JPS58189370A - スパツタ装置 - Google Patents
スパツタ装置Info
- Publication number
- JPS58189370A JPS58189370A JP7024582A JP7024582A JPS58189370A JP S58189370 A JPS58189370 A JP S58189370A JP 7024582 A JP7024582 A JP 7024582A JP 7024582 A JP7024582 A JP 7024582A JP S58189370 A JPS58189370 A JP S58189370A
- Authority
- JP
- Japan
- Prior art keywords
- target
- sputtering
- magnetic field
- magnetic
- generating means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 54
- 239000000696 magnetic material Substances 0.000 claims abstract description 12
- 230000035699 permeability Effects 0.000 claims abstract description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000003292 glue Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 8
- 239000010409 thin film Substances 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 8
- 150000002500 ions Chemical class 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910000976 Electrical steel Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000012827 research and development Methods 0.000 description 2
- 241001062872 Cleyera japonica Species 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 235000019013 Viburnum opulus Nutrition 0.000 description 1
- 244000071378 Viburnum opulus Species 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 210000003746 feather Anatomy 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 210000004907 gland Anatomy 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7024582A JPS58189370A (ja) | 1982-04-28 | 1982-04-28 | スパツタ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7024582A JPS58189370A (ja) | 1982-04-28 | 1982-04-28 | スパツタ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58189370A true JPS58189370A (ja) | 1983-11-05 |
| JPS6343465B2 JPS6343465B2 (enrdf_load_stackoverflow) | 1988-08-30 |
Family
ID=13425982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7024582A Granted JPS58189370A (ja) | 1982-04-28 | 1982-04-28 | スパツタ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58189370A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014632A (zh) * | 2011-09-26 | 2013-04-03 | 中国科学院金属研究所 | 一种电弧离子镀铁磁性复合结构靶材及其应用 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5347384A (en) * | 1976-10-13 | 1978-04-27 | Nec Corp | Sputtering apparatus |
-
1982
- 1982-04-28 JP JP7024582A patent/JPS58189370A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5347384A (en) * | 1976-10-13 | 1978-04-27 | Nec Corp | Sputtering apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103014632A (zh) * | 2011-09-26 | 2013-04-03 | 中国科学院金属研究所 | 一种电弧离子镀铁磁性复合结构靶材及其应用 |
| CN103014632B (zh) * | 2011-09-26 | 2015-12-09 | 中国科学院金属研究所 | 一种电弧离子镀铁磁性复合结构靶材及其应用 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6343465B2 (enrdf_load_stackoverflow) | 1988-08-30 |
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