JPH0369097B2 - - Google Patents
Info
- Publication number
- JPH0369097B2 JPH0369097B2 JP3109584A JP3109584A JPH0369097B2 JP H0369097 B2 JPH0369097 B2 JP H0369097B2 JP 3109584 A JP3109584 A JP 3109584A JP 3109584 A JP3109584 A JP 3109584A JP H0369097 B2 JPH0369097 B2 JP H0369097B2
- Authority
- JP
- Japan
- Prior art keywords
- parts
- formula
- image
- acid groups
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 claims description 13
- 239000011230 binding agent Substances 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 239000006096 absorbing agent Substances 0.000 claims description 5
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- 238000002835 absorbance Methods 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- -1 Silver halide Chemical class 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 239000010410 layer Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000001603 reducing effect Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000006229 carbon black Substances 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 2
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 description 1
- NUHZUJVVLKHPPH-UHFFFAOYSA-N 2-(2-chloronaphthalen-1-yl)-2-[2-(2-chloronaphthalen-1-yl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=C2C=CC=CC2=C1C(N=1)(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2Cl)N=C(C=2C=CC=CC=2)C=1C1=CC=CC=C1 NUHZUJVVLKHPPH-UHFFFAOYSA-N 0.000 description 1
- GBOJZXLCJZDBKO-UHFFFAOYSA-N 2-(2-chlorophenyl)-2-[2-(2-chlorophenyl)-4,5-diphenylimidazol-2-yl]-4,5-diphenylimidazole Chemical compound ClC1=CC=CC=C1C1(C2(N=C(C(=N2)C=2C=CC=CC=2)C=2C=CC=CC=2)C=2C(=CC=CC=2)Cl)N=C(C=2C=CC=CC=2)C(C=2C=CC=CC=2)=N1 GBOJZXLCJZDBKO-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- PITPRNOGWXAZAW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-methoxyphenol Chemical compound COC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 PITPRNOGWXAZAW-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- MFYSUUPKMDJYPF-UHFFFAOYSA-N 2-[(4-methyl-2-nitrophenyl)diazenyl]-3-oxo-n-phenylbutanamide Chemical compound C=1C=CC=CC=1NC(=O)C(C(=O)C)N=NC1=CC=C(C)C=C1[N+]([O-])=O MFYSUUPKMDJYPF-UHFFFAOYSA-N 0.000 description 1
- JCYPECIVGRXBMO-UHFFFAOYSA-N 4-(dimethylamino)azobenzene Chemical compound C1=CC(N(C)C)=CC=C1N=NC1=CC=CC=C1 JCYPECIVGRXBMO-UHFFFAOYSA-N 0.000 description 1
- ZCILGMFPJBRCNO-UHFFFAOYSA-N 4-phenyl-2H-benzotriazol-5-ol Chemical compound OC1=CC=C2NN=NC2=C1C1=CC=CC=C1 ZCILGMFPJBRCNO-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- AUNAPVYQLLNFOI-UHFFFAOYSA-L [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O Chemical compound [Pb++].[Pb++].[Pb++].[O-]S([O-])(=O)=O.[O-][Cr]([O-])(=O)=O.[O-][Mo]([O-])(=O)=O AUNAPVYQLLNFOI-UHFFFAOYSA-L 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- NDXQAHKCTLWEKI-UHFFFAOYSA-N butyl 2-methylprop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C(C)=C NDXQAHKCTLWEKI-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229940081734 cellulose acetate phthalate Drugs 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- SKCNIGRBPJIUBQ-UHFFFAOYSA-N chloroform;ethyl acetate Chemical compound ClC(Cl)Cl.CCOC(C)=O SKCNIGRBPJIUBQ-UHFFFAOYSA-N 0.000 description 1
- AFYCEAFSNDLKSX-UHFFFAOYSA-N coumarin 460 Chemical compound CC1=CC(=O)OC2=CC(N(CC)CC)=CC=C21 AFYCEAFSNDLKSX-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- RZBXSLICNMYVAJ-UHFFFAOYSA-N ethenyl acetate;2-methylprop-2-enoic acid Chemical compound CC(=O)OC=C.CC(=C)C(O)=O RZBXSLICNMYVAJ-UHFFFAOYSA-N 0.000 description 1
- IAJNXBNRYMEYAZ-UHFFFAOYSA-N ethyl 2-cyano-3,3-diphenylprop-2-enoate Chemical compound C=1C=CC=CC=1C(=C(C#N)C(=O)OCC)C1=CC=CC=C1 IAJNXBNRYMEYAZ-UHFFFAOYSA-N 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229920003132 hydroxypropyl methylcellulose phthalate Polymers 0.000 description 1
- 229940031704 hydroxypropyl methylcellulose phthalate Drugs 0.000 description 1
- 229920000639 hydroxypropylmethylcellulose acetate succinate Polymers 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- MYSWGNHLJGOCPT-UHFFFAOYSA-N methyl prop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C=C MYSWGNHLJGOCPT-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- CUXQLKLUPGTTKL-UHFFFAOYSA-M microcosmic salt Chemical compound [NH4+].[Na+].OP([O-])([O-])=O CUXQLKLUPGTTKL-UHFFFAOYSA-M 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- GDESWOTWNNGOMW-UHFFFAOYSA-N resorcinol monobenzoate Chemical compound OC1=CC=CC(OC(=O)C=2C=CC=CC=2)=C1 GDESWOTWNNGOMW-UHFFFAOYSA-N 0.000 description 1
- 238000007127 saponification reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Description
本発明は、減力可能なリスフイルム用の感光性
組成物に関する。更に詳しくは、写真製版用途等
において使用されるリスフイルムとして使用で
き、画像複製後の複製画像の網点を小さくして減
力する場合、複製後日時を経て減力しても、減力
速度等の減力性が変らないリスフイルムに利用で
きる感光性組成物に関する。
写真製版工程において、密着返し用リスフイル
ムとして、現在はハロゲン化銀感光材料が使用さ
れているが、銀資源枯渇の背景の下、これを非銀
塩感光材料を利用したもので代用せんとの動きが
盛んである。しかしながら、代用し得るための必
須の機能は、複製された画像の網点を小さくする
ことにより画像のトーンを修正できること(減
力、ドツトエツチ)であるが、この機能を有する
非銀塩感光材料は少ない。これ迄に知られてい
る、かかる減力性を有する非銀塩感光材料として
は特開昭52−62427号公報に、形成された画像が
未硬化の下層部を有することを利用し減力するも
のが記載されている。これは、確かに画像形成直
後では優れた減力性(減力%及び減力速度)を有
している。ところが、この材料は、写真製版工程
での常識的なプロセスである校正刷用刷版焼付に
際し、校正版に密着し裏面より露光を受けると、
当然のことながら未硬化の下層部が硬化し、それ
以後実際に減力が必要となる時点に於て減力する
ことが不可能となつてしまう。この欠点を改良す
るために、本発明者らは、形成画像の画像部に重
合禁止剤を含有させる方法を発明し、先に特許の
出願を行なつた。この発明により、現実の写真製
版プロセスにおいて使用可能な減力性を有する非
銀塩リスフイルムが実現したのであるが、さら
に、現実の写真製版業の実態を見るに、なおこれ
でも不十分な点があることが判つた。現実の写真
製版業においては、校正刷を発注者に見せ、その
希望により複製画像の減力を行なうが、減力を行
なう時期は、校正刷焼付と同じ日の場合もある
し、遅い場合には、半年後の場合もある。従つて
減力性はこの時期に亘つて同じものでなければ現
実的なものとはなり得ないのである。ところが、
上記発明の方法によつても減力性自体は、放置と
共に低下していき、逐には減力不可能になつてし
まう。この現象は、上記した裏露光の有無や重合
禁止剤の有無にかかわらず生じるものであるため
その原因は光反応によるものではないが、とにか
く、かかる減力性の経時変化があるものでは実用
的なものと言えず大きな問題である。
本発明者らは、かかる問題を解決し、真に減力
可能な画像複製材料用の感光性材料を開発せんと
して鋭意努力を重ねた結果、逐に本発明を完成さ
せるに到つた。すなわち本発明は、少なくとも(1)
活性光線吸収剤、(2)分子中にカルボン酸基、スル
ホン酸基またはリン酸基の一種以上の基を有する
重合体状結合剤、(3)下記一般式
The present invention relates to a photosensitive composition for a reducible lithium film. More specifically, it can be used as a lithographic film used in photolithography, etc., and when the halftone dots of the reproduced image are made smaller after image duplication and the power is reduced, even if the power is reduced after the date and time after the duplication, the speed of reduction is low. The present invention relates to a photosensitive composition that can be used for lithographic films that do not change their reducing properties. Silver halide photosensitive materials are currently used as lithographic film for contact return in the photolithography process, but due to the depletion of silver resources, there is a need to replace this with non-silver salt photosensitive materials. There is a lot of movement. However, the essential function for this substitution is the ability to modify the tone of the image by making the halftone dots of the reproduced image smaller (reduction, dot etch), and non-silver salt photosensitive materials that have this function are few. A known non-silver salt photosensitive material having such a force reducing property is disclosed in Japanese Patent Application Laid-Open No. 52-62427, which reduces force by utilizing the fact that the formed image has an uncured lower layer. things are listed. This certainly has excellent force reduction properties (force reduction % and force reduction speed) immediately after image formation. However, when this material comes into close contact with the proof plate and is exposed to light from the back side during proof plate printing, which is a common process in the photolithography process,
Naturally, the uncured lower layer hardens, and it becomes impossible to reduce the force at the time when it is actually required. In order to improve this drawback, the present inventors invented a method of containing a polymerization inhibitor in the image area of the formed image, and previously filed a patent application. Through this invention, a non-silver salt lithium-ion film was realized that had a force-reducing property that could be used in the actual photolithography process. It turns out that there is. In the actual photoengraving industry, the proof is shown to the customer and the reproduced image is reduced in strength according to the customer's request. may be six months later. Therefore, unless the force reduction property remains the same throughout this period, it cannot be realistic. However,
Even with the method of the invention described above, the force reduction property itself decreases as the product is left unused, and it eventually becomes impossible to reduce force. This phenomenon occurs regardless of the presence or absence of the above-mentioned back exposure and the presence or absence of a polymerization inhibitor, so the cause is not due to a photoreaction. This is a huge problem. The present inventors have worked diligently to solve these problems and to develop a photosensitive material for image duplicating materials that can truly reduce force, and as a result, they have gradually completed the present invention. That is, the present invention provides at least (1)
Actinic ray absorber, (2) polymeric binder having one or more carboxylic acid groups, sulfonic acid groups, or phosphoric acid groups in the molecule, (3) the following general formula
【式】又は[Formula] or
【式】
(式中R1、R2は炭素数1〜3のアルキル基、R3
は炭素数1〜6のアルキル基、R4、R5は炭素数
3〜6のアルキル基をあらわす)
であらわされるアミン化合物
(4)光開始剤および(5)重合可能な単量体を含み、
厚さ1μあたり活性光線範囲内での吸光度が0.4〜
4.0であることを特徴とする減力処理し得るリス
フイルム用感光性組成物である。
本発明感光性組成物の各々の組成物について以
下に詳述する。
(1) 活性光線吸収剤
後述する光開始剤のほかに、本発明の感光性
組成物の感光波長域の光線即ち活性光線の吸収
に有効な化合物を添加することによつて、リス
フイルムとした場合、画像様の活性光線照射に
対して不透明な画像が形成される。活性光線の
吸収を大きくすることによつて、マスクの透明
部分を通して露光された画像部分は上層部のみ
硬化反応が進み下層は未硬化の状態を保つよう
になる。このように、未硬化の下層部を保持す
ることにより製版用フイルムとしての用途向け
に有利な特性である減力性が保持される。
使用される活性光線吸収剤としては、紫外線
吸収剤、紫外線吸収染料やその他の染料や顔料
などであり、厚さ1μあたり活性光線範囲内で
の吸光度が0.4〜4.0となるように成分や配合量
を適宜選べばよい。これらの例として、カーボ
ンブラツク、酸化チタン、酸化鉄、各種金属や
金属の酸化物、硫化物等の化合物の粉末、ピグ
メントブラツク(C.I.50440)、クロムイエロー
ライト(C.I.77603)、2,2′−ジヒドロキシ−
4−メトキシベンゾフエノン、2,4−ジヒド
ロキシベゾフエノン、ヒドロキシフエニルベン
ゾトリアゾール、2−(2′−ヒドロキシ−5′−
メトキシフエニル)ベンゾトリアゾール、レゾ
ルシノールモノベンゾエート、エチル−2−シ
アノ−3,3−ジフエニルアクリレート、トル
イジン・イエローGW(C.I.71680)、モリブデン
オレンジ(C.I.77605)、スーダンイエロー(C.
I.30)、オイルオレンジ(C.I.12055)などがあ
る。特に、従来の銀塩と同じ黒色にするにはカ
ーボンブラツクが望ましい。また、着色のない
紫外線吸収剤などを用いる場合は画像部が見え
にくいため染料や顔料を添加する方が良い。無
機・有機顔料や金属や金属の化合物などの場
合、物理的方法か化学的方法によつて微粒子化
する必要がある。
(2) 重合体状結合剤
本発明において使用する有用な重合体状結合
剤は、溶媒可溶で50℃以下では固定状の有機重
合体であつて、かつ分子中にカルボン酸基、ス
ルホン酸基またはリン酸基の1種以上の基を有
する重合体である。かかる酸基は重合体1Kg中
1〜4当量の範囲にあることが好ましく、かか
る重合体を用いることにより、得られる画像複
製材料はアルカリ性水溶液にて現象もしくは減
力することが可能となる。このような重合体の
例を挙げれば、
(a) カルボン酸基を含む重合体
メタクリル酸メチル−メタクリル酸共重合
体,メタクリル酸メチル−メタクリル酸ブチ
ル−アクリル酸共重合体,アクリル酸メチル
−アクリル酸共重合体,酢酸ビニル−メタク
リル酸共重合体,塩化ビニリデン−イタコン
酸共重合体,スチレン−アレイン酸共重合
体、スチレン−マレイン酸モノブチルエステ
ル共重合体,アクリロニトリル−ビニル酢酸
共重合体といつたアクリル酸,メタクリル
酸,イタコン酸,ビニル酢酸,マレイン酸な
どのカルボン酸を含むビニル化合物と他のビ
ニル化合物の共重合や、セルロースアセテー
トフタレート、ヒドロキシプロピルメチルセ
ルロースフタレート,ヒドロキシプロピルメ
チルセルロースアセテートサクシネートなど
のセルロース誘導体など。
(b) スルホン酸基を含む重合体
酢酸ビニル−エチレンスルホン酸共重合
体,メタクリル酸メチル−アリルスルホン酸
共重合体,メタクリル酸メチル−スチレンス
ルホン酸、,メタクリル酸メチル−2−スル
ホエチルアクリレート共重合体,アクリル酸
メチル−2−スルホエチルメタクリレート共
重合体,スチレン−2−アクリルアミド−2
−メチルプロパンスルホン酸共重合体など。
(c) リン酸基を含む重合体
メタクリル酸メチル−2−ヒドロキシエチ
ルアクリロイルホスフエート共重合体、メタ
クリル酸メチル−2−ヒドロキシエチルメタ
クリロイルホスフエート共重合体などがあ
る。
(3) アミン化合物
本発明において有効なアミン化合物は、組成
物のアルカリ現像性や感度、解像力などの写真
性能および減力性の経時変化の防止という本発
明の目的を達成するために、特に下記一般式で
示されるアミン化合物に限定する必要がある。[Formula] (In the formula, R 1 and R 2 are alkyl groups having 1 to 3 carbon atoms, R 3
represents an alkyl group having 1 to 6 carbon atoms, and R 4 and R 5 represent an alkyl group having 3 to 6 carbon atoms. Contains (4) a photoinitiator and (5) a polymerizable monomer. ,
Absorbance within the active light range is 0.4~ per 1μ thickness
This is a photosensitive composition for lithographic film that can be subjected to stress reduction treatment, and is characterized in that it has a viscosity of 4.0. Each composition of the photosensitive composition of the present invention will be explained in detail below. (1) Actinic ray absorber In addition to the photoinitiator described below, a compound effective in absorbing rays in the wavelength range to which the photosensitive composition of the present invention is sensitive, that is, actinic rays, can be added to form a lithographic film. In this case, an image that is opaque to imagewise actinic radiation is formed. By increasing the absorption of actinic rays, in the image area exposed through the transparent part of the mask, only the upper layer undergoes a curing reaction, while the lower layer remains uncured. In this manner, by retaining the uncured lower layer portion, the force reducing property, which is an advantageous characteristic for use as a plate-making film, is maintained. The active light absorbers used include ultraviolet absorbers, ultraviolet absorbing dyes, and other dyes and pigments, and the ingredients and blending amounts are determined so that the absorbance within the active light range is 0.4 to 4.0 per 1 μm of thickness. You can choose as appropriate. Examples of these include powders of compounds such as carbon black, titanium oxide, iron oxide, various metals and metal oxides, and sulfides, pigment black (CI50440), chrome yellow light (CI77603), 2,2'-dihydroxy-
4-methoxybenzophenone, 2,4-dihydroxybezophenone, hydroxyphenylbenzotriazole, 2-(2'-hydroxy-5'-
methoxyphenyl) benzotriazole, resorcinol monobenzoate, ethyl-2-cyano-3,3-diphenyl acrylate, toluidine yellow GW (CI71680), molybdenum orange (CI77605), Sudan yellow (C.
I.30), oil orange (CI12055), etc. In particular, carbon black is desirable in order to achieve the same black color as conventional silver salts. Furthermore, when using a non-colored ultraviolet absorber, it is better to add dyes or pigments because the image area is difficult to see. In the case of inorganic/organic pigments, metals, and metal compounds, it is necessary to make them into fine particles by physical or chemical methods. (2) Polymeric binder The polymeric binder useful in the present invention is an organic polymer that is soluble in a solvent and is fixed at temperatures below 50°C, and that has a carboxylic acid group or a sulfonic acid group in its molecule. It is a polymer having one or more groups such as a group or a phosphate group. The amount of such acid groups is preferably in the range of 1 to 4 equivalents per kg of polymer, and by using such a polymer, the resulting image duplicating material can be denatured or weakened in an alkaline aqueous solution. Examples of such polymers include: (a) Polymers containing carboxylic acid groups Methyl methacrylate-methacrylic acid copolymer, methyl methacrylate-butyl methacrylate-acrylic acid copolymer, methyl acrylate-acrylic acid Acid copolymer, vinyl acetate-methacrylic acid copolymer, vinylidene chloride-itaconic acid copolymer, styrene-aleic acid copolymer, styrene-maleic acid monobutyl ester copolymer, acrylonitrile-vinyl acetic acid copolymer and Copolymerization of vinyl compounds containing carboxylic acids such as acrylic acid, methacrylic acid, itaconic acid, vinyl acetic acid, and maleic acid with other vinyl compounds, cellulose acetate phthalate, hydroxypropyl methyl cellulose phthalate, hydroxypropyl methyl cellulose acetate succinate, etc. cellulose derivatives, etc. (b) Polymers containing sulfonic acid groups Vinyl acetate-ethylene sulfonic acid copolymer, methyl methacrylate-allylsulfonic acid copolymer, methyl methacrylate-styrene sulfonic acid, methyl methacrylate-2-sulfoethyl acrylate copolymer Polymer, methyl acrylate-2-sulfoethyl methacrylate copolymer, styrene-2-acrylamide-2
-Methylpropanesulfonic acid copolymer, etc. (c) Polymers containing phosphoric acid groups Examples include methyl methacrylate-2-hydroxyethyl acryloyl phosphate copolymer and methyl methacrylate-2-hydroxyethyl methacryloyl phosphate copolymer. (3) Amine compounds In order to achieve the purpose of the present invention of preventing changes over time in photographic performance such as alkaline developability, sensitivity, and resolving power of the composition, and in reducing power, the amine compounds that are effective in the present invention are particularly those listed below. It is necessary to limit it to amine compounds represented by the general formula.
【式】または[expression] or
次に、下記組成物を混合分散させた感光性組成
物を調整し、リバースコーターにより下記下引き
層を設けたポリエステルフイルム上にそれぞれコ
ーテイングし、厚さ3μの感光層を被覆した。
〔重合体状結合剤(メタクリル酸メチルとメタク
リル酸との共重合体)(モル比77/23) 39部
2,2′−ビス(2−クロロフエニル)−4,4′,
5,5′−テトラフエニルビイミダゾール 8部
ミヒラーケトン 3部
トリメチロールプロパントリアクリレート 31部
2−メルカプトベンゾチアゾール 1部
カーボンブラツク 18部
メタノール 280部
酢酸エチル 80部
クロロホルム 40部
表1に示すアミン化合物
重合体状結合剤のカルボン酸と当モル量〕
さらに、このフイルム上に下記の組成からなる
保護層用組成物を同様にコーテイングし、厚さ
1μの保護層を有するリスフイルム生版を作製し
た。
〔ポリビニルアルコール(ケン化度98.5%、重合
度500) 5部
ノイゲンEA−140(第一工業製薬製) 0.2部
メタノール 5部
水 90部〕
得られたリスフイルム正版に、21段ステツプガ
イド(大日本スクリーン社製)と150/in、網
点面積率40%の平網画像を組合わせたテスト用ネ
ガフイルムを重ね、3KW明室プリンター(ORC
社製)を用い、15秒間画像露光を行つた。次に水
洗で保護層を除いた後に、試料に応じ30℃に調節
した0.75%Na2Co3水溶液に所定時間(白ヌケ時
間)浸漬後、水洗下、スポンジで擦りながら現像
し乾燥することにより反転画像を得た。ステツプ
ガイドの5段まで硬化しており、網点はネガをよ
く再現していることが判つた。
次に同様にして作つた複製網点画像を、30℃に
保つたハイドロキノンの5%水溶液に15秒間浸漬
後、水洗、乾燥処理した。
かくして得られた試料につき、下記する如く、
減力性のテストを実施した。
(1) まず、校正版焼付を想定し、試料の裏面より
明室プリンターにより80mJ/cm2の露光を与え
る。同一種の試料につき2枚の同様の処理を施
したものを準備する。内1枚を経時0日の試料
として、直ちに下記(2)の減力操作を施し、他の
1枚を20℃、65%の室内暗所に保存し、14日後
に減力操作を施して経時変化を見た。
(2) 減力液として、リン酸カリウムとリン酸水素
アンモニウムナトリウムの混合水溶液(重量比
で1:1)を準備し、この液に各試料を30秒間
浸して後水切りした。水洗ライトテーブル上
で、スポンジにて擦りを与えて後水洗し、乾燥
した。得られた試料の減力%(減力前の網点面
積率(%)と減力後の網点面積率(%)との差
で示す。)を網点面積計(大日本スクリーン製
DT−10)にて測定する。得られた結果を以下
表1に示す。
Next, a photosensitive composition was prepared by mixing and dispersing the following compositions, and each of the photosensitive compositions was coated using a reverse coater onto a polyester film provided with the following undercoat layer to form a photosensitive layer having a thickness of 3 μm. [Polymeric binder (copolymer of methyl methacrylate and methacrylic acid) (molar ratio 77/23) 39 parts 2,2'-bis(2-chlorophenyl)-4,4',
5,5'-Tetraphenylbiimidazole 8 parts Michler's ketone 3 parts Trimethylolpropane triacrylate 31 parts 2-mercaptobenzothiazole 1 part Carbon black 18 parts Methanol 280 parts Ethyl acetate 80 parts Chloroform 40 parts Amine compound shown in Table 1 Equivalent molar amount to the carboxylic acid of the combined binder] Furthermore, a protective layer composition having the composition shown below was coated on this film in the same manner, and the thickness
A Lithfilm green plate with a 1 μm protective layer was prepared. [Polyvinyl alcohol (degree of saponification 98.5%, degree of polymerization 500) 5 parts Neugen EA-140 (manufactured by Daiichi Kogyo Seiyaku) 0.2 parts methanol 5 parts water 90 parts] A 21-step step guide (large (manufactured by Nippon Screen Co., Ltd.) and a test negative film that combines a 150/in, flat-tone image with a dot area ratio of 40%, and a 3KW light room printer (ORC).
Image exposure was performed for 15 seconds. Next, after removing the protective layer by washing with water, the sample is immersed in a 0.75% Na 2 Co 3 aqueous solution adjusted to 30°C for a predetermined time (white-out time), then washed with water, developed while rubbing with a sponge, and dried. A reversed image was obtained. It was found that up to the 5th stage of the step guide was cured, and the halftone dots reproduced the negative well. Next, a duplicate halftone image made in the same manner was immersed for 15 seconds in a 5% aqueous solution of hydroquinone kept at 30°C, washed with water, and dried. Regarding the sample thus obtained, as described below,
A force reduction test was conducted. (1) First, assuming printing of a proof plate, expose the sample to 80 mJ/cm 2 from the back side using a bright room printer. Prepare two similarly treated samples of the same type. One of the sheets was used as a sample after 0 days of aging, and the force reduction operation described in (2) below was immediately applied. I looked at the changes over time. (2) A mixed aqueous solution of potassium phosphate and sodium ammonium hydrogen phosphate (1:1 by weight) was prepared as a reducing solution, and each sample was immersed in this solution for 30 seconds and then drained. It was rubbed with a sponge on a washing light table, washed with water, and dried. The % reduction (indicated by the difference between the halftone area ratio (%) before reduction and the halftone area ratio (%) after reduction) of the obtained sample was measured using a dot area meter (manufactured by Dainippon Screen).
Measure with DT-10). The results obtained are shown in Table 1 below.
【表】【table】
さらに実施例1と同様に保護層をコーテイング
し、得られたリスフイルムについて、減力性のテ
ストを行なつた。ただし露光量はステツプガイド
が5段硬化となるように調節した。得られた結果
を表2にまとめて示す。
Furthermore, a protective layer was coated in the same manner as in Example 1, and the resulting lithium film was subjected to a stress reducing property test. However, the exposure amount was adjusted so that the step guide was cured in five steps. The obtained results are summarized in Table 2.
【表】【table】
【表】
表2より明らかなように、本発明のアミン化合
物を用いる限り、重合体状結合剤として分子中に
カルボン酸基、スルホン酸基またはリン酸基のう
ちいずれを有していても、得られたリスフイルム
の減力%が維持されていることが判る。[Table] As is clear from Table 2, as long as the amine compound of the present invention is used, no matter which one of a carboxylic acid group, a sulfonic acid group, or a phosphoric acid group is contained in the molecule as a polymeric binder, It can be seen that the % reduction in force of the obtained lithium film is maintained.
Claims (1)
ルボン酸基、スルホン酸基またはリン酸基の一種
以上の基を有する重合体状結合剤、(3)下記一般式 【式】又は【式】 (式中R1、R2は炭素数1〜3のアルキル基、R3
は炭素数1〜6のアルキル基、R4、R5は炭素数
3〜6のアルキル基をあらわす) であらわされるアミン化合物、 (4)光開始剤および(5)重合可能な単量体を含み、
厚さ1μあたり活性光線範囲内での吸光度が0.4〜
4.0であることを特徴とする減力処理し得るリス
フイルム用感光性組成物。[Scope of Claims] 1 At least (1) an actinic ray absorber, (2) a polymeric binder having one or more of carboxylic acid groups, sulfonic acid groups, or phosphoric acid groups in the molecule; (3) the following: General formula [Formula] or [Formula] (In the formula, R 1 and R 2 are alkyl groups having 1 to 3 carbon atoms, R 3
represents an alkyl group having 1 to 6 carbon atoms, R 4 and R 5 represent an alkyl group having 3 to 6 carbon atoms, (4) a photoinitiator, and (5) a polymerizable monomer. including,
Absorbance within the active light range is 0.4~ per 1μ thickness
4.0 A photosensitive composition for lithographic film which can be subjected to force reduction treatment.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59031095A JPS60175044A (en) | 1984-02-20 | 1984-02-20 | Photosensitive composition for duplicating picture image |
DE19853508820 DE3508820A1 (en) | 1984-02-20 | 1985-03-13 | Light-sensitive composition or preparation for an image reproduction material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59031095A JPS60175044A (en) | 1984-02-20 | 1984-02-20 | Photosensitive composition for duplicating picture image |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60175044A JPS60175044A (en) | 1985-09-09 |
JPH0369097B2 true JPH0369097B2 (en) | 1991-10-30 |
Family
ID=12321835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59031095A Granted JPS60175044A (en) | 1984-02-20 | 1984-02-20 | Photosensitive composition for duplicating picture image |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS60175044A (en) |
DE (1) | DE3508820A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61174541A (en) * | 1985-01-29 | 1986-08-06 | Toyobo Co Ltd | Sensitive composition for image reproducing material |
DE3588111T2 (en) * | 1985-06-29 | 1996-10-31 | Dainippon Ink & Chemicals | Plastic composition for solder protection ink |
JP2639728B2 (en) * | 1989-04-27 | 1997-08-13 | 富士写真フイルム株式会社 | Photosensitive lithographic printing plate |
AU660402B1 (en) * | 1994-01-25 | 1995-06-22 | Morton International, Inc. | Waterborne photoresists having binders with sulfonic acid functionality |
WO2001025288A1 (en) * | 1999-10-01 | 2001-04-12 | Ballina Pty Ltd | Radiation polymerisable compositions |
JP4691211B2 (en) * | 2009-07-01 | 2011-06-01 | 積水化学工業株式会社 | Binder resin for conductive paste, conductive paste and solar cell element |
CN104317164B (en) * | 2009-12-11 | 2018-03-30 | 富士胶片株式会社 | Black curable composition |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5034963A (en) * | 1973-07-27 | 1975-04-03 | ||
JPS54147031A (en) * | 1978-05-11 | 1979-11-16 | Toray Industries | Photosensitive material |
JPS5868740A (en) * | 1981-10-21 | 1983-04-23 | Japan Synthetic Rubber Co Ltd | Photoresist laminate of heat resistant film |
JPS5872138A (en) * | 1981-10-02 | 1983-04-30 | イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− | Photopolymerizing composition |
-
1984
- 1984-02-20 JP JP59031095A patent/JPS60175044A/en active Granted
-
1985
- 1985-03-13 DE DE19853508820 patent/DE3508820A1/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5034963A (en) * | 1973-07-27 | 1975-04-03 | ||
JPS54147031A (en) * | 1978-05-11 | 1979-11-16 | Toray Industries | Photosensitive material |
JPS5872138A (en) * | 1981-10-02 | 1983-04-30 | イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− | Photopolymerizing composition |
JPS5868740A (en) * | 1981-10-21 | 1983-04-23 | Japan Synthetic Rubber Co Ltd | Photoresist laminate of heat resistant film |
Also Published As
Publication number | Publication date |
---|---|
JPS60175044A (en) | 1985-09-09 |
DE3508820A1 (en) | 1986-09-18 |
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