GB1466252A - Light-sensitive material - Google Patents
Light-sensitive materialInfo
- Publication number
- GB1466252A GB1466252A GB1999473A GB1999473A GB1466252A GB 1466252 A GB1466252 A GB 1466252A GB 1999473 A GB1999473 A GB 1999473A GB 1999473 A GB1999473 A GB 1999473A GB 1466252 A GB1466252 A GB 1466252A
- Authority
- GB
- United Kingdom
- Prior art keywords
- acid
- group
- poly
- reaction product
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (19)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1999473A GB1466252A (en) | 1973-04-26 | 1973-04-26 | Light-sensitive material |
IE859/74A IE39231B1 (en) | 1973-04-26 | 1974-04-22 | Improvements in or relating to light sensistive material |
ZA00742559A ZA742559B (en) | 1973-04-26 | 1974-04-23 | Improvements in or relating to light sensitive materials |
FI1224/74A FI62911C (fi) | 1973-04-26 | 1974-04-23 | Ljuskaensliga material |
AU68230/74A AU491658B2 (en) | 1973-04-26 | 1974-04-24 | Improvements in or relating to light-sensitive materials |
SE7405484A SE418191B (sv) | 1973-04-26 | 1974-04-24 | Ljuskensligt material samt forfarande for dess framstellning |
NLAANVRAGE7405575,A NL175631C (nl) | 1973-04-26 | 1974-04-25 | Werkwijze voor het bereiden van een lichtgevoelige stof en plaat die daarmee bekleed is. |
NO741505A NO148794C (no) | 1973-04-26 | 1974-04-25 | Lysfoelsomt polymert materiale og dets anvendelse ved tykkplatefremstilling |
FR7414649A FR2227556B1 (no) | 1973-04-26 | 1974-04-26 | |
DE2420372A DE2420372A1 (de) | 1973-04-26 | 1974-04-26 | Lichtempfindliches material und verfahren zu dessen herstellung |
AT349474A AT344998B (de) | 1973-04-26 | 1974-04-26 | Verfahren zur herstellung eines lichtempfindlichen materials |
BE143702A BE814282A (fr) | 1973-04-26 | 1974-04-26 | Matiere photosensible |
IT21939/74A IT1010118B (it) | 1973-04-26 | 1974-04-26 | Procedimento per la produzione di materiale fotosensibile partico larmente per la fabbricazione di lastre da stampa |
JP49046735A JPS5842460B2 (ja) | 1973-04-26 | 1974-04-26 | カンコウザイリヨウ ノ セイゾウホウホウ |
CH1186877A CH607100A5 (no) | 1973-04-26 | 1974-04-26 | |
LU69940A LU69940A1 (no) | 1973-04-26 | 1974-04-26 | |
CH579774A CH598621A5 (no) | 1973-04-26 | 1974-04-26 | |
CA200,931A CA1023491A (en) | 1973-04-26 | 1974-05-27 | Light-sensitive materials |
US05/636,363 US4117039A (en) | 1973-04-26 | 1975-12-01 | Light sensitive materials |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1999473A GB1466252A (en) | 1973-04-26 | 1973-04-26 | Light-sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1466252A true GB1466252A (en) | 1977-03-02 |
Family
ID=10138567
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1999473A Expired GB1466252A (en) | 1973-04-26 | 1973-04-26 | Light-sensitive material |
Country Status (16)
Country | Link |
---|---|
JP (1) | JPS5842460B2 (no) |
AT (1) | AT344998B (no) |
BE (1) | BE814282A (no) |
CA (1) | CA1023491A (no) |
CH (2) | CH607100A5 (no) |
DE (1) | DE2420372A1 (no) |
FI (1) | FI62911C (no) |
FR (1) | FR2227556B1 (no) |
GB (1) | GB1466252A (no) |
IE (1) | IE39231B1 (no) |
IT (1) | IT1010118B (no) |
LU (1) | LU69940A1 (no) |
NL (1) | NL175631C (no) |
NO (1) | NO148794C (no) |
SE (1) | SE418191B (no) |
ZA (1) | ZA742559B (no) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004011260A1 (en) * | 2002-07-29 | 2004-02-05 | Kodak Polychrome Graphics, Llc | Imaging members with ionic multifunctional epoxy compounds |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE758116A (fr) * | 1969-10-30 | 1971-04-01 | Fuji Photo Film Co Ltd | Compose a poids moleculaire eleve et son procede de preparation |
JPS4944601B1 (no) * | 1970-05-15 | 1974-11-29 | ||
BE790383A (fr) * | 1971-10-22 | 1973-02-15 | Howson Algraphy Ltd | Matière sensibles à la lumière |
-
1973
- 1973-04-26 GB GB1999473A patent/GB1466252A/en not_active Expired
-
1974
- 1974-04-22 IE IE859/74A patent/IE39231B1/xx unknown
- 1974-04-23 ZA ZA00742559A patent/ZA742559B/xx unknown
- 1974-04-23 FI FI1224/74A patent/FI62911C/fi active
- 1974-04-24 SE SE7405484A patent/SE418191B/xx unknown
- 1974-04-25 NO NO741505A patent/NO148794C/no unknown
- 1974-04-25 NL NLAANVRAGE7405575,A patent/NL175631C/xx not_active IP Right Cessation
- 1974-04-26 IT IT21939/74A patent/IT1010118B/it active
- 1974-04-26 JP JP49046735A patent/JPS5842460B2/ja not_active Expired
- 1974-04-26 BE BE143702A patent/BE814282A/xx not_active IP Right Cessation
- 1974-04-26 CH CH1186877A patent/CH607100A5/xx not_active IP Right Cessation
- 1974-04-26 DE DE2420372A patent/DE2420372A1/de not_active Withdrawn
- 1974-04-26 LU LU69940A patent/LU69940A1/xx unknown
- 1974-04-26 FR FR7414649A patent/FR2227556B1/fr not_active Expired
- 1974-04-26 AT AT349474A patent/AT344998B/de not_active IP Right Cessation
- 1974-04-26 CH CH579774A patent/CH598621A5/xx not_active IP Right Cessation
- 1974-05-27 CA CA200,931A patent/CA1023491A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004011260A1 (en) * | 2002-07-29 | 2004-02-05 | Kodak Polychrome Graphics, Llc | Imaging members with ionic multifunctional epoxy compounds |
US6841335B2 (en) | 2002-07-29 | 2005-01-11 | Kodak Polychrome Graphics Llc | Imaging members with ionic multifunctional epoxy compounds |
Also Published As
Publication number | Publication date |
---|---|
IE39231L (en) | 1974-10-26 |
ZA742559B (en) | 1975-04-30 |
NO741505L (no) | 1974-10-29 |
ATA349474A (de) | 1977-12-15 |
NL7405575A (no) | 1974-10-29 |
LU69940A1 (no) | 1974-08-06 |
CH598621A5 (no) | 1978-05-12 |
NO148794C (no) | 1983-12-14 |
SE418191B (sv) | 1981-05-11 |
NO148794B (no) | 1983-09-05 |
AU6823074A (en) | 1975-10-30 |
AT344998B (de) | 1978-08-25 |
FR2227556B1 (no) | 1980-08-29 |
JPS5842460B2 (ja) | 1983-09-20 |
FI62911B (fi) | 1982-11-30 |
JPS5031819A (no) | 1975-03-28 |
NL175631C (nl) | 1984-12-03 |
NL175631B (nl) | 1984-07-02 |
FR2227556A1 (no) | 1974-11-22 |
CH607100A5 (no) | 1978-11-30 |
IE39231B1 (en) | 1978-08-30 |
IT1010118B (it) | 1977-01-10 |
BE814282A (fr) | 1974-08-16 |
FI62911C (fi) | 1983-03-10 |
DE2420372A1 (de) | 1974-11-07 |
CA1023491A (en) | 1977-12-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4179577A (en) | Polymerisable esters derived from a phenolic unsaturated ketone | |
US3295974A (en) | Light sensitive epoxy material for the photomechanical production of printing plates | |
CA1178478A (en) | Photopolymerisation process employing compounds containing acryloyl groups and anthryl groups | |
US4536465A (en) | Positive-working photosensitive composition with o-quinone diazide and admixture of resins | |
US4181807A (en) | Polymerizable esters derived from a glycidyl ether of a phenolic unsaturated ketone | |
US4540649A (en) | Water developable photopolymerizable composition and printing plate element containing same | |
US3522049A (en) | Photohardening | |
GB1460978A (en) | Photosensitive composition | |
EP0021718A1 (en) | Photosensitive condensation product, photosensitive compositions and lithographic printing plates containing said condensation product | |
US3861921A (en) | Subbing layers comprising polyamide and phenolic resin for metal bases of photopolymerizable elements | |
US4347303A (en) | Dry planographic printing plate with organic acid additive | |
US3544317A (en) | Mixtures of diazonium compounds and carboxylated polymers in the making of a light-sensitive lithographic plate | |
US4035189A (en) | Image forming curable resin compositions | |
JPS6381101A (ja) | 感光性樹脂 | |
GB1423216A (en) | Presensitized planographic printing plate | |
US3933885A (en) | Cinnamylideneacetic acid esters | |
US4221859A (en) | Photopolymerizable composition with oxalic acid photoinitiator | |
GB1466252A (en) | Light-sensitive material | |
US3429839A (en) | Epoxy polymer derived polymers containing quaternary phosphonium groups | |
US3702765A (en) | Alkali-soluble light sensitive polymers and compositions and processes for using such polymers | |
US4188221A (en) | Photosensitive polyamide resin composition useful for making relief printing plate | |
US4229514A (en) | Photosensitive composition | |
US4065430A (en) | Functional group containing polymer and method of preparing the same | |
US3770443A (en) | Photosensitive composition comprising a photosensitive polymer | |
GB1580959A (en) | Substituted acrylamide and polymers |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |