JPS5893259A - 絶縁層の平坦化方法 - Google Patents
絶縁層の平坦化方法Info
- Publication number
- JPS5893259A JPS5893259A JP19216581A JP19216581A JPS5893259A JP S5893259 A JPS5893259 A JP S5893259A JP 19216581 A JP19216581 A JP 19216581A JP 19216581 A JP19216581 A JP 19216581A JP S5893259 A JPS5893259 A JP S5893259A
- Authority
- JP
- Japan
- Prior art keywords
- film
- insulating layer
- reactive ion
- etching
- disconnection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19216581A JPS5893259A (ja) | 1981-11-30 | 1981-11-30 | 絶縁層の平坦化方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19216581A JPS5893259A (ja) | 1981-11-30 | 1981-11-30 | 絶縁層の平坦化方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5893259A true JPS5893259A (ja) | 1983-06-02 |
| JPH0311543B2 JPH0311543B2 (OSRAM) | 1991-02-18 |
Family
ID=16286764
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19216581A Granted JPS5893259A (ja) | 1981-11-30 | 1981-11-30 | 絶縁層の平坦化方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5893259A (OSRAM) |
-
1981
- 1981-11-30 JP JP19216581A patent/JPS5893259A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0311543B2 (OSRAM) | 1991-02-18 |
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