JPS5866332A - 荷電粒子ビ−ム装置の開口角制限装置 - Google Patents

荷電粒子ビ−ム装置の開口角制限装置

Info

Publication number
JPS5866332A
JPS5866332A JP57164146A JP16414682A JPS5866332A JP S5866332 A JPS5866332 A JP S5866332A JP 57164146 A JP57164146 A JP 57164146A JP 16414682 A JP16414682 A JP 16414682A JP S5866332 A JPS5866332 A JP S5866332A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
aperture
stencil mask
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57164146A
Other languages
English (en)
Japanese (ja)
Inventor
エマニエル・ド・シヤンボスト
ジヤツク・トロテル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Publication of JPS5866332A publication Critical patent/JPS5866332A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP57164146A 1981-09-22 1982-09-22 荷電粒子ビ−ム装置の開口角制限装置 Pending JPS5866332A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8117846 1981-09-22
FR8117846A FR2513425A1 (fr) 1981-09-22 1981-09-22 Dispositif de limitation angulaire dans un systeme a faisceau de particules chargees

Publications (1)

Publication Number Publication Date
JPS5866332A true JPS5866332A (ja) 1983-04-20

Family

ID=9262358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57164146A Pending JPS5866332A (ja) 1981-09-22 1982-09-22 荷電粒子ビ−ム装置の開口角制限装置

Country Status (5)

Country Link
US (1) US4492870A (show.php)
EP (1) EP0075504B1 (show.php)
JP (1) JPS5866332A (show.php)
DE (1) DE3268835D1 (show.php)
FR (1) FR2513425A1 (show.php)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2597259A1 (fr) * 1986-04-15 1987-10-16 Thomson Csf Dispositif a faisceau electronique pour projeter l'image d'un objet sur un echantillon
JP2591548B2 (ja) * 1991-07-26 1997-03-19 富士通株式会社 荷電粒子線露光装置及び荷電粒子線露光方法
FR2837931B1 (fr) * 2002-03-29 2004-12-10 Cameca Dispositif de mesure de l'emission de rayons x produite par un objet soumis a un faisceau d'electrons

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2351497A1 (fr) * 1976-05-14 1977-12-09 Thomson Csf Dispositif permettant le trace programme de figures de formes differentes
GB1544222A (en) * 1976-07-02 1979-04-19 Zeiss Jena Veb Carl Method of and apparatus for non-thermal electron beam processing of workpieces
GB1605087A (en) * 1977-05-31 1981-12-16 Rikagaku Kenkyusho Method for shaping a beam of electrically charged particles
US4218621A (en) * 1977-06-15 1980-08-19 Vlsi Technology Research Association Electron beam exposure apparatus
US4199689A (en) * 1977-12-21 1980-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposing method and electron beam apparatus
US4243866A (en) * 1979-01-11 1981-01-06 International Business Machines Corporation Method and apparatus for forming a variable size electron beam
US4210806A (en) * 1979-01-18 1980-07-01 International Business Machines Corporation High brightness electron probe beam and method
US4282437A (en) * 1979-12-17 1981-08-04 Bell Telephone Laboratories, Incorporated Charged particle beam lithography

Also Published As

Publication number Publication date
US4492870A (en) 1985-01-08
FR2513425A1 (fr) 1983-03-25
EP0075504B1 (fr) 1986-01-29
DE3268835D1 (en) 1986-03-13
EP0075504A1 (fr) 1983-03-30
FR2513425B1 (show.php) 1983-12-02

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