JPS5848048A - 遠紫外線露光用レジスト材料 - Google Patents

遠紫外線露光用レジスト材料

Info

Publication number
JPS5848048A
JPS5848048A JP56147597A JP14759781A JPS5848048A JP S5848048 A JPS5848048 A JP S5848048A JP 56147597 A JP56147597 A JP 56147597A JP 14759781 A JP14759781 A JP 14759781A JP S5848048 A JPS5848048 A JP S5848048A
Authority
JP
Japan
Prior art keywords
resist
parts
deep ultraviolet
resist material
ultraviolet exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56147597A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6349211B2 (enrdf_load_stackoverflow
Inventor
Katsumi Ogawa
小川　勝己
Kunio Hibino
邦男 日比野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56147597A priority Critical patent/JPS5848048A/ja
Publication of JPS5848048A publication Critical patent/JPS5848048A/ja
Publication of JPS6349211B2 publication Critical patent/JPS6349211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP56147597A 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料 Granted JPS5848048A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56147597A JPS5848048A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56147597A JPS5848048A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Publications (2)

Publication Number Publication Date
JPS5848048A true JPS5848048A (ja) 1983-03-19
JPS6349211B2 JPS6349211B2 (enrdf_load_stackoverflow) 1988-10-04

Family

ID=15433939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56147597A Granted JPS5848048A (ja) 1981-09-17 1981-09-17 遠紫外線露光用レジスト材料

Country Status (1)

Country Link
JP (1) JPS5848048A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5868743A (ja) * 1981-10-21 1983-04-23 Hitachi Ltd 放射線感応性有機高分子材料
EP0942331A4 (en) * 1997-10-08 2000-07-26 Clariant Finance Bvi Ltd ANTIREFLECTIVE OR PHOTOABSORBENT COATING COMPOSITION AND ITS POLYMER
US7794919B2 (en) * 2003-04-02 2010-09-14 Nissan Chemical Industries, Ltd. Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5868743A (ja) * 1981-10-21 1983-04-23 Hitachi Ltd 放射線感応性有機高分子材料
EP0942331A4 (en) * 1997-10-08 2000-07-26 Clariant Finance Bvi Ltd ANTIREFLECTIVE OR PHOTOABSORBENT COATING COMPOSITION AND ITS POLYMER
US7794919B2 (en) * 2003-04-02 2010-09-14 Nissan Chemical Industries, Ltd. Composition for forming underlayer coating for lithography containing epoxy compound and carboxylic acid compound
US8460855B2 (en) 2003-04-02 2013-06-11 Nissan Chemical Industries, Ltd. Composition for forming underlayer coating for litography containing epoxy compound and carboxylic acid compound

Also Published As

Publication number Publication date
JPS6349211B2 (enrdf_load_stackoverflow) 1988-10-04

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