JPH0369097B2 - - Google Patents

Info

Publication number
JPH0369097B2
JPH0369097B2 JP59031095A JP3109584A JPH0369097B2 JP H0369097 B2 JPH0369097 B2 JP H0369097B2 JP 59031095 A JP59031095 A JP 59031095A JP 3109584 A JP3109584 A JP 3109584A JP H0369097 B2 JPH0369097 B2 JP H0369097B2
Authority
JP
Japan
Prior art keywords
parts
formula
image
acid groups
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59031095A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60175044A (ja
Inventor
Satoshi Imahashi
Michitoku Kono
Shigeo Takenaka
Shinichi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP59031095A priority Critical patent/JPS60175044A/ja
Priority to DE19853508820 priority patent/DE3508820A1/de
Publication of JPS60175044A publication Critical patent/JPS60175044A/ja
Publication of JPH0369097B2 publication Critical patent/JPH0369097B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Polymerisation Methods In General (AREA)
JP59031095A 1984-02-20 1984-02-20 リスフィルム用感光性組成物 Granted JPS60175044A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59031095A JPS60175044A (ja) 1984-02-20 1984-02-20 リスフィルム用感光性組成物
DE19853508820 DE3508820A1 (de) 1984-02-20 1985-03-13 Lichtempfindliche zusammensetzung bzw. zubereitung fuer ein bildwiedergabematerial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59031095A JPS60175044A (ja) 1984-02-20 1984-02-20 リスフィルム用感光性組成物

Publications (2)

Publication Number Publication Date
JPS60175044A JPS60175044A (ja) 1985-09-09
JPH0369097B2 true JPH0369097B2 (enrdf_load_stackoverflow) 1991-10-30

Family

ID=12321835

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59031095A Granted JPS60175044A (ja) 1984-02-20 1984-02-20 リスフィルム用感光性組成物

Country Status (2)

Country Link
JP (1) JPS60175044A (enrdf_load_stackoverflow)
DE (1) DE3508820A1 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174541A (ja) * 1985-01-29 1986-08-06 Toyobo Co Ltd 画像複製材料用感光性組成物
DE3588111T2 (de) * 1985-06-29 1996-10-31 Asahi Chem Res Lab Kunststoffzusammensetzung für Lötschutztinte
JP2639728B2 (ja) * 1989-04-27 1997-08-13 富士写真フイルム株式会社 感光性平版印刷版
AU660402B1 (en) * 1994-01-25 1995-06-22 Morton International, Inc. Waterborne photoresists having binders with sulfonic acid functionality
WO2001025288A1 (en) * 1999-10-01 2001-04-12 Ballina Pty Ltd Radiation polymerisable compositions
EP2450385A4 (en) * 2009-07-01 2014-09-03 Sekisui Chemical Co Ltd BONDING RESIN FOR ONE GUIDING PASTE, GUIDANCE PASTE AND SOLAR CELL ELEMENT
US9110205B2 (en) * 2009-12-11 2015-08-18 Fujifilm Corporation Black curable composition, light-shielding color filter, light-shielding film and method for manufacturing the same, wafer level lens, and solid-state imaging device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034963A (enrdf_load_stackoverflow) * 1973-07-27 1975-04-03
JPS54147031A (en) * 1978-05-11 1979-11-16 Toray Industries Photosensitive material
US4361640A (en) * 1981-10-02 1982-11-30 E. I. Du Pont De Nemours And Company Aqueous developable photopolymer compositions containing terpolymer binder
JPS5868740A (ja) * 1981-10-21 1983-04-23 Japan Synthetic Rubber Co Ltd 耐熱性フイルムホトレジスト積層物

Also Published As

Publication number Publication date
JPS60175044A (ja) 1985-09-09
DE3508820A1 (de) 1986-09-18

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