JPS5841722Y2 - イオン打込用のバックプレ−ト装置 - Google Patents
イオン打込用のバックプレ−ト装置Info
- Publication number
- JPS5841722Y2 JPS5841722Y2 JP1977162156U JP16215677U JPS5841722Y2 JP S5841722 Y2 JPS5841722 Y2 JP S5841722Y2 JP 1977162156 U JP1977162156 U JP 1977162156U JP 16215677 U JP16215677 U JP 16215677U JP S5841722 Y2 JPS5841722 Y2 JP S5841722Y2
- Authority
- JP
- Japan
- Prior art keywords
- back plate
- wafer
- ion implantation
- connecting rod
- front surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977162156U JPS5841722Y2 (ja) | 1977-12-05 | 1977-12-05 | イオン打込用のバックプレ−ト装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1977162156U JPS5841722Y2 (ja) | 1977-12-05 | 1977-12-05 | イオン打込用のバックプレ−ト装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5488270U JPS5488270U (enrdf_load_stackoverflow) | 1979-06-22 |
| JPS5841722Y2 true JPS5841722Y2 (ja) | 1983-09-20 |
Family
ID=29157593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1977162156U Expired JPS5841722Y2 (ja) | 1977-12-05 | 1977-12-05 | イオン打込用のバックプレ−ト装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5841722Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4261762A (en) * | 1979-09-14 | 1981-04-14 | Eaton Corporation | Method for conducting heat to or from an article being treated under vacuum |
| JPS6231972Y2 (enrdf_load_stackoverflow) * | 1979-12-21 | 1987-08-15 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51142277A (en) * | 1975-06-03 | 1976-12-07 | Fujitsu Ltd | Device for electron-beam exposure |
-
1977
- 1977-12-05 JP JP1977162156U patent/JPS5841722Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5488270U (enrdf_load_stackoverflow) | 1979-06-22 |
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