JPS5876804A - シリコン回折格子の作製法 - Google Patents
シリコン回折格子の作製法Info
- Publication number
- JPS5876804A JPS5876804A JP17441281A JP17441281A JPS5876804A JP S5876804 A JPS5876804 A JP S5876804A JP 17441281 A JP17441281 A JP 17441281A JP 17441281 A JP17441281 A JP 17441281A JP S5876804 A JPS5876804 A JP S5876804A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction grating
- silicon
- layer
- silicon wafer
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17441281A JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17441281A JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5876804A true JPS5876804A (ja) | 1983-05-10 |
JPS6314321B2 JPS6314321B2 (enrdf_load_stackoverflow) | 1988-03-30 |
Family
ID=15978097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17441281A Granted JPS5876804A (ja) | 1981-11-02 | 1981-11-02 | シリコン回折格子の作製法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5876804A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6517734B1 (en) * | 2000-07-13 | 2003-02-11 | Network Photonics, Inc. | Grating fabrication process using combined crystalline-dependent and crystalline-independent etching |
JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0214628U (enrdf_load_stackoverflow) * | 1988-07-07 | 1990-01-30 | ||
JPH02126314U (enrdf_load_stackoverflow) * | 1989-03-28 | 1990-10-18 |
-
1981
- 1981-11-02 JP JP17441281A patent/JPS5876804A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6517734B1 (en) * | 2000-07-13 | 2003-02-11 | Network Photonics, Inc. | Grating fabrication process using combined crystalline-dependent and crystalline-independent etching |
JP2003075622A (ja) * | 2001-09-05 | 2003-03-12 | Toshiba Corp | 回折格子、回折格子の加工方法及び光学要素 |
Also Published As
Publication number | Publication date |
---|---|
JPS6314321B2 (enrdf_load_stackoverflow) | 1988-03-30 |
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