JPH0148533B2 - - Google Patents

Info

Publication number
JPH0148533B2
JPH0148533B2 JP9737482A JP9737482A JPH0148533B2 JP H0148533 B2 JPH0148533 B2 JP H0148533B2 JP 9737482 A JP9737482 A JP 9737482A JP 9737482 A JP9737482 A JP 9737482A JP H0148533 B2 JPH0148533 B2 JP H0148533B2
Authority
JP
Japan
Prior art keywords
image
film
polymerization inhibitor
photosensitive
formed product
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9737482A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58214145A (ja
Inventor
Toshiaki Fujimura
Yoshio Kato
Koichi Seto
Satoshi Imahashi
Shinichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP57097374A priority Critical patent/JPS58214145A/ja
Publication of JPS58214145A publication Critical patent/JPS58214145A/ja
Publication of JPH0148533B2 publication Critical patent/JPH0148533B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP57097374A 1982-06-07 1982-06-07 減力可能な画像形成物およびその製造方法 Granted JPS58214145A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57097374A JPS58214145A (ja) 1982-06-07 1982-06-07 減力可能な画像形成物およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57097374A JPS58214145A (ja) 1982-06-07 1982-06-07 減力可能な画像形成物およびその製造方法

Publications (2)

Publication Number Publication Date
JPS58214145A JPS58214145A (ja) 1983-12-13
JPH0148533B2 true JPH0148533B2 (enrdf_load_stackoverflow) 1989-10-19

Family

ID=14190729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57097374A Granted JPS58214145A (ja) 1982-06-07 1982-06-07 減力可能な画像形成物およびその製造方法

Country Status (1)

Country Link
JP (1) JPS58214145A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0716347B1 (en) * 1994-12-06 2002-07-24 Fuji Photo Film Co., Ltd. Developer for photosensitive lithographic printing plate

Also Published As

Publication number Publication date
JPS58214145A (ja) 1983-12-13

Similar Documents

Publication Publication Date Title
US3905815A (en) Photopolymerizable sheet material with diazo resin layer
US4210711A (en) Process for forming an image
CA1184077A (en) Process for preparing an overcoated photopolymer printing plate
US4264708A (en) Radiation sensitive element having a thin photopolymerizable layer
JPH02135351A (ja) 光重合性混合物、それから作製された記録材料、及びコピーの製造方法
US3600166A (en) Lithographic plate and process of making
TWI296356B (enrdf_load_stackoverflow)
JP2001209174A (ja) フレキソ印刷版に用いる光退色性化合物
CA1079565A (en) Dot-etchable photopolymerizable elements and image reproduction process
EP0076565B1 (en) Single exposure positive-working photopolymer element
US4357416A (en) Process for preparation of multilayer photosensitive solvent-processable litho element
JPH0210936B2 (enrdf_load_stackoverflow)
US4308338A (en) Methods of imaging photopolymerizable materials containing diester polyether
US4740450A (en) Method of making image reproducing material having scratch improvment
JPS60191238A (ja) 画像複製材料およびその製造法
JPH0369097B2 (enrdf_load_stackoverflow)
JPH0148533B2 (enrdf_load_stackoverflow)
US3568597A (en) Lithographic printing plate and process
GB1587476A (en) Photopolymerizable compositions and elements and methods of imaging
US4699859A (en) Dot-etchable image-containing element useful in lithographic mask formation and its production
JPS6098433A (ja) 画像複製材料
JPS61174541A (ja) 画像複製材料用感光性組成物
JP2003186176A (ja) フォトマスク材料、フォトマスク及びその製造方法
US7078150B1 (en) Photosensitive resin print plate material and production method for photosensitive resin print plate
JPS5860737A (ja) 画像複製材料および画像複製方法