JPS58202444A - 感光材料処理装置 - Google Patents

感光材料処理装置

Info

Publication number
JPS58202444A
JPS58202444A JP8538282A JP8538282A JPS58202444A JP S58202444 A JPS58202444 A JP S58202444A JP 8538282 A JP8538282 A JP 8538282A JP 8538282 A JP8538282 A JP 8538282A JP S58202444 A JPS58202444 A JP S58202444A
Authority
JP
Japan
Prior art keywords
processing
plate
soln
photosensitive material
processing liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8538282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0234381B2 (cs
Inventor
Takeshi Nakamura
武 中村
Goro Tezuka
手塚　五郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP8538282A priority Critical patent/JPS58202444A/ja
Publication of JPS58202444A publication Critical patent/JPS58202444A/ja
Publication of JPH0234381B2 publication Critical patent/JPH0234381B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D5/00—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected
    • G03D5/04—Liquid processing apparatus in which no immersion is effected; Washing apparatus in which no immersion is effected using liquid sprays

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8538282A 1982-05-20 1982-05-20 感光材料処理装置 Granted JPS58202444A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8538282A JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Publications (2)

Publication Number Publication Date
JPS58202444A true JPS58202444A (ja) 1983-11-25
JPH0234381B2 JPH0234381B2 (cs) 1990-08-02

Family

ID=13857183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8538282A Granted JPS58202444A (ja) 1982-05-20 1982-05-20 感光材料処理装置

Country Status (1)

Country Link
JP (1) JPS58202444A (cs)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141249U (ja) * 1984-08-18 1986-03-15 コニカ株式会社 感光材料処理装置
WO1999032939A1 (en) * 1997-12-22 1999-07-01 Asahi Kasei Kogyo Kabushiki Kaisha Method of developing photosensitive resin plate and developing device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366301U (cs) * 1976-11-05 1978-06-03
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5366301U (cs) * 1976-11-05 1978-06-03
JPS54113265A (en) * 1978-02-23 1979-09-04 Mitsubishi Electric Corp Resistor developing equipement

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6141249U (ja) * 1984-08-18 1986-03-15 コニカ株式会社 感光材料処理装置
WO1999032939A1 (en) * 1997-12-22 1999-07-01 Asahi Kasei Kogyo Kabushiki Kaisha Method of developing photosensitive resin plate and developing device
AU731539B2 (en) * 1997-12-22 2001-03-29 Asahi Kasei Kabushiki Kaisha Method of developing photosensitive resin plate and developing apparatus
US6270267B1 (en) 1997-12-22 2001-08-07 Asahi Kasei Kabushiki Kaisha Method of developing photosensitive resin plate and developing device

Also Published As

Publication number Publication date
JPH0234381B2 (cs) 1990-08-02

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