JPS5842460B2 - カンコウザイリヨウ ノ セイゾウホウホウ - Google Patents

カンコウザイリヨウ ノ セイゾウホウホウ

Info

Publication number
JPS5842460B2
JPS5842460B2 JP49046735A JP4673574A JPS5842460B2 JP S5842460 B2 JPS5842460 B2 JP S5842460B2 JP 49046735 A JP49046735 A JP 49046735A JP 4673574 A JP4673574 A JP 4673574A JP S5842460 B2 JPS5842460 B2 JP S5842460B2
Authority
JP
Japan
Prior art keywords
group
acid
solution
photosensitive material
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49046735A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5031819A (no
Inventor
ソーンダーソン アラン
ピーター ゲイツ アレン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BITSUKAASU PLC
Original Assignee
BITSUKAASU PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BITSUKAASU PLC filed Critical BITSUKAASU PLC
Publication of JPS5031819A publication Critical patent/JPS5031819A/ja
Publication of JPS5842460B2 publication Critical patent/JPS5842460B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP49046735A 1973-04-26 1974-04-26 カンコウザイリヨウ ノ セイゾウホウホウ Expired JPS5842460B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1999473A GB1466252A (en) 1973-04-26 1973-04-26 Light-sensitive material

Publications (2)

Publication Number Publication Date
JPS5031819A JPS5031819A (no) 1975-03-28
JPS5842460B2 true JPS5842460B2 (ja) 1983-09-20

Family

ID=10138567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49046735A Expired JPS5842460B2 (ja) 1973-04-26 1974-04-26 カンコウザイリヨウ ノ セイゾウホウホウ

Country Status (16)

Country Link
JP (1) JPS5842460B2 (no)
AT (1) AT344998B (no)
BE (1) BE814282A (no)
CA (1) CA1023491A (no)
CH (2) CH598621A5 (no)
DE (1) DE2420372A1 (no)
FI (1) FI62911C (no)
FR (1) FR2227556B1 (no)
GB (1) GB1466252A (no)
IE (1) IE39231B1 (no)
IT (1) IT1010118B (no)
LU (1) LU69940A1 (no)
NL (1) NL175631C (no)
NO (1) NO148794C (no)
SE (1) SE418191B (no)
ZA (1) ZA742559B (no)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6841335B2 (en) * 2002-07-29 2005-01-11 Kodak Polychrome Graphics Llc Imaging members with ionic multifunctional epoxy compounds

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE758116A (fr) * 1969-10-30 1971-04-01 Fuji Photo Film Co Ltd Compose a poids moleculaire eleve et son procede de preparation
JPS4944601B1 (no) * 1970-05-15 1974-11-29
BE790383A (fr) * 1971-10-22 1973-02-15 Howson Algraphy Ltd Matière sensibles à la lumière

Also Published As

Publication number Publication date
NO148794C (no) 1983-12-14
AT344998B (de) 1978-08-25
FR2227556A1 (no) 1974-11-22
NO741505L (no) 1974-10-29
SE418191B (sv) 1981-05-11
CA1023491A (en) 1977-12-27
LU69940A1 (no) 1974-08-06
IT1010118B (it) 1977-01-10
CH607100A5 (no) 1978-11-30
FI62911C (fi) 1983-03-10
AU6823074A (en) 1975-10-30
FR2227556B1 (no) 1980-08-29
NL7405575A (no) 1974-10-29
FI62911B (fi) 1982-11-30
ATA349474A (de) 1977-12-15
CH598621A5 (no) 1978-05-12
NL175631C (nl) 1984-12-03
BE814282A (fr) 1974-08-16
IE39231B1 (en) 1978-08-30
IE39231L (en) 1974-10-26
JPS5031819A (no) 1975-03-28
DE2420372A1 (de) 1974-11-07
ZA742559B (en) 1975-04-30
NO148794B (no) 1983-09-05
GB1466252A (en) 1977-03-02
NL175631B (nl) 1984-07-02

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