JPS58759B2 - Equipment for plating processing - Google Patents
Equipment for plating processingInfo
- Publication number
- JPS58759B2 JPS58759B2 JP3887980A JP3887980A JPS58759B2 JP S58759 B2 JPS58759 B2 JP S58759B2 JP 3887980 A JP3887980 A JP 3887980A JP 3887980 A JP3887980 A JP 3887980A JP S58759 B2 JPS58759 B2 JP S58759B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- plating solution
- printed wiring
- wiring board
- anode body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Description
【発明の詳細な説明】
本発明は鍍金加工用装置に係り、殊に鍍金加工を高速に
て行なうための装置に係る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for plating, and particularly to an apparatus for performing plating at high speed.
本発明装置による鍍金加工は主としてプリント配線基板
用を対象としており、従ってこれに関連して本発明を説
明する。The plating process performed by the apparatus of the present invention is mainly intended for printed wiring boards, and therefore the present invention will be described in connection with this.
プリント配線基板の鍍金加工に関してはその所要時間を
短縮するために従来から種々の方策が講じられて来た。Conventionally, various measures have been taken to shorten the time required for plating printed wiring boards.
即ち、一般的には、
(a) フィルタポンプとして強力なものを使用する
か又はこれとは別個のポンプを設は或は又空気を圧入し
て鍍金タンク内の鍍金液の強攪拌を行なうか
(b) 揺動式陰極を用い該陰極より懸吊され鍍金液
中に浸漬される被加ニブリント配線基板自体を揺動させ
るか
(C) 上記(a)及び(b)を併用
して所要時間の短縮を図っている。That is, in general: (a) Either a powerful filter pump is used, a separate pump is installed, or air is injected to strongly agitate the plating solution in the plating tank. (b) Either use an oscillating cathode and oscillate the Niblint wiring board itself, which is suspended from the cathode and immersed in the plating solution. (C) Use a combination of (a) and (b) above for the required time. We are trying to shorten the time.
これら慣用方法は被加工物たるプリント配線基板が小型
の場合には比較的有効であるが大型の場合には充分な効
果が期待できないと謂う欠陥が存する。These conventional methods are relatively effective when the printed wiring board to be processed is small in size, but have a drawback in that sufficient effects cannot be expected when the printed wiring board is large.
即ち大型基板の鍍金加工には相応して大型の陽極パネル
を必要としこれが邪魔板の役目を果たし斯くて被加工物
表面に均一な鍍金液流を生せしめて金属イオンの供給を
充分になすと共に発生する水素ガス泡の付着を阻止する
等の目的が達せられないからである。That is, plating a large substrate requires a correspondingly large anode panel, which acts as a baffle plate, thus creating a uniform plating solution flow on the surface of the workpiece and ensuring a sufficient supply of metal ions. This is because the purpose of preventing adhesion of generated hydrogen gas bubbles cannot be achieved.
一方長大ではあるが可撓性のプリント配線基板の鍍金加
工に際しては一般にroll −to −roll 方
式が採用されており、巻放しロール上に捲回された被加
ニブリント配線基板が長大な鍍金加工タンク内に上下に
配置された多数のロールを介して鍍金液中で多数回上下
運動した後に巻取りロールにより巻上げられるようにな
されている。On the other hand, when plating long but flexible printed wiring boards, a roll-to-roll method is generally adopted, and the printed wiring board to be applied is rolled up on an unwinding roll and transferred to a long plating tank. After moving up and down in the plating solution many times through a number of rolls arranged vertically within the plating solution, it is wound up by a take-up roll.
この慣用方式の実施に際して被加ニブリント配線基板の
送り速度を高めればこれに伴なう引張り力がプリント配
線基板素材自体の変形をもたらす可能性があり、従って
この方式はむしろ鍍金加工時間を延長して均一な鍍金を
もたらすことに主眼点があり鍍金加工の高速化とは趣き
を異にしている。When implementing this conventional method, if the feeding speed of the printed wiring board is increased, the resulting tensile force may cause deformation of the printed wiring board material itself, and therefore, this method rather lengthens the plating process time. The main focus is on achieving uniform plating, which is different from speeding up the plating process.
斯くて本発明の主たる目的は従来技術装置における斜上
の欠陥を完全に回避克服し得る鍍金加工用装置を提供す
ることである。It is therefore a principal object of the present invention to provide an apparatus for plating which can completely avoid and overcome the slanting defects of prior art apparatus.
本発明の特定的目的は、鍍金液が循環還流するようにな
されており斯くて被加工物の鍍金加工を高速になし得る
、構造簡単にして廉価な装置を提供することである。A specific object of the present invention is to provide a simple and inexpensive apparatus in which the plating solution is circulated and thus the workpiece can be plated at high speed.
本発明の斯かる目的及び本発明を更に充分に理解するこ
とにより自から判明する他の諸口的並びに本発明により
達成される種々の利点については添附図面に示された実
施形に関連してなされる以下の詳細な説明により明らか
となろう。These objects of the invention, as well as other aspects that will become apparent from a more thorough understanding of the invention, as well as the various advantages achieved by the invention, will be discussed in conjunction with the embodiments illustrated in the accompanying drawings. It will become clear from the detailed description below.
添附図面に於て、第1図はプリント配線基板の両面鍍金
加工を行なう場合の本発明装置の1実施形を例示してい
る。In the accompanying drawings, FIG. 1 illustrates one embodiment of the apparatus of the present invention for performing double-sided plating on a printed wiring board.
概括的に参照数字10を以て示されている本装置に於て
、12,12′は密閉式鍍金タンクを構成する匣体半部
をそれぞれ示しており、該鍍金タンク内のスペースは鍍
金加工される被加工体であって陰極を構成するプリント
配線基板14により2つの室16及び16′に分割され
ている。In the apparatus, generally designated by the reference numeral 10, 12 and 12' respectively indicate the housing halves forming a closed plating tank, the spaces within which are to be plated. It is divided into two chambers 16 and 16' by a printed wiring board 14, which is a workpiece and constitutes a cathode.
室16内には匣体半部12に設けられた導入口12aよ
り鍍金液が矢印aにて示されるように圧入される。A plating solution is press-fitted into the chamber 16 from an inlet 12a provided in the housing half 12 as shown by arrow a.
圧入された鍍金液は第1分散板18に多数穿設された細
孔18aを経て陽極体20に至り更に該陽極体20を通
過して第2分散板22に多数穿設された透孔22aを経
て上記プリント配線基板14の一面に当接して該基板1
4の核部を鍍金加工し、次いで矢印すにて示されるよう
に、上記基板14の被鍍金加工面に対向する上記第2分
散板220面に形成された細孔22bを経て吸引される
。The press-fitted plating solution passes through the pores 18a formed in a large number in the first dispersion plate 18, reaches the anode body 20, passes through the anode body 20, and passes through the through holes 22a formed in a large number in the second dispersion plate 22. The board 1 is brought into contact with one surface of the printed wiring board 14 through
4 is plated, and then, as indicated by the arrow, it is sucked through the pores 22b formed in the surface of the second dispersion plate 220, which faces the surface of the substrate 14 to be plated.
細孔22bより孔腔22c内に吸引された廃鍍金液は自
体慣用の態様にて集められ、フィルタ処理され、再生さ
れた上でポンプ(図示せず)を介して再び導入口12a
より室16内に圧入されることができる。The waste plating solution sucked into the hole cavity 22c from the pore 22b is collected in a conventional manner, filtered, regenerated, and then returned to the inlet 12a via a pump (not shown).
It can be press-fitted into the chamber 16.
第1図に例示されている陽極体20はチタン製篭体20
aと該篭体内に収容された金属粒20bとから成ってお
り斯くて鍍金液は金属粒20bを次第に溶解しつつ陽極
体20を通過し得るようになされている。The anode body 20 illustrated in FIG.
a and metal grains 20b housed in the housing, so that the plating solution can pass through the anode body 20 while gradually dissolving the metal grains 20b.
一方、室16′内にも室16に於けると同様な第1分散
板18′、陽極体20′及び第2分散板22′が設けら
れており、導入口12′aより鍍金液が圧入され基板1
4の他方の面を鍍金加工するようになされているが、こ
の鍍金液の循環態様は室16に於けると全く同様である
ので説明を省略する。On the other hand, a first dispersion plate 18', an anode body 20', and a second dispersion plate 22' similar to those in the chamber 16 are provided in the chamber 16', and the plating solution is forced into the chamber 16' through the introduction port 12'a. Substrate 1
The other surface of the chamber 4 is plated, but the manner in which the plating solution is circulated is exactly the same as in the chamber 16, so a description thereof will be omitted.
尚、プリント配線基板14の1方の面にのみ鍍金加工が
要求される場合には当然のことながら室16又は16′
の一方にのみ鍍金液を圧入すればよい訳であり、この場
合には一方の匣体半部(12又は12′)及び該匣体半
部内に収容される関連エレメント(18,20及び22
、又は18′、20′及び22′)の設置自体を省略す
ることができる。Incidentally, if plating is required only on one side of the printed wiring board 14, it is a matter of course that the chamber 16 or 16'
In this case, it is only necessary to press the plating solution into one of the housing halves (12 or 12') and the related elements (18, 20 and 22') housed within the housing half.
, or 18', 20', and 22') can be omitted.
更に、両匣体半部12及び12′が一緒にて密閉式鍍金
タンクを構成するものとして説明したが、第1図に示さ
れた装置が密閉式に構成される必要性は必ずしも存しな
い。Further, although both housing halves 12 and 12' have been described together as forming a closed plating tank, it is not necessary that the apparatus shown in FIG. 1 be constructed in a closed manner.
即ち第1図は本発明装置の1実施形を示す部分的縦断面
図であるが、このことは第1図が装置を上部から見た横
断面図と想定すれば明らかであろう。That is, FIG. 1 is a partial vertical sectional view showing one embodiment of the device of the present invention, but this will become clear if it is assumed that FIG. 1 is a cross sectional view of the device viewed from above.
この場合にはプリント配線基板14が匣体半部12及び
12′にて挾持され、又第1及び第2分散板18,18
′、22゜22′並びに陽極体20、20’は適当な支
持構造体(図示せず)より吊下せしめた状態で所定の鍍
金加工処理を行なうことができる。In this case, the printed wiring board 14 is held between the housing halves 12 and 12', and the first and second distribution plates 18 and 18 are
', 22.degree. 22' and the anode bodies 20, 20' can be subjected to a predetermined plating process while suspended from a suitable support structure (not shown).
第2図はプリント配線基板を鍍金加工する本発明装置の
第2実施形を示している。FIG. 2 shows a second embodiment of the present invention apparatus for plating printed wiring boards.
本装置100に於て、112は鍍金タンクを構成する匣
体であり、118,122は第1図の18,22に相当
し且つ同様の構造を有する第1及び第2分散板であり、
124は室116に圧入される鍍金液の噴出を抑制する
蓋体であり、該蓋体には陽極体120が設けられている
。In the present device 100, 112 is a box constituting a plating tank, 118 and 122 are first and second dispersion plates that correspond to 18 and 22 in FIG. 1 and have the same structure,
Reference numeral 124 denotes a lid body that suppresses the spouting of the plating solution press-fitted into the chamber 116, and the anode body 120 is provided on the lid body.
鍍金加工されるべき被処理体であって陰極を構成するプ
リント配線基板114は適宜支承体(図示せず)により
吊下され且つ処理されるべき部分が蓋体124に形成さ
れたスリット124aを経て鍍金液中に浸漬される。The printed wiring board 114, which is the object to be plated and constitutes the cathode, is suspended by an appropriate support (not shown), and the part to be processed passes through the slit 124a formed in the lid 124. Immersed in plating solution.
鍍金液は匣体112に形成された導入口112aから匣
体112内に流入しく矢印a参照)、第1及び第2分散
板118,122を経て蓋体124に向って流れプリン
ト配線基板114の鍍金処理に供せられた後に第2分散
板122に設けられた細孔122bを経て匣体112よ
り吸引排出される。The plating solution flows into the case 112 from an inlet 112a formed in the case 112 (see arrow a), passes through the first and second distribution plates 118 and 122, and flows toward the lid 124, where it is applied to the printed wiring board 114. After being subjected to the plating treatment, it is sucked and discharged from the casing 112 through the pores 122b provided in the second dispersion plate 122.
排出された鍍金液は第1図に関連して説明したと同様に
、必要であれば再生処理した上で導入口112aに循環
せしめることができる。The discharged plating solution can be recycled to the inlet 112a, if necessary, in the same manner as described in connection with FIG. 1.
第3図は長尺で可撓性のプリント配線基板即ち従来ro
ll−to −roll 方式で鍍金加工が行われて来
たプリント配線基板を対象とし、本発明方式により鍍金
加工する場合に採用される本発明装置の匣体の概要を示
している。Figure 3 shows a long flexible printed wiring board, i.e. conventional RO
The outline of the casing of the apparatus of the present invention, which is used for plating according to the method of the present invention, is shown for printed wiring boards that have been plated using the ll-to-roll method.
該匣体は1方手部312と他方半部312′とを具備し
、これら各半部は鍍金液の導入される導入口312a、
312′aと、連結用フランジ部分312b、312′
bとを有している。The housing has one arm portion 312 and the other half portion 312', each half having an inlet 312a through which the plating solution is introduced;
312'a and connecting flange parts 312b, 312'
It has b.
両フランジ部分312b、312′bは適宜のクランプ
手段(図示せず)により圧締され匣体内に導入された鍍
金液が外部に漏洩しないようになされているが、被処理
長尺可撓性プリント配線基板314の送込み部分及び退
出部分を形成するフランジ部分間は若干離隔状態になさ
れている。Both flange portions 312b and 312'b are clamped by appropriate clamping means (not shown) to prevent the plating solution introduced into the case from leaking to the outside. The flange portions forming the feeding portion and the leaving portion of the wiring board 314 are slightly spaced apart from each other.
該離隔部の存するフランジ部分312b、312′bに
は弾性条片316,316′を収容する樋溝312c、
312′cが形成され、斯くて該弾性条片の頂部相互が
抑圧接触して液漏れを防止するようになされている。In the flange portions 312b, 312'b where the separation portion exists, a gutter groove 312c for accommodating the elastic strips 316, 316';
312'c is formed so that the tops of the elastic strips come into pressure contact with each other to prevent liquid leakage.
上記弾性条片316,316′は鍍金液に対して安定な
弾性材料にて例えば合成ゴムにて製作されていることが
できる。The elastic strips 316, 316' may be made of an elastic material that is stable against the plating solution, such as synthetic rubber.
尚、第3図に示される匣体には第1図に示される第1分
散板18又は18′、陽極体20又は20′及び第2分
散板22又は22′が各匣体半部に装着される。In addition, the first dispersion plate 18 or 18', the anode body 20 or 20', and the second dispersion plate 22 or 22' shown in FIG. 1 are attached to each half of the housing shown in FIG. 3. be done.
次に、実施例に関連して本発明を更に詳細に説明する。The invention will now be explained in more detail with reference to examples.
例1
銅鍍金処理
加工面積500×330mmを有し第1図に示される如
く陽極体20並びに第1及び第2分散板18.22の配
置された装置内に、予め無電解鍍金が施こされた100
個のスルーホール部を有するプリント配線基板(200
×250mm)が配置された。Example 1 Copper plating treatment Electroless plating was applied in advance in an apparatus having a processing area of 500 x 330 mm and in which the anode body 20 and the first and second dispersion plates 18 and 22 were arranged as shown in FIG. 100
Printed wiring board with 200 through holes
×250mm) were placed.
CuSO4200g/l及びH2SO4150g/lの
割合で含有する水溶液を銅鍍金液としポンプ2台(各ポ
ンプの流量は2001/分であり、水頭は10mである
)を用い、常温、20 amp / dcm2.5分の
条件で銅鍍金処理が行われた。An aqueous solution containing 200 g/l of CuSO4 and 150 g/l of H2SO4 was used as a copper plating solution, and was heated to 20 amp/dcm2.5 at room temperature using two pumps (the flow rate of each pump was 2001/min and the water head was 10 m). Copper plating treatment was carried out under the following conditions.
5枚の試料基板について鍍金層の厚さは何れも24〜2
5μであり、表面は平滑であり且つ外観は均一を呈して
いた。The thickness of the plating layer for the five sample substrates was 24 to 2.
The surface was smooth and uniform in appearance.
例2
全鍍金処理
第2図に示される如く白金製陽極体120をポリ塩化ビ
ニル製蓋体124より吊下し、室116内に燐酸酸性金
鍍金液(日本ロナール社より市販の「オーログロー17
1」−金属金として15g/lを含有)をポンプ(40
0W、801/分)にて圧入した。Example 2 Full plating process As shown in FIG. 2, a platinum anode body 120 was suspended from a polyvinyl chloride lid 124, and a phosphoric acid gold plating solution ("Oroglow 17" commercially available from Nippon Ronal Co., Ltd.) was placed in the chamber 116.
1” - containing 15 g/l as metallic gold) in a pump (40
0W, 801/min).
然る後に、例1で得たるプリント配線基板の接栓端子に
全鍍金処理を施こした。Thereafter, the plug terminals of the printed wiring board obtained in Example 1 were fully plated.
温度40°C,20Amp/dcm2.20秒の鍍金条
件で5枚の試料基板の各々につき2μの鍍金層厚さが得
られた。A plating layer thickness of 2 μm was obtained on each of the five sample substrates under plating conditions of a temperature of 40° C., 20 Amp/dcm, and 2.20 seconds.
添附図面中、第1図は本発明装置の第1実施形を示す部
分的垂直断面図、第2図は第2実施形を示す第1図と同
様の図面、第3図は本発明装置の匣体部分の略示的縦断
面図であり、殊に長尺の可撓性プリント配線基板を処理
する場合に適する匣体構造を示す断面図である。
尚、図示された本発明装置要部と参照符号との対応関係
を略示すれば下記の通りである。
鍍金液・・・・・・参照符号なし、鍍金液を収容する匣
体・・・・・−12,12′;112,124;312
゜312′、陽極体・・・・・・20;120、被加工
板体・・・・・・14;114;314(プリント配線
基板)、板体・・・・・・22、22′; 122 (
第2分散板)、第2分散板の透孔・・・・・・22a、
吸引孔腔・・・・・・22c、吸引孔腔に連通する開口
・・・・・・22b;122b。In the accompanying drawings, FIG. 1 is a partial vertical sectional view showing the first embodiment of the device of the present invention, FIG. 2 is a drawing similar to FIG. 1 showing the second embodiment, and FIG. 3 is a diagram showing the device of the present invention. FIG. 2 is a schematic vertical cross-sectional view of a housing portion, and is a cross-sectional view showing a housing structure particularly suitable for processing a long flexible printed wiring board. The correspondence between the illustrated main parts of the apparatus of the present invention and reference numerals is as follows. Plating solution...No reference numeral, casing for storing plating solution...-12, 12'; 112, 124; 312
312', anode body...20; 120, plate body to be processed...14; 114; 314 (printed wiring board), plate body...22, 22'; 122 (
second dispersion plate), through hole of second dispersion plate...22a,
Suction hole cavity...22c, opening communicating with the suction hole cavity...22b; 122b.
Claims (1)
配置された陽極体と、該陽極体に対向して配置されてお
り陰極を構成している被加工体とを具備している鍍金加
工用装置において、多数の透孔が穿たれ且つ内部の吸引
孔腔に連通する開口が一方の面に形成された板体を、上
記被加工板体に近接して配置したことを特徴とする、鍍
金加工用装置。1. A housing containing a plating solution, an anode body disposed immersed in the plating solution inside the housing, and a workpiece disposed opposite to the anode body constituting a cathode. A plating apparatus is characterized in that a plate having a large number of through holes and an opening communicating with an internal suction hole formed on one side is disposed in close proximity to the plate to be processed. Equipment for plating processing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3887980A JPS58759B2 (en) | 1980-03-28 | 1980-03-28 | Equipment for plating processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3887980A JPS58759B2 (en) | 1980-03-28 | 1980-03-28 | Equipment for plating processing |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13507982A Division JPS5825479A (en) | 1982-08-04 | 1982-08-04 | Etching device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56136977A JPS56136977A (en) | 1981-10-26 |
JPS58759B2 true JPS58759B2 (en) | 1983-01-07 |
Family
ID=12537495
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3887980A Expired JPS58759B2 (en) | 1980-03-28 | 1980-03-28 | Equipment for plating processing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58759B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60131995A (en) * | 1983-12-20 | 1985-07-13 | Toyo Giken Kogyo Kk | Continuous plating method of terminal part of printed wiring board |
-
1980
- 1980-03-28 JP JP3887980A patent/JPS58759B2/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS56136977A (en) | 1981-10-26 |
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