JPS58214145A - 減力可能な画像形成物およびその製造方法 - Google Patents
減力可能な画像形成物およびその製造方法Info
- Publication number
- JPS58214145A JPS58214145A JP57097374A JP9737482A JPS58214145A JP S58214145 A JPS58214145 A JP S58214145A JP 57097374 A JP57097374 A JP 57097374A JP 9737482 A JP9737482 A JP 9737482A JP S58214145 A JPS58214145 A JP S58214145A
- Authority
- JP
- Japan
- Prior art keywords
- image
- photosensitive
- film
- polymerization inhibitor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57097374A JPS58214145A (ja) | 1982-06-07 | 1982-06-07 | 減力可能な画像形成物およびその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57097374A JPS58214145A (ja) | 1982-06-07 | 1982-06-07 | 減力可能な画像形成物およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58214145A true JPS58214145A (ja) | 1983-12-13 |
JPH0148533B2 JPH0148533B2 (enrdf_load_stackoverflow) | 1989-10-19 |
Family
ID=14190729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57097374A Granted JPS58214145A (ja) | 1982-06-07 | 1982-06-07 | 減力可能な画像形成物およびその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58214145A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0716347A1 (en) * | 1994-12-06 | 1996-06-12 | Fuji Photo Film Co., Ltd. | Developer for photosensitive lithographic printing plate |
-
1982
- 1982-06-07 JP JP57097374A patent/JPS58214145A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0716347A1 (en) * | 1994-12-06 | 1996-06-12 | Fuji Photo Film Co., Ltd. | Developer for photosensitive lithographic printing plate |
US5837425A (en) * | 1994-12-06 | 1998-11-17 | Fuji Photo Film Co., Ltd. | Method of preparing a lithographic printing plate using a developer containing a development stabilizer |
Also Published As
Publication number | Publication date |
---|---|
JPH0148533B2 (enrdf_load_stackoverflow) | 1989-10-19 |
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