JPS5855932A - 湿し水不要平版印刷版の後処理方法 - Google Patents

湿し水不要平版印刷版の後処理方法

Info

Publication number
JPS5855932A
JPS5855932A JP15379981A JP15379981A JPS5855932A JP S5855932 A JPS5855932 A JP S5855932A JP 15379981 A JP15379981 A JP 15379981A JP 15379981 A JP15379981 A JP 15379981A JP S5855932 A JPS5855932 A JP S5855932A
Authority
JP
Japan
Prior art keywords
silicone rubber
dampening water
layer
rubber layer
type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15379981A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225497B2 (https=
Inventor
Takao Kinashi
木梨　隆夫
Keiichi Egawa
江川　啓一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP15379981A priority Critical patent/JPS5855932A/ja
Publication of JPS5855932A publication Critical patent/JPS5855932A/ja
Publication of JPH0225497B2 publication Critical patent/JPH0225497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP15379981A 1981-09-30 1981-09-30 湿し水不要平版印刷版の後処理方法 Granted JPS5855932A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15379981A JPS5855932A (ja) 1981-09-30 1981-09-30 湿し水不要平版印刷版の後処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15379981A JPS5855932A (ja) 1981-09-30 1981-09-30 湿し水不要平版印刷版の後処理方法

Publications (2)

Publication Number Publication Date
JPS5855932A true JPS5855932A (ja) 1983-04-02
JPH0225497B2 JPH0225497B2 (https=) 1990-06-04

Family

ID=15570377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15379981A Granted JPS5855932A (ja) 1981-09-30 1981-09-30 湿し水不要平版印刷版の後処理方法

Country Status (1)

Country Link
JP (1) JPS5855932A (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5589842A (en) * 1978-12-28 1980-07-07 Toray Ind Inc Retouching method for plate face of waterless lithographic printing plate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5589842A (en) * 1978-12-28 1980-07-07 Toray Ind Inc Retouching method for plate face of waterless lithographic printing plate

Also Published As

Publication number Publication date
JPH0225497B2 (https=) 1990-06-04

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