JPS5829615B2 - コウヒテイコウカゴウブツハンドウタイ ノ キソウセイチヨウホウ - Google Patents
コウヒテイコウカゴウブツハンドウタイ ノ キソウセイチヨウホウInfo
- Publication number
- JPS5829615B2 JPS5829615B2 JP49105523A JP10552374A JPS5829615B2 JP S5829615 B2 JPS5829615 B2 JP S5829615B2 JP 49105523 A JP49105523 A JP 49105523A JP 10552374 A JP10552374 A JP 10552374A JP S5829615 B2 JPS5829615 B2 JP S5829615B2
- Authority
- JP
- Japan
- Prior art keywords
- chloride
- reaction vessel
- gallium
- gas
- reaction tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49105523A JPS5829615B2 (ja) | 1974-09-14 | 1974-09-14 | コウヒテイコウカゴウブツハンドウタイ ノ キソウセイチヨウホウ |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49105523A JPS5829615B2 (ja) | 1974-09-14 | 1974-09-14 | コウヒテイコウカゴウブツハンドウタイ ノ キソウセイチヨウホウ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5133561A JPS5133561A (en) | 1976-03-22 |
| JPS5829615B2 true JPS5829615B2 (ja) | 1983-06-23 |
Family
ID=14409943
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP49105523A Expired JPS5829615B2 (ja) | 1974-09-14 | 1974-09-14 | コウヒテイコウカゴウブツハンドウタイ ノ キソウセイチヨウホウ |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5829615B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006024597A (ja) * | 2004-07-06 | 2006-01-26 | Furukawa Co Ltd | 気相成長装置およびiii族窒化物半導体膜の形成方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62219590A (ja) * | 1986-03-19 | 1987-09-26 | Nec Corp | 光半導体集積素子及びその製造方法 |
| JPH0818901B2 (ja) * | 1989-01-13 | 1996-02-28 | 日本電気株式会社 | 気相成長方法及び埋め込み構造半導体レーザの製造方法 |
-
1974
- 1974-09-14 JP JP49105523A patent/JPS5829615B2/ja not_active Expired
Non-Patent Citations (1)
| Title |
|---|
| JOURNAL OF THE ELECTROCHEMICAL SOCIETY=1966 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006024597A (ja) * | 2004-07-06 | 2006-01-26 | Furukawa Co Ltd | 気相成長装置およびiii族窒化物半導体膜の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5133561A (en) | 1976-03-22 |
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