JPS5857908B2 - 薄膜構造体の形成方法 - Google Patents

薄膜構造体の形成方法

Info

Publication number
JPS5857908B2
JPS5857908B2 JP51147905A JP14790576A JPS5857908B2 JP S5857908 B2 JPS5857908 B2 JP S5857908B2 JP 51147905 A JP51147905 A JP 51147905A JP 14790576 A JP14790576 A JP 14790576A JP S5857908 B2 JPS5857908 B2 JP S5857908B2
Authority
JP
Japan
Prior art keywords
resist
layer
lift
mask
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51147905A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5285033A (en
Inventor
ルボマイア・テイ−・ロマンキユ−
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5285033A publication Critical patent/JPS5285033A/ja
Publication of JPS5857908B2 publication Critical patent/JPS5857908B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
    • H05K3/143—Masks therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP51147905A 1975-12-31 1976-12-10 薄膜構造体の形成方法 Expired JPS5857908B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64585275A 1975-12-31 1975-12-31
US000000645852 1975-12-31

Publications (2)

Publication Number Publication Date
JPS5285033A JPS5285033A (en) 1977-07-15
JPS5857908B2 true JPS5857908B2 (ja) 1983-12-22

Family

ID=24590741

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51147905A Expired JPS5857908B2 (ja) 1975-12-31 1976-12-10 薄膜構造体の形成方法

Country Status (3)

Country Link
JP (1) JPS5857908B2 (enExample)
DE (1) DE2645081C2 (enExample)
FR (1) FR2337358A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58102146A (ja) * 1981-12-14 1983-06-17 Fuji Photo Film Co Ltd 銀／ハロゲン化銀電極の製造方法
DE3715431A1 (de) * 1987-05-08 1988-11-17 Siemens Ag Verfahren zur herstellung eines strukturierten metallkontaktes auf einer halbleiterscheibe
JPH0666290B2 (ja) * 1987-12-29 1994-08-24 日本電気株式会社 半導体装置の製造方法
US7749883B2 (en) * 2007-09-20 2010-07-06 Fry's Metals, Inc. Electroformed stencils for solar cell front side metallization

Also Published As

Publication number Publication date
FR2337358A1 (fr) 1977-07-29
DE2645081A1 (de) 1977-07-14
FR2337358B1 (enExample) 1982-01-08
DE2645081C2 (de) 1985-10-03
JPS5285033A (en) 1977-07-15

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