JPS5875834A - プロキシミティ露光装置 - Google Patents
プロキシミティ露光装置Info
- Publication number
- JPS5875834A JPS5875834A JP56173013A JP17301381A JPS5875834A JP S5875834 A JPS5875834 A JP S5875834A JP 56173013 A JP56173013 A JP 56173013A JP 17301381 A JP17301381 A JP 17301381A JP S5875834 A JPS5875834 A JP S5875834A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- pattern
- mask
- optical system
- alignment pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56173013A JPS5875834A (ja) | 1981-10-30 | 1981-10-30 | プロキシミティ露光装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56173013A JPS5875834A (ja) | 1981-10-30 | 1981-10-30 | プロキシミティ露光装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5875834A true JPS5875834A (ja) | 1983-05-07 |
JPH0311540B2 JPH0311540B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-02-18 |
Family
ID=15952575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56173013A Granted JPS5875834A (ja) | 1981-10-30 | 1981-10-30 | プロキシミティ露光装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5875834A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62185318A (ja) * | 1986-02-10 | 1987-08-13 | Nippon Kogaku Kk <Nikon> | 露光装置 |
JPS63140546A (ja) * | 1986-12-02 | 1988-06-13 | Toshiba Corp | 露光装置 |
JP2008014608A (ja) * | 2006-07-10 | 2008-01-24 | Daikin Ind Ltd | 床置き空気調和装置 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51138464A (en) * | 1975-05-26 | 1976-11-30 | Hitachi Ltd | Device for detecting relative position of plural articles |
JPS5243692A (en) * | 1975-09-30 | 1977-04-05 | Sumiyoshi Heavy Ind | Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member |
JPS5252579A (en) * | 1975-10-27 | 1977-04-27 | Canon Inc | Clearance adjusng method |
JPS5315078A (en) * | 1976-07-23 | 1978-02-10 | Siemens Ag | Method of automatically adjusting layer material |
JPS5330878A (en) * | 1976-09-03 | 1978-03-23 | Fujitsu Ltd | Focus adjusting device in projection type exposure apparatus |
JPS56130707A (en) * | 1980-03-18 | 1981-10-13 | Canon Inc | Photo-printing device |
-
1981
- 1981-10-30 JP JP56173013A patent/JPS5875834A/ja active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51138464A (en) * | 1975-05-26 | 1976-11-30 | Hitachi Ltd | Device for detecting relative position of plural articles |
JPS5243692A (en) * | 1975-09-30 | 1977-04-05 | Sumiyoshi Heavy Ind | Apparatus for hauling with hauling roller having angle changeable fishing net linkkgethering member |
JPS5252579A (en) * | 1975-10-27 | 1977-04-27 | Canon Inc | Clearance adjusng method |
JPS5315078A (en) * | 1976-07-23 | 1978-02-10 | Siemens Ag | Method of automatically adjusting layer material |
JPS5330878A (en) * | 1976-09-03 | 1978-03-23 | Fujitsu Ltd | Focus adjusting device in projection type exposure apparatus |
JPS56130707A (en) * | 1980-03-18 | 1981-10-13 | Canon Inc | Photo-printing device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62185318A (ja) * | 1986-02-10 | 1987-08-13 | Nippon Kogaku Kk <Nikon> | 露光装置 |
JPS63140546A (ja) * | 1986-12-02 | 1988-06-13 | Toshiba Corp | 露光装置 |
JP2008014608A (ja) * | 2006-07-10 | 2008-01-24 | Daikin Ind Ltd | 床置き空気調和装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0311540B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-02-18 |