JPS5844762A - 高電圧相補形mosインバ−タアレイの集積構造 - Google Patents

高電圧相補形mosインバ−タアレイの集積構造

Info

Publication number
JPS5844762A
JPS5844762A JP56061993A JP6199381A JPS5844762A JP S5844762 A JPS5844762 A JP S5844762A JP 56061993 A JP56061993 A JP 56061993A JP 6199381 A JP6199381 A JP 6199381A JP S5844762 A JPS5844762 A JP S5844762A
Authority
JP
Japan
Prior art keywords
voltage
gate
transistor
circuit
diode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56061993A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0221174B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Sakuma
啓 佐久間
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56061993A priority Critical patent/JPS5844762A/ja
Publication of JPS5844762A publication Critical patent/JPS5844762A/ja
Publication of JPH0221174B2 publication Critical patent/JPH0221174B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
    • H10D84/82Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
    • H10D84/83Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
    • H10D84/85Complementary IGFETs, e.g. CMOS

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Logic Circuits (AREA)
JP56061993A 1981-04-24 1981-04-24 高電圧相補形mosインバ−タアレイの集積構造 Granted JPS5844762A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56061993A JPS5844762A (ja) 1981-04-24 1981-04-24 高電圧相補形mosインバ−タアレイの集積構造

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56061993A JPS5844762A (ja) 1981-04-24 1981-04-24 高電圧相補形mosインバ−タアレイの集積構造

Publications (2)

Publication Number Publication Date
JPS5844762A true JPS5844762A (ja) 1983-03-15
JPH0221174B2 JPH0221174B2 (enrdf_load_stackoverflow) 1990-05-14

Family

ID=13187228

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56061993A Granted JPS5844762A (ja) 1981-04-24 1981-04-24 高電圧相補形mosインバ−タアレイの集積構造

Country Status (1)

Country Link
JP (1) JPS5844762A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010565A (ja) * 1983-06-30 1985-01-19 Fuji Electric Corp Res & Dev Ltd 燃料電池
JPS6051322A (ja) * 1983-08-31 1985-03-22 Toshiba Corp Cmos電圧変換回路
JPS61160449A (ja) * 1984-12-29 1986-07-21 東洋紡績株式会社 ポリエステルシツクアンドシン織物
JPH04333614A (ja) * 1991-02-22 1992-11-20 Kuraray Co Ltd ポリエステル糸および繊維製品
US5227655A (en) * 1990-02-15 1993-07-13 Nec Corporation Field effect transistor capable of easily adjusting switching speed thereof
JP2002251174A (ja) * 2000-11-22 2002-09-06 Hitachi Ltd 表示装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010565A (ja) * 1983-06-30 1985-01-19 Fuji Electric Corp Res & Dev Ltd 燃料電池
JPS6051322A (ja) * 1983-08-31 1985-03-22 Toshiba Corp Cmos電圧変換回路
JPS61160449A (ja) * 1984-12-29 1986-07-21 東洋紡績株式会社 ポリエステルシツクアンドシン織物
US5227655A (en) * 1990-02-15 1993-07-13 Nec Corporation Field effect transistor capable of easily adjusting switching speed thereof
JPH04333614A (ja) * 1991-02-22 1992-11-20 Kuraray Co Ltd ポリエステル糸および繊維製品
JP2002251174A (ja) * 2000-11-22 2002-09-06 Hitachi Ltd 表示装置

Also Published As

Publication number Publication date
JPH0221174B2 (enrdf_load_stackoverflow) 1990-05-14

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