JPS5836679A - ウエツト処理方法 - Google Patents

ウエツト処理方法

Info

Publication number
JPS5836679A
JPS5836679A JP56132769A JP13276981A JPS5836679A JP S5836679 A JPS5836679 A JP S5836679A JP 56132769 A JP56132769 A JP 56132769A JP 13276981 A JP13276981 A JP 13276981A JP S5836679 A JPS5836679 A JP S5836679A
Authority
JP
Japan
Prior art keywords
substrate
nozzle
chemical solution
wet processing
rotated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56132769A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0362476B2 (enExample
Inventor
Tomoaki Tsuboka
智昭 坪香
Yoshinori Niwada
庭田　義則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56132769A priority Critical patent/JPS5836679A/ja
Publication of JPS5836679A publication Critical patent/JPS5836679A/ja
Publication of JPH0362476B2 publication Critical patent/JPH0362476B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP56132769A 1981-08-26 1981-08-26 ウエツト処理方法 Granted JPS5836679A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56132769A JPS5836679A (ja) 1981-08-26 1981-08-26 ウエツト処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56132769A JPS5836679A (ja) 1981-08-26 1981-08-26 ウエツト処理方法

Publications (2)

Publication Number Publication Date
JPS5836679A true JPS5836679A (ja) 1983-03-03
JPH0362476B2 JPH0362476B2 (enExample) 1991-09-26

Family

ID=15089119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56132769A Granted JPS5836679A (ja) 1981-08-26 1981-08-26 ウエツト処理方法

Country Status (1)

Country Link
JP (1) JPS5836679A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016111345A (ja) * 2014-12-01 2016-06-20 東京エレクトロン株式会社 現像処理方法、コンピュータ記憶媒体及び現像処理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541603A (en) * 1977-06-06 1979-01-08 Fujitsu Ltd Coating method of magnetic recording media

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS541603A (en) * 1977-06-06 1979-01-08 Fujitsu Ltd Coating method of magnetic recording media

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016111345A (ja) * 2014-12-01 2016-06-20 東京エレクトロン株式会社 現像処理方法、コンピュータ記憶媒体及び現像処理装置

Also Published As

Publication number Publication date
JPH0362476B2 (enExample) 1991-09-26

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