JPS5841535Y2 - 露光用フォトマスク - Google Patents
露光用フォトマスクInfo
- Publication number
- JPS5841535Y2 JPS5841535Y2 JP1976137181U JP13718176U JPS5841535Y2 JP S5841535 Y2 JPS5841535 Y2 JP S5841535Y2 JP 1976137181 U JP1976137181 U JP 1976137181U JP 13718176 U JP13718176 U JP 13718176U JP S5841535 Y2 JPS5841535 Y2 JP S5841535Y2
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- exposure
- photomasks
- pin
- spring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976137181U JPS5841535Y2 (ja) | 1976-10-13 | 1976-10-13 | 露光用フォトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1976137181U JPS5841535Y2 (ja) | 1976-10-13 | 1976-10-13 | 露光用フォトマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5356201U JPS5356201U (enExample) | 1978-05-13 |
| JPS5841535Y2 true JPS5841535Y2 (ja) | 1983-09-20 |
Family
ID=28746031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1976137181U Expired JPS5841535Y2 (ja) | 1976-10-13 | 1976-10-13 | 露光用フォトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5841535Y2 (enExample) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51107164U (enExample) * | 1975-02-20 | 1976-08-27 |
-
1976
- 1976-10-13 JP JP1976137181U patent/JPS5841535Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5356201U (enExample) | 1978-05-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0650714B2 (ja) | 露光方法 | |
| US3877808A (en) | Printed circuit board exposure holding device | |
| JPS5841535Y2 (ja) | 露光用フォトマスク | |
| US3591284A (en) | Printed circuit layout means | |
| US4284349A (en) | Means for imaging a lithographic plate | |
| US2825976A (en) | Repeat apparatus for holding negatives used in lithography | |
| JPS6468926A (en) | Measurement of image distortion in projection optical system | |
| JPH045184B2 (enExample) | ||
| ATE195T1 (de) | Registersystem zum passerhaltigen ausrichten einer biegsamen druckplatte. | |
| US2334745A (en) | Method of lay-down for printing operations | |
| US3580676A (en) | Art of plate making | |
| JPS5931852B2 (ja) | フォトレジスト露光用マスク | |
| JP3528661B2 (ja) | 感光性樹脂版の製版装置 | |
| JPS5944826A (ja) | マスク合わせ装置 | |
| JPS5924028Y2 (ja) | 下面露光焼付機 | |
| JPS61114242A (ja) | 多丁付ガラス原版の製造方法 | |
| US3070893A (en) | Method and apparatus for eliminating optical registration of chase or negative carrier of step-and-repeat photocomposing machine | |
| JPH0238282Y2 (enExample) | ||
| JPS60176041A (ja) | シヤドウマスク用パタ−ン版の製造方法 | |
| JPS5986221A (ja) | 特殊基準マ−クを用いたマスクのアライメント方法 | |
| JPH0475496B2 (enExample) | ||
| JPS6258139B2 (enExample) | ||
| JPS6323708Y2 (enExample) | ||
| JPH052932Y2 (enExample) | ||
| JPS60112247U (ja) | 露光用ホルダ− |