JPS5873767A - 薄膜形成用マスクおよびその製造方法 - Google Patents

薄膜形成用マスクおよびその製造方法

Info

Publication number
JPS5873767A
JPS5873767A JP17139581A JP17139581A JPS5873767A JP S5873767 A JPS5873767 A JP S5873767A JP 17139581 A JP17139581 A JP 17139581A JP 17139581 A JP17139581 A JP 17139581A JP S5873767 A JPS5873767 A JP S5873767A
Authority
JP
Japan
Prior art keywords
thin film
mask
thin
plate
reinforcing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17139581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160542B2 (cs
Inventor
Minoru Tanaka
稔 田中
Hitoshi Kubota
仁志 窪田
Susumu Aiuchi
進 相内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17139581A priority Critical patent/JPS5873767A/ja
Publication of JPS5873767A publication Critical patent/JPS5873767A/ja
Publication of JPH0160542B2 publication Critical patent/JPH0160542B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Electrodes Of Semiconductors (AREA)
JP17139581A 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法 Granted JPS5873767A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17139581A JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17139581A JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Publications (2)

Publication Number Publication Date
JPS5873767A true JPS5873767A (ja) 1983-05-04
JPH0160542B2 JPH0160542B2 (cs) 1989-12-22

Family

ID=15922357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17139581A Granted JPS5873767A (ja) 1981-10-28 1981-10-28 薄膜形成用マスクおよびその製造方法

Country Status (1)

Country Link
JP (1) JPS5873767A (cs)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993002223A1 (en) * 1991-07-16 1993-02-04 Adc Telecommunications, Inc. Electroformed mask and use therefor
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
JP2004039319A (ja) * 2002-07-01 2004-02-05 Hitachi Metals Ltd メタルマスク
JP2005042147A (ja) * 2003-07-25 2005-02-17 Dainippon Screen Mfg Co Ltd 蒸着用マスクの製造方法および蒸着用マスク
JP2005089809A (ja) * 2003-09-17 2005-04-07 Mitsumura Printing Co Ltd マスキング装置およびマスキング装置の作製方法、並びに搬送装置および搬送装置の作製方法
JP2014218749A (ja) * 2013-01-08 2014-11-20 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI264473B (en) * 2001-10-26 2006-10-21 Matsushita Electric Works Ltd Vacuum deposition device and vacuum deposition method

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993002223A1 (en) * 1991-07-16 1993-02-04 Adc Telecommunications, Inc. Electroformed mask and use therefor
US5308656A (en) * 1991-07-16 1994-05-03 Adc Telecommunications, Inc. Electroformed mask and use therefore
JP2000129419A (ja) * 1998-10-22 2000-05-09 Hokuriku Electric Ind Co Ltd 蒸着マスク
JP2004039319A (ja) * 2002-07-01 2004-02-05 Hitachi Metals Ltd メタルマスク
JP2005042147A (ja) * 2003-07-25 2005-02-17 Dainippon Screen Mfg Co Ltd 蒸着用マスクの製造方法および蒸着用マスク
CN100461494C (zh) * 2003-07-25 2009-02-11 大日本网目版制造株式会社 蒸镀用掩模及其制造方法
JP2005089809A (ja) * 2003-09-17 2005-04-07 Mitsumura Printing Co Ltd マスキング装置およびマスキング装置の作製方法、並びに搬送装置および搬送装置の作製方法
JP2014218749A (ja) * 2013-01-08 2014-11-20 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク
JP2019060028A (ja) * 2013-01-08 2019-04-18 大日本印刷株式会社 蒸着マスクの製造方法および蒸着マスク

Also Published As

Publication number Publication date
JPH0160542B2 (cs) 1989-12-22

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