JPS58704Y2 - メッキ装置 - Google Patents

メッキ装置

Info

Publication number
JPS58704Y2
JPS58704Y2 JP1978116997U JP11699778U JPS58704Y2 JP S58704 Y2 JPS58704 Y2 JP S58704Y2 JP 1978116997 U JP1978116997 U JP 1978116997U JP 11699778 U JP11699778 U JP 11699778U JP S58704 Y2 JPS58704 Y2 JP S58704Y2
Authority
JP
Japan
Prior art keywords
plated
cathode
shield plate
plating
ring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1978116997U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5533970U (enExample
Inventor
良雄 泰
俊夫 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1978116997U priority Critical patent/JPS58704Y2/ja
Publication of JPS5533970U publication Critical patent/JPS5533970U/ja
Application granted granted Critical
Publication of JPS58704Y2 publication Critical patent/JPS58704Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)
JP1978116997U 1978-08-25 1978-08-25 メッキ装置 Expired JPS58704Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1978116997U JPS58704Y2 (ja) 1978-08-25 1978-08-25 メッキ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1978116997U JPS58704Y2 (ja) 1978-08-25 1978-08-25 メッキ装置

Publications (2)

Publication Number Publication Date
JPS5533970U JPS5533970U (enExample) 1980-03-05
JPS58704Y2 true JPS58704Y2 (ja) 1983-01-07

Family

ID=29070037

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1978116997U Expired JPS58704Y2 (ja) 1978-08-25 1978-08-25 メッキ装置

Country Status (1)

Country Link
JP (1) JPS58704Y2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3568486B2 (ja) * 2000-03-29 2004-09-22 三洋電機株式会社 半導体装置の製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5445380Y2 (enExample) * 1976-03-01 1979-12-26

Also Published As

Publication number Publication date
JPS5533970U (enExample) 1980-03-05

Similar Documents

Publication Publication Date Title
EP0012954B1 (en) Bias sputter deposition apparatus and its method of use
US6319325B1 (en) Apparatus for producing thin film, process for producing thin film and guide roller
JPS58704Y2 (ja) メッキ装置
JP3398452B2 (ja) スパッタリング装置
JP2906453B2 (ja) 磁気記録媒体製造用スパッタリング装置
JPS62119907A (ja) 磁性薄膜作製用スパツタリング装置
JPS63213667A (ja) マグネトロン方式のバイアススパツタ装置
JPS63259838A (ja) 磁性薄膜記録媒体の製造方法および製造装置
JPH0622052B2 (ja) 磁気デイスク
JPH0119239Y2 (enExample)
JP2000345337A (ja) カソード電極装置及びスパッタリング装置
JP2559546B2 (ja) スパッタリング装置
JPS6076026A (ja) 垂直磁気記録媒体の製造方法
JPH0581662A (ja) 垂直磁気記録媒体の製造方法
JPH05342643A (ja) スタンパの製造方法
JPS5857625A (ja) 磁気記録体
KR940005708Y1 (ko) 자기헤드의 스퍼터링용 지그
JPH0371408A (ja) 薄膜ヘッド
JP2650779B2 (ja) スタンパ製造用治具
JPS63270462A (ja) スパツタ電極
JPS61207575A (ja) 円板状被成膜基板両面への同時スパッタリング方法およびその装置
JPH0525676A (ja) スタンパ製造用原盤のホルダおよびこれを用いた電鋳方法
JPH07331434A (ja) マグネトロンスパッタリング装置
JPH0570214B2 (enExample)
JPH0719374B2 (ja) 垂直磁気記録ディスク媒体の製造方法