JPS584450B2 - ハンドウタイノ カクサンド−ピングシヨリヨウノ コタイノリンガンユウゲンブツタイオヨビ ソノセイゾウホウ - Google Patents

ハンドウタイノ カクサンド−ピングシヨリヨウノ コタイノリンガンユウゲンブツタイオヨビ ソノセイゾウホウ

Info

Publication number
JPS584450B2
JPS584450B2 JP48036560A JP3656073A JPS584450B2 JP S584450 B2 JPS584450 B2 JP S584450B2 JP 48036560 A JP48036560 A JP 48036560A JP 3656073 A JP3656073 A JP 3656073A JP S584450 B2 JPS584450 B2 JP S584450B2
Authority
JP
Japan
Prior art keywords
phosphorus
silicon
diffusion
solid
doping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48036560A
Other languages
English (en)
Japanese (ja)
Other versions
JPS4910665A (cg-RX-API-DMAC7.html
Inventor
カール・ヒユース・マクマトリー
ヨリヒロ・ムラタ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kennecott Corp
Original Assignee
Kennecott Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kennecott Corp filed Critical Kennecott Corp
Publication of JPS4910665A publication Critical patent/JPS4910665A/ja
Publication of JPS584450B2 publication Critical patent/JPS584450B2/ja
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/2225—Diffusion sources
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S252/00—Compositions
    • Y10S252/95—Doping agent source material
    • Y10S252/951—Doping agent source material for vapor transport

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Ceramic Products (AREA)
JP48036560A 1972-03-31 1973-03-30 ハンドウタイノ カクサンド−ピングシヨリヨウノ コタイノリンガンユウゲンブツタイオヨビ ソノセイゾウホウ Expired JPS584450B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00239897A US3849344A (en) 1972-03-31 1972-03-31 Solid diffusion sources containing phosphorus and silicon

Publications (2)

Publication Number Publication Date
JPS4910665A JPS4910665A (cg-RX-API-DMAC7.html) 1974-01-30
JPS584450B2 true JPS584450B2 (ja) 1983-01-26

Family

ID=22904197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48036560A Expired JPS584450B2 (ja) 1972-03-31 1973-03-30 ハンドウタイノ カクサンド−ピングシヨリヨウノ コタイノリンガンユウゲンブツタイオヨビ ソノセイゾウホウ

Country Status (3)

Country Link
US (1) US3849344A (cg-RX-API-DMAC7.html)
JP (1) JPS584450B2 (cg-RX-API-DMAC7.html)
CA (1) CA1011227A (cg-RX-API-DMAC7.html)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA967173A (en) * 1973-01-04 1975-05-06 Peter C. Schultz Fused oxide type glasses
US4025464A (en) * 1973-11-01 1977-05-24 Mitsuo Yamashita Composition for diffusing phosphorus
US3972838A (en) * 1973-11-01 1976-08-03 Denki Kagaku Kogyo Kabushiki Kaisha Composition for diffusing phosphorus
US3931039A (en) * 1973-11-01 1976-01-06 Denki Kagaku Kogyo Kabushiki Kaisha Composition for diffusing phosphorus
US3954525A (en) * 1974-08-26 1976-05-04 The Carborundum Company Hot-pressed solid diffusion sources for phosphorus
US3931056A (en) * 1974-08-26 1976-01-06 The Carborundum Company Solid diffusion sources for phosphorus doping containing silicon and zirconium pyrophosphates
US3975308A (en) * 1975-02-07 1976-08-17 The Carborundum Company Preparation of pyrophosphates
SE420596B (sv) * 1975-03-25 1981-10-19 Osaka Packing Formad kropp av amorf kiseldioxid, eventuellt innehallande kalciumkarbonat, sett att framstella en formad kropp av amorf kiseldioxid samt partikel av amorf kiseldioxid for framstellning av en formad kropp
US4033790A (en) * 1976-07-29 1977-07-05 Denki Kagaku Kogyo Kabushiki Kaisha Solid diffusion dopants for semiconductors and method of making the same
US4596716A (en) * 1983-06-08 1986-06-24 Kennecott Corporation Porous silicon nitride semiconductor dopant carriers
JPS6020510A (ja) * 1983-07-13 1985-02-01 Matsushita Electronics Corp 不純物拡散方法
DE3575910D1 (de) * 1985-09-06 1990-03-15 Osaka Packing Formkoerper aus kieselsaeure.
CA1244969A (en) * 1986-10-29 1988-11-15 Mitel Corporation Method for diffusing p-type material using boron disks
US4749615A (en) * 1986-10-31 1988-06-07 Stemcor Corporation Semiconductor dopant source
US5503816A (en) * 1993-09-27 1996-04-02 Becton Dickinson And Company Silicate compounds for DNA purification
TW200304372A (en) * 2002-03-20 2003-10-01 Kanegafuchi Chemical Ind Compositions for diabetes
US20030228475A1 (en) * 2002-04-18 2003-12-11 Minoru Komada Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film
US7658822B2 (en) * 2005-08-11 2010-02-09 Wintek Electro-Optics Corporation SiOx:Si composite articles and methods of making same
US7790060B2 (en) * 2005-08-11 2010-09-07 Wintek Electro Optics Corporation SiOx:Si composite material compositions and methods of making same
US7749406B2 (en) * 2005-08-11 2010-07-06 Stevenson David E SiOx:Si sputtering targets and method of making and using such targets

Also Published As

Publication number Publication date
JPS4910665A (cg-RX-API-DMAC7.html) 1974-01-30
CA1011227A (en) 1977-05-31
US3849344A (en) 1974-11-19

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