JPS5825479A - Etching device - Google Patents
Etching deviceInfo
- Publication number
- JPS5825479A JPS5825479A JP13507982A JP13507982A JPS5825479A JP S5825479 A JPS5825479 A JP S5825479A JP 13507982 A JP13507982 A JP 13507982A JP 13507982 A JP13507982 A JP 13507982A JP S5825479 A JPS5825479 A JP S5825479A
- Authority
- JP
- Japan
- Prior art keywords
- etching
- soln
- holes
- plate
- printed wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0085—Apparatus for treatments of printed circuits with liquids not provided for in groups H05K3/02 - H05K3/46; conveyors and holding means therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/068—Apparatus for etching printed circuits
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
Description
【発明の詳細な説明】
本発明はエツチング加工用装置に係り、殊にエツチング
加工を高速に且つ均一に行なうための装置に係る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an etching apparatus, and more particularly to an apparatus for performing etching at high speed and uniformly.
本発明装置によるエツチング加工は主としてプリント配
線基板を対象としており、従ってこれに関連して本発明
を説明する。The etching process performed by the apparatus of the present invention is primarily intended for printed wiring boards, and therefore the present invention will be described in connection with this.
プリント回路配線基板のエツチング加工に関しては、従
来では、ローラコンベア上を移行しつつある被加ニブリ
ント配線基板上にノズルから腐蝕液をスプレーする所謂
スプレ一方式が主として用いられている。この従来方法
によればスプレーされた腐蝕液がエツチング処理される
べき部分の銅と反応して不活性化した状態の処に腐蝕液
が新たにスプレーされることになるのでこの新たにスプ
レーされた腐蝕液の活性が先にスプレーされ不活性状態
となっている腐蝕液の存在により阻害され斯(て迅速に
して均一なエツチング加工が困難であると謂う欠陥を有
している。この欠陥を克服するために、スプレー圧を高
めることが提案されているが、この場合にも反応済腐蝕
液の除去はその流れ去るのを待つと謂う概念から脱膜す
ることはできず、従ってエツチング加工のための所要時
間を著るしく減少せしめることは不可能であった。Conventionally, a so-called spray method has been mainly used for etching printed circuit wiring boards, in which a corrosive liquid is sprayed from a nozzle onto the printed circuit board being transferred on a roller conveyor. According to this conventional method, the sprayed corrosive liquid reacts with the copper in the area to be etched and is inactivated, and then a new corrosive liquid is sprayed. This method has a defect in that the activity of the etching solution is inhibited by the presence of the etching solution that has been sprayed first and is in an inactive state, thus making it difficult to perform a quick and uniform etching process.This defect can be overcome. In order to do this, it has been proposed to increase the spray pressure, but in this case as well, film removal cannot be achieved because of the concept of waiting for the reacted etchant to flow away. It was not possible to significantly reduce the time required.
斯くて本発明の主たる目的は従来技術装置における叙上
の欠陥を完全に回避克服し得るエツチング加工用装置を
提供することである。It is therefore a principal object of the present invention to provide an apparatus for etching processes which completely avoids and overcomes the deficiencies mentioned in prior art apparatus.
本発明の特定的目的は、腐蝕液が循環還流するようにな
されておりMくて被加工物のエツチング加工を高速にな
し得る、構造簡単にして廉価な装置を提供することであ
る。A specific object of the present invention is to provide a simple and inexpensive apparatus in which an etchant is circulated and a workpiece can be etched at high speed.
本発明の斯かる目的及び本発明を更に充分に理解するこ
とにより自から判明する他の諸口的並びに本発明により
達成されるー々の利点については添附図面に示された実
施形に関連してなされる以下の詳細な説明により明らか
となろう。These objects of the invention, as well as other advantages which will become apparent from a fuller understanding of the invention, and the advantages achieved by the invention, will be discussed in conjunction with the embodiments illustrated in the accompanying drawings. It will become clear from the detailed description below.
添附図面に於て、第1図はプリント配線基板の両面エツ
チング加工を行なう場合の本発明装置の1実施形を例示
している。概括的に参照数字10を以て示されている本
装置に於て、12.121は密閉式エツチングタンクを
構成する匣体半部をそれぞれ示しており、該タンク内の
スペースは被加工体であるプリント配線基板14により
2つの室16及び16’ K分割されている。室16内
には匣体半部12に設けられた導入口12aより腐蝕液
が矢印aにて示されるように圧入される。圧入された腐
蝕液は第1分散板18に多数穿設された細孔18aを通
過して第2分散板22に多数穿設された透孔22&を経
て上記プリント配線基板14の一面に当接して該基−板
14の該面をエツチング加工し、次いで矢印すにて示さ
れるように、上記基板14の被エツチング加工面に対向
する上記第2分散板220面に形成された細孔22bを
経て吸引される。細孔22bより孔腔22e内に吸引さ
れた廃腐蝕液は自体慣用の態様にて集められ、フィルタ
処理され、再生された上でポンプ(図示せず)を介して
再び導入口12aより室16内に圧入されることができ
る。In the accompanying drawings, FIG. 1 illustrates one embodiment of the apparatus of the present invention for etching both sides of a printed wiring board. In the apparatus, generally designated by the reference numeral 10, 12.121 respectively designate the housing halves constituting a closed etching tank, the space within which is used for printing the workpiece. It is divided into two chambers 16 and 16'K by a wiring board 14. A corrosive liquid is press-fitted into the chamber 16 from an inlet 12a provided in the housing half 12 as shown by arrow a. The injected corrosive liquid passes through the pores 18a formed in the first distribution plate 18, passes through the holes 22& formed in the second distribution plate 22, and comes into contact with one surface of the printed wiring board 14. The surface of the substrate 14 is then etched, and the pores 22b formed in the surface of the second dispersion plate 220 opposite to the surface to be etched of the substrate 14 are etched, as shown by the arrows. It is then aspirated. The waste corrosive liquid sucked into the cavity 22e from the pore 22b is collected in a conventional manner, filtered, regenerated, and then returned to the chamber 16 from the inlet 12a via a pump (not shown). can be press-fitted inside.
一方、室16’内にも室16に於けると同様な第1分散
板18及び第2分散板22が設けられており、導入口1
eaより腐蝕液が圧入され基板14の他方の面をエツチ
ング加工するようになされているが、この腐蝕液の循環
態様は室16に於けると全く同様であるので説明を省略
する。On the other hand, a first dispersion plate 18 and a second dispersion plate 22 similar to those in the chamber 16 are provided in the chamber 16'.
An etchant is forced into the chamber ea to etch the other surface of the substrate 14, but the manner in which the etchant circulates is exactly the same as in the chamber 16, so a description thereof will be omitted.
尚、プリント配線基板14の1方の面にのみエツチング
加工が要求される場合には当然のことながら室16又は
16’の一方にのみ腐蝕液を圧入すればよい訳であり、
この場合には一方の匣体半部(12又は12°)及び該
匣体半部内に収容される関連エレメント(18及び22
、又はis’及び22′)の設置自体を省略することが
できる。Note that if etching is required on only one side of the printed wiring board 14, it goes without saying that the etchant only needs to be injected into one of the chambers 16 or 16'.
In this case one housing half (12 or 12°) and the associated elements (18 and 22
, or is' and 22') can be omitted.
更に、両匣体半部12及び12’が一緒にて密閉式エツ
チングタンクを構成するものとして説明したが、第1図
に示された装置が密閉式に構成される必要性は必ずしも
存しない。即ち第1図は本発明装置の1実施形を示す部
分的縦断面図であるが、このことは第1図が装置を上部
から見た横断面図と想定すれば明らかであろう。この場
合にはプリント配線基板14が匣体半部12及び12′
にて挾持され、又第1及び第2分散板18.181.2
2.22’は適当な支持構造体(図示せず)より吊下せ
しめた状態で所定のエツチング加工処理を行なうことが
できる。Furthermore, although both housing halves 12 and 12' have been described together as forming a closed etching tank, it is not necessary that the apparatus shown in FIG. 1 be constructed in a closed manner. That is, FIG. 1 is a partial vertical sectional view showing one embodiment of the device of the present invention, but this will become clear if it is assumed that FIG. 1 is a cross sectional view of the device viewed from above. In this case, the printed wiring board 14 is connected to the housing halves 12 and 12'.
The first and second dispersion plates 18.181.2
2.22' can be subjected to a predetermined etching process while suspended from a suitable support structure (not shown).
第2図はプリント配線基板をエツチング加工する本発明
装置の第2実施形を示している。本装置100に於て、
112はエツチングタンクを構成する匣体であり、11
8.122は第1図の18.22に′相当し且つ同様の
構造を有する第1及び第2分散板であり、124は室1
16に圧入される腐蝕液の噴出を抑制する蓋体である。FIG. 2 shows a second embodiment of the apparatus of the present invention for etching a printed wiring board. In this device 100,
112 is a box constituting an etching tank;
8.122 corresponds to 18.22 in FIG. 1 and has a similar structure, and 124 is the first and second distribution plate.
This is a lid body that suppresses the ejection of the corrosive liquid that is press-fitted into the corrosive liquid.
被加工体であるプリント配線基板114は適宜支承体(
図示せず)により吊下され且つ処理されるべき部分が蓋
体124に形成されたスリン)124aを経て腐蝕液中
に浸漬される。The printed wiring board 114, which is the workpiece, is suitably mounted on a support (
(not shown), and the part to be treated is immersed in the corrosive liquid through a suction (not shown) 124a formed on the lid 124.
腐蝕液は匣体112に形成された導入口112aから匣
体112内に流入しく矢印a参照)、第1及び第2分散
板118.1227を経て蓋体124に向って流れプリ
ント配線基板114のエツチング処理に供せられた後に
第2分散板122に設けられた細孔122bを経て匣体
112より吸引排出される。排出された腐蝕液は第1図
に関連して説明したと同様に、必要であれば再生処理し
た上で導入口112aに循環せしめることができる。The corrosive liquid flows into the housing 112 from an inlet 112a formed in the housing 112 (see arrow a), passes through the first and second dispersion plates 118, 1227, and flows toward the lid 124, where it flows onto the printed wiring board 114. After being subjected to the etching process, it is sucked and discharged from the casing 112 through the pores 122b provided in the second dispersion plate 122. The discharged corrosive liquid can be regenerated, if necessary, and then circulated to the inlet 112a, as described in connection with FIG. 1.
第3図は長尺で可撓性のプリント配線基板即ち従来ro
目−to−ro11方式でエツチング加工が行われて来
たプリント配線基板を対象とし、本発明方式によりエツ
チング加工する場合に採用される本発明装置の匣体の概
要を示している。Figure 3 shows a long flexible printed wiring board, i.e. conventional RO
This figure shows an outline of the casing of the apparatus of the present invention, which is used when etching a printed wiring board that has been etched using the To-Ro11 method.
該匣体は1方半部312と他方半部312′とを具備し
、これら各半部は腐蝕液の導入される導入口312a
、 312’aと、連結用フランジ部分312b 、3
1Sfbとを有している。両フランジ部分312b、3
12’bは適宜のクランプ手段(図示せず〕により圧締
され匣体内に導入された腐蝕液が外部に漏洩しないよう
になされているが、被処理長尺可撓性プリント配線基板
314の送込み部分及び退出部分を形成するフランジ部
分間は若干離隔状態になされている。The housing has one half 312 and the other half 312', each half having an inlet 312a through which the corrosive liquid is introduced.
, 312'a, and the connecting flange portion 312b, 3
1Sfb. Both flange parts 312b, 3
12'b is clamped by an appropriate clamping means (not shown) to prevent the corrosive liquid introduced into the case from leaking to the outside; The flange portions forming the recessed portion and the retracted portion are slightly spaced apart from each other.
該離隔部の存するフランジ部分312b、312’bに
は弾性条片316 、31dを収容する樋溝312c
、 312’cが形成され、斯(て該弾性条片の頂部相
互が抑圧接触して液漏れを防止するようになされている
。The flange portions 312b, 312'b where the separation portion exists are provided with a gutter groove 312c for accommodating the elastic strips 316, 31d.
, 312'c are formed so that the tops of the elastic strips come into pressure contact with each other to prevent liquid leakage.
上記弾性条片316.316は腐蝕液に対して安定な弾
性材料にて例えば合成ゴムにて製作されていることがで
きる。The elastic strips 316, 316 can be made of an elastic material that is stable against corrosive fluids, for example synthetic rubber.
尚、第3図に示される匣体がエツチング処理用に供され
る場合には第1図に示される第1分散板18又は181
及び第2分散板22又は221が各匣体半部に装着され
る。Incidentally, when the casing shown in FIG. 3 is used for etching treatment, the first dispersion plate 18 or 181 shown in FIG.
and a second distribution plate 22 or 221 is attached to each housing half.
次に、実施例に関連して本発明を更に詳細に説明する。The invention will now be explained in more detail with reference to examples.
第1図に示された装置を使用し、厚さ35μの両面張プ
リント配線基板(200X 200 m )を取付け、
2004/分のポンプ2台を用い42°ボーメの塩化鉄
溶液を腐蝕液として常温でエツチング処理した。Using the equipment shown in Figure 1, a double-sided printed wiring board (200 x 200 m) with a thickness of 35 μm was installed.
Etching treatment was carried out at room temperature using 42° Baume iron chloride solution as an etchant using two pumps running at 2004/min.
5枚の試料基板を処理した処、その平均所要時間は約5
0秒であった。When processing 5 sample substrates, the average time required was approximately 5 minutes.
It was 0 seconds.
添附図面中
第1図は本発明装置の第1実施形を示す部分的垂直断面
図、
第2図は第2実施形を示す第1図と同様の図面、第3図
は本発明装置の匣体部分の略示的縦断面図であり、殊に
長尺の可続性プリント配線基板を処理する場合に適する
匣体構造を示す断面図である。
匣 体・・・・・・・・・・・・・・・12.12’
; 112.124 ;312 、312’
被加工板体・・・・・・・・・14 ; 114 ;
314(プリント配線基板)
腐蝕液・・・・・・・・・・・・参照符号なし板 体
・・・・・・・・・・・・・・・22 、22 ;
122(第2分散板)
第2分散板の
透 孔・・・・・・・・・・・・・・・22&吸引孔腔
・・・・・・・・・・・・22e吸引孔腔に連通ずる開
口・・・・・・・・・22b口122b特許出願人 沢
表面技研株式会社
代理人弁理士 1) 代 黒 油量1反
一\づ6′In the accompanying drawings, FIG. 1 is a partial vertical sectional view showing the first embodiment of the device of the present invention, FIG. 2 is a drawing similar to FIG. 1 showing the second embodiment, and FIG. 1 is a schematic longitudinal sectional view of a body part, showing a housing structure suitable in particular for processing elongated fugitive printed circuit boards; FIG. Box body・・・・・・・・・・・・12.12'
; 112.124; 312, 312' Plate to be processed...14; 114;
314 (Printed wiring board) Corrosive liquid・・・・・・・・・Plate without reference code Body・・・・・・・・・・・・22, 22;
122 (Second dispersion plate) Through hole of second dispersion plate 22 & suction hole cavity 22e Suction hole cavity Communicating sliding opening......22b Port 122b Patent applicant: Sawahama Giken Co., Ltd., agent patent attorney 1) Black Oil amount: 1/1\6'
Claims (1)
おり、上記匣体内で腐蝕液により上記被加工板体を処理
するエツチング加工用装置において、多数の透孔が穿た
れ且つ内部の吸引孔腔に連通ずる開口が一方の面に形成
された板体を、上記被加工板体に近接して配置したこと
を特徴とする、エツチング加工用装置。An etching device comprising a case and a plate to be processed disposed within the case, and which processes the plate to be processed with a corrosive liquid in the case, in which a large number of through holes are bored. An etching processing apparatus characterized in that a plate body having an opening formed on one surface communicating with an internal suction hole cavity is disposed in close proximity to the plate body to be processed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13507982A JPS5825479A (en) | 1982-08-04 | 1982-08-04 | Etching device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13507982A JPS5825479A (en) | 1982-08-04 | 1982-08-04 | Etching device |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3887980A Division JPS58759B2 (en) | 1980-03-28 | 1980-03-28 | Equipment for plating processing |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5825479A true JPS5825479A (en) | 1983-02-15 |
JPS6245313B2 JPS6245313B2 (en) | 1987-09-25 |
Family
ID=15143342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13507982A Granted JPS5825479A (en) | 1982-08-04 | 1982-08-04 | Etching device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5825479A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7789969B2 (en) | 2006-11-01 | 2010-09-07 | Applied Materials, Inc. | Methods and apparatus for cleaning chamber components |
WO2017076640A1 (en) * | 2015-11-04 | 2017-05-11 | Gebr. Schmid Gmbh | Treatment fluid extracting device and etching device comprising the latter |
-
1982
- 1982-08-04 JP JP13507982A patent/JPS5825479A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7789969B2 (en) | 2006-11-01 | 2010-09-07 | Applied Materials, Inc. | Methods and apparatus for cleaning chamber components |
WO2017076640A1 (en) * | 2015-11-04 | 2017-05-11 | Gebr. Schmid Gmbh | Treatment fluid extracting device and etching device comprising the latter |
Also Published As
Publication number | Publication date |
---|---|
JPS6245313B2 (en) | 1987-09-25 |
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