clothing contaminated by radioactive particles
JP58218563A JPS59105499A (ja) 1982-11-19 1983-11-18 着衣の洗浄及び特に放射性粒子で汚染された着衣から粒状汚染物を除去する方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8219457A FR2536433A1 (fr) 1982-11-19 1982-11-19 Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives

Publications (2)

Publication Number Publication Date
FR2536433A1 FR2536433A1 (fr) 1984-05-25
FR2536433B1 true FR2536433B1 (https=) 1985-05-03

Family

ID=9279359

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8219457A Granted FR2536433A1 (fr) 1982-11-19 1982-11-19 Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives

Country Status (4)

Country Link
US (1) US4601181A (https=)
EP (1) EP0110760A1 (https=)
JP (1) JPS59105499A (https=)
FR (1) FR2536433A1 (https=)

Families Citing this family (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4797128A (en) * 1984-12-10 1989-01-10 Quadrex Hps, Inc. Method of and apparatus for cleaning garments and soft goods contaminated with nuclear, chemical and/or biological contaminants
US4781041A (en) * 1984-12-10 1988-11-01 Quadrex Hps, Inc. Apparatus for cleaning garments and soft goods contaminated with nuclear, chemical and/or biological contaminants
US4917807A (en) * 1986-02-21 1990-04-17 Westinghouse Electric Corp. Method for recovering solvent
US4770197A (en) * 1986-02-21 1988-09-13 Westinghouse Electric Corp. Apparatus for recovering solvent
US4955403A (en) * 1988-11-30 1990-09-11 Westinghouse Electric Corp. Closed loop system and method for cleaning articles with a volatile cleaning solvent
US5090221A (en) * 1988-11-30 1992-02-25 Westinghouse Electric Corp. Continuous circulation water wash apparatus and method for cleaning radioactively contaminated garments
US4879888A (en) * 1988-12-12 1989-11-14 Moshe Suissa Dry cleaning machine
US5248393A (en) * 1990-01-31 1993-09-28 S&K Products International, Inc. Solvent reprocessing system
US5538025A (en) * 1991-11-05 1996-07-23 Serec Partners Solvent cleaning system
US5702535A (en) * 1991-11-05 1997-12-30 Gebhard-Gray Associates Dry cleaning and degreasing system
US5630434A (en) * 1991-11-05 1997-05-20 Gray; Donald J. Filter regeneration system
US5308452A (en) * 1992-01-31 1994-05-03 Progressive Recovery, Inc. Photopolymer washout fluid solvent distillation apparatus and method
US5377705A (en) * 1993-09-16 1995-01-03 Autoclave Engineers, Inc. Precision cleaning system
JPH0882697A (ja) * 1994-09-13 1996-03-26 Morikawa Sangyo Kk 放射性汚染物の除染方法及び除染装置
US6045588A (en) 1997-04-29 2000-04-04 Whirlpool Corporation Non-aqueous washing apparatus and method
US6306564B1 (en) 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
US6500605B1 (en) 1997-05-27 2002-12-31 Tokyo Electron Limited Removal of photoresist and residue from substrate using supercritical carbon dioxide process
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US5946945A (en) * 1997-12-24 1999-09-07 Kegler; Andrew High pressure liquid/gas storage frame for a pressurized liquid cleaning apparatus
US6277753B1 (en) 1998-09-28 2001-08-21 Supercritical Systems Inc. Removal of CMP residue from semiconductors using supercritical carbon dioxide process
US6334340B1 (en) * 1999-10-08 2002-01-01 Alliance Laundry Systems Llc Liquified gas dry-cleaning machine with convertible installation configuration
US6748960B1 (en) * 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
KR100744888B1 (ko) * 1999-11-02 2007-08-01 동경 엘렉트론 주식회사 소재를 초임계 처리하기 위한 장치 및 방법
US6890853B2 (en) * 2000-04-25 2005-05-10 Tokyo Electron Limited Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
US7513132B2 (en) * 2003-10-31 2009-04-07 Whirlpool Corporation Non-aqueous washing machine with modular construction
AU2001290171A1 (en) * 2000-07-26 2002-02-05 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
EP1573779A4 (en) * 2001-04-10 2006-11-15 Tokyo Electron Ltd HIGH PRESSURE PROCESSING CHAMBER FOR A SEMICONDUCTOR SUBSTRATE WITH FLOW IMPROVEMENT FEATURES
US20050115005A1 (en) * 2001-07-17 2005-06-02 Kohei Sawa Dry cleaning machine and method of dry cleaning
US20040040660A1 (en) * 2001-10-03 2004-03-04 Biberger Maximilian Albert High pressure processing chamber for multiple semiconductor substrates
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
JP2005517884A (ja) * 2002-02-15 2005-06-16 東京エレクトロン株式会社 圧力強化ダイヤフラム弁
US7387868B2 (en) * 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
US20040112409A1 (en) * 2002-12-16 2004-06-17 Supercritical Sysems, Inc. Fluoride in supercritical fluid for photoresist and residue removal
US7021635B2 (en) * 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US20040154647A1 (en) * 2003-02-07 2004-08-12 Supercritical Systems, Inc. Method and apparatus of utilizing a coating for enhanced holding of a semiconductor substrate during high pressure processing
US7077917B2 (en) * 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en) * 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7163380B2 (en) * 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US20050035514A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Vacuum chuck apparatus and method for holding a wafer during high pressure processing
US20050034660A1 (en) * 2003-08-11 2005-02-17 Supercritical Systems, Inc. Alignment means for chamber closure to reduce wear on surfaces
US20050067002A1 (en) * 2003-09-25 2005-03-31 Supercritical Systems, Inc. Processing chamber including a circulation loop integrally formed in a chamber housing
US7739891B2 (en) 2003-10-31 2010-06-22 Whirlpool Corporation Fabric laundering apparatus adapted for using a select rinse fluid
US7186093B2 (en) * 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US20050224099A1 (en) * 2004-04-13 2005-10-13 Luckman Joel A Method and apparatus for cleaning objects in an automatic cleaning appliance using an oxidizing agent
WO2005106105A1 (en) 2004-04-29 2005-11-10 Unilever N.V. Dry cleaning method
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
US20060065189A1 (en) * 2004-09-30 2006-03-30 Darko Babic Method and system for homogenization of supercritical fluid in a high pressure processing system
US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US20060134332A1 (en) * 2004-12-22 2006-06-22 Darko Babic Precompressed coating of internal members in a supercritical fluid processing system
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7767145B2 (en) * 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7380984B2 (en) * 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US20060225772A1 (en) * 2005-03-29 2006-10-12 Jones William D Controlled pressure differential in a high-pressure processing chamber
US7494107B2 (en) * 2005-03-30 2009-02-24 Supercritical Systems, Inc. Gate valve for plus-atmospheric pressure semiconductor process vessels
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7966684B2 (en) 2005-05-23 2011-06-28 Whirlpool Corporation Methods and apparatus to accelerate the drying of aqueous working fluids
US20060260064A1 (en) * 2005-05-23 2006-11-23 Luckman Joel A Methods and apparatus for laundering with aqueous and non-aqueous working fluid
US7524383B2 (en) 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
US20070044427A1 (en) * 2005-08-26 2007-03-01 Atomic Energy Council - Institute Of Nuclear Energy Research Submarine ultrasonic cleaning machine
KR200458209Y1 (ko) 2009-07-23 2012-01-30 김원희 스포팅 머신
US8470136B2 (en) * 2010-02-02 2013-06-25 Safety-Kleen Systems, Inc. Parts washer with recycler assembly
US8470137B2 (en) * 2010-02-02 2013-06-25 Safety-Kleen Systems, Inc. Recycler assembly
US8506761B2 (en) * 2010-02-02 2013-08-13 Safety-Kleen Systems, Inc. Recycler module for a recycler assembly
US8425732B2 (en) * 2010-02-02 2013-04-23 Safety-Kleen Systems, Inc. Method of operation for a recycler assembly
US8470138B2 (en) * 2010-02-02 2013-06-25 Safety-Kleen Systems, Inc. Odor mitigation in a recycler assembly

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1027563A (en) * 1911-08-18 1912-05-28 George W Priest Apparatus for manufacturing varnish for coating leather.
FR516003A (fr) * 1920-05-26 1921-04-12 Marcel Gourdier Alambic perfectionné pour la distillation des plantes aromatiques
US2053103A (en) * 1929-09-26 1936-09-01 Columbia Appliance Corp Dry cleaning apparatus
US2357869A (en) * 1942-04-01 1944-09-12 Leo M Beckwith Portable water still
US2404722A (en) * 1942-06-17 1946-07-23 Du Pont Acrylonitrile polymer solutions
FR1055438A (fr) * 1951-05-05 1954-02-18 Faudi Feinbau Dispositif et procédé pour la récupération des solvants
US3011956A (en) * 1960-03-15 1961-12-05 Detrex Chem Ind Automatic drycleaning still
DE1410806C3 (de) * 1960-12-23 1974-02-28 Boewe Boehler & Weber Kg Maschinenfabrik, 8900 Augsburg Chemische Reinigungsmaschine für Desinfektionszwecke
US3391550A (en) * 1962-05-28 1968-07-09 L T Ind Inc Drycleaning machine
US3426555A (en) * 1964-06-26 1969-02-11 Charles E Mccutcheon Jr Dry cleaning
FR1470582A (fr) * 1966-03-03 1967-02-24 Dispositif de contrôle de la distillation du solvant dans les machines de dégraissage et de nettoyage à sec
US3404722A (en) * 1966-07-19 1968-10-08 Army Usa Disposable radioactive liquid waste concentrator
DE1614497A1 (de) * 1967-04-12 1970-08-20 Siemens Ag Verfahren zur Konzentrierung radioaktiver Abfaelle
DE1802621A1 (de) * 1968-10-11 1970-07-16 Express Reinigung Theo Flamm Destillations-Rueckstand-Entleerer fuer chemische Reinigungsmaschinen
DE2004650A1 (de) * 1969-02-13 1970-09-03 Apaw S.A., Freiburg (Schweiz) Maschine zur Trockenreinigung von Textilien, insbesondere von Kleidungsstücken
FR2116646A5 (https=) * 1970-12-02 1972-07-21 Bouffartigue Odette
US3692467A (en) * 1971-07-06 1972-09-19 Textile Technology Textile treating processes and apparatus involving both water and an immiscible solvent
GB1408263A (en) * 1971-08-27 1975-10-01 Neil & Spencer Ltd Dry cleaning apparatus
FR2174760B1 (https=) * 1972-03-06 1975-10-24 Robatel Slpi
US3992300A (en) * 1972-09-27 1976-11-16 Trw Inc. Apparatus for controlling iron content of a zinc phosphating bath
US3974528A (en) * 1975-08-07 1976-08-17 Chrysler Corporation Sewage system with reusable flush medium
DE2615188A1 (de) * 1976-04-08 1977-10-13 Rolf H Dipl Ing Huebner Anlage zur ueberwachung des loesemittelgehaltes der luft
DE2830897A1 (de) * 1977-07-22 1979-02-01 Pelt & Hooykaas Verfahren fuer die behandlung von aus mehreren stoffen zusammengesetzten, nassen filterrueckstaenden
GB2038885B (en) * 1978-11-09 1983-07-20 Health Physics Systems Inc Method of and apparatus for decontaminating radioactive garments

Also Published As

Publication number Publication date
JPS59105499A (ja) 1984-06-18
EP0110760A1 (fr) 1984-06-13
US4601181A (en) 1986-07-22
FR2536433A1 (fr) 1984-05-25

Similar Documents

Publication Publication Date Title
FR2511252B1 (https=)
CH655405B (https=)
FR2519822B1 (https=)
DE3249743A1 (https=)
FR2519336B1 (https=)
DE3347880A1 (https=)
CH655440B (https=)
CH670543GA3 (https=)
FR2519844B1 (https=)
CH655524B (https=)
FR2519985B1 (https=)
CH655464B (https=)
FR2519523B1 (https=)
FR2519527B1 (https=)
FR2519402B1 (https=)
CH655407B (https=)
FR2519914B3 (https=)
FR2520063B3 (https=)
FR2519745B3 (https=)
FR2519391B3 (https=)
FR2519660B1 (https=)
CH669703GA3 (https=)
CH657125B (https=)
FR2519849B1 (https=)
CH656692B (https=)

Legal Events

Date Code Title Description
ST Notification of lapse