JPS5836679A - ウエツト処理方法 - Google Patents
ウエツト処理方法Info
- Publication number
- JPS5836679A JPS5836679A JP56132769A JP13276981A JPS5836679A JP S5836679 A JPS5836679 A JP S5836679A JP 56132769 A JP56132769 A JP 56132769A JP 13276981 A JP13276981 A JP 13276981A JP S5836679 A JPS5836679 A JP S5836679A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- nozzle
- chemical solution
- wet processing
- rotated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56132769A JPS5836679A (ja) | 1981-08-26 | 1981-08-26 | ウエツト処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56132769A JPS5836679A (ja) | 1981-08-26 | 1981-08-26 | ウエツト処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5836679A true JPS5836679A (ja) | 1983-03-03 |
| JPH0362476B2 JPH0362476B2 (enExample) | 1991-09-26 |
Family
ID=15089119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56132769A Granted JPS5836679A (ja) | 1981-08-26 | 1981-08-26 | ウエツト処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5836679A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016111345A (ja) * | 2014-12-01 | 2016-06-20 | 東京エレクトロン株式会社 | 現像処理方法、コンピュータ記憶媒体及び現像処理装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS541603A (en) * | 1977-06-06 | 1979-01-08 | Fujitsu Ltd | Coating method of magnetic recording media |
-
1981
- 1981-08-26 JP JP56132769A patent/JPS5836679A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS541603A (en) * | 1977-06-06 | 1979-01-08 | Fujitsu Ltd | Coating method of magnetic recording media |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016111345A (ja) * | 2014-12-01 | 2016-06-20 | 東京エレクトロン株式会社 | 現像処理方法、コンピュータ記憶媒体及び現像処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0362476B2 (enExample) | 1991-09-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5836679A (ja) | ウエツト処理方法 | |
| JPS636843A (ja) | 基板現像処理方法 | |
| JPS6470168A (en) | Liquid chemical applicator | |
| JP3266229B2 (ja) | 処理方法 | |
| JPH062260Y2 (ja) | スプレー装置 | |
| JPH0554187B2 (enExample) | ||
| JP2593465B2 (ja) | 半導体ウエーハの液処理装置 | |
| JPH02133916A (ja) | レジスト塗布装置 | |
| JPS6188530A (ja) | 洗浄装置 | |
| JP2989215B2 (ja) | 回転塗布装置およびその洗浄方法 | |
| JPH03256321A (ja) | レジスト膜形成装置 | |
| JP2809754B2 (ja) | 現像装置 | |
| JP2580082B2 (ja) | 基板の回転処理装置 | |
| JP2002129385A (ja) | めっき方法 | |
| JPH03123028A (ja) | 半導体装置の製造装置 | |
| JPS6342131A (ja) | 半導体ウエ−ハの処理装置 | |
| JPH0417334A (ja) | 基板のウェット処理装置 | |
| JPH0132357Y2 (enExample) | ||
| JPH04335645A (ja) | フォトレジストの現像方法および現像装置 | |
| JPH04133415A (ja) | 半導体基板現像装置 | |
| JPS6342130A (ja) | 基板洗浄方法および装置 | |
| JPS6352144A (ja) | レジスト膜の現像方法 | |
| JPS63232431A (ja) | 現像方法 | |
| JPS6333660Y2 (enExample) | ||
| JPH03148111A (ja) | 半導体装置製造用現像装置 |