JPS5347384A - Sputtering apparatus - Google Patents
Sputtering apparatusInfo
- Publication number
- JPS5347384A JPS5347384A JP12264476A JP12264476A JPS5347384A JP S5347384 A JPS5347384 A JP S5347384A JP 12264476 A JP12264476 A JP 12264476A JP 12264476 A JP12264476 A JP 12264476A JP S5347384 A JPS5347384 A JP S5347384A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- target
- sputtering apparatus
- driving source
- offer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Abstract
PURPOSE:To offer the sputtering apparatus capable of homogeneous consumption of the target, by moving the relative positions of the cathode and the target on this cathode with the driving source installed outside the vacuum tank and the sweep mechanism for transmitting the movement from the driving source to the target or the cathode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12264476A JPS5347384A (en) | 1976-10-13 | 1976-10-13 | Sputtering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12264476A JPS5347384A (en) | 1976-10-13 | 1976-10-13 | Sputtering apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5347384A true JPS5347384A (en) | 1978-04-27 |
Family
ID=14841062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12264476A Pending JPS5347384A (en) | 1976-10-13 | 1976-10-13 | Sputtering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5347384A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5567166U (en) * | 1978-10-30 | 1980-05-09 | ||
JPS58189370A (en) * | 1982-04-28 | 1983-11-05 | Teijin Ltd | Sputtering device |
JPS6134177A (en) * | 1984-07-25 | 1986-02-18 | Tokuda Seisakusho Ltd | Magnet driving device |
JPS6198864U (en) * | 1984-12-05 | 1986-06-24 |
-
1976
- 1976-10-13 JP JP12264476A patent/JPS5347384A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5567166U (en) * | 1978-10-30 | 1980-05-09 | ||
JPS58189370A (en) * | 1982-04-28 | 1983-11-05 | Teijin Ltd | Sputtering device |
JPS6343465B2 (en) * | 1982-04-28 | 1988-08-30 | Teijin Ltd | |
JPS6134177A (en) * | 1984-07-25 | 1986-02-18 | Tokuda Seisakusho Ltd | Magnet driving device |
JPS6198864U (en) * | 1984-12-05 | 1986-06-24 |
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