JPS58187923A - 放射線感応性レジスト材を用いる微細加工法 - Google Patents

放射線感応性レジスト材を用いる微細加工法

Info

Publication number
JPS58187923A
JPS58187923A JP7048382A JP7048382A JPS58187923A JP S58187923 A JPS58187923 A JP S58187923A JP 7048382 A JP7048382 A JP 7048382A JP 7048382 A JP7048382 A JP 7048382A JP S58187923 A JPS58187923 A JP S58187923A
Authority
JP
Japan
Prior art keywords
resist material
polymer
vinyltoluene
resist
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7048382A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360894B2 (cg-RX-API-DMAC7.html
Inventor
Sanjiyu Fukuda
三寿 福田
Makoto Fukutomi
福富 誠
Osamu Kogure
小暮 攻
Kazunari Miyoshi
三好 一功
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Toyo Soda Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Toyo Soda Manufacturing Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7048382A priority Critical patent/JPS58187923A/ja
Publication of JPS58187923A publication Critical patent/JPS58187923A/ja
Publication of JPS6360894B2 publication Critical patent/JPS6360894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP7048382A 1982-04-28 1982-04-28 放射線感応性レジスト材を用いる微細加工法 Granted JPS58187923A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7048382A JPS58187923A (ja) 1982-04-28 1982-04-28 放射線感応性レジスト材を用いる微細加工法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7048382A JPS58187923A (ja) 1982-04-28 1982-04-28 放射線感応性レジスト材を用いる微細加工法

Publications (2)

Publication Number Publication Date
JPS58187923A true JPS58187923A (ja) 1983-11-02
JPS6360894B2 JPS6360894B2 (cg-RX-API-DMAC7.html) 1988-11-25

Family

ID=13432807

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7048382A Granted JPS58187923A (ja) 1982-04-28 1982-04-28 放射線感応性レジスト材を用いる微細加工法

Country Status (1)

Country Link
JP (1) JPS58187923A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988733A (ja) * 1982-11-13 1984-05-22 Japan Synthetic Rubber Co Ltd 電離放射線感応性材料の製法
JPS60212755A (ja) * 1984-04-06 1985-10-25 Toray Ind Inc 感放射線材料

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817105A (ja) * 1981-07-24 1983-02-01 Japan Synthetic Rubber Co Ltd 電離放射線感応性材料

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817105A (ja) * 1981-07-24 1983-02-01 Japan Synthetic Rubber Co Ltd 電離放射線感応性材料

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5988733A (ja) * 1982-11-13 1984-05-22 Japan Synthetic Rubber Co Ltd 電離放射線感応性材料の製法
JPS60212755A (ja) * 1984-04-06 1985-10-25 Toray Ind Inc 感放射線材料

Also Published As

Publication number Publication date
JPS6360894B2 (cg-RX-API-DMAC7.html) 1988-11-25

Similar Documents

Publication Publication Date Title
US4405708A (en) Method of applying a resist pattern on a substrate, and resist material mixture
JPS58187923A (ja) 放射線感応性レジスト材を用いる微細加工法
Hartney et al. Lithographic evaluation and processing of chlorinated polymethylstyrene
JPS63216044A (ja) パタ−ン形成材料
JPS62240953A (ja) レジスト
EP0051320B1 (en) Radiation-sensitive negative resist
JPS5979247A (ja) 遠紫外線または電子線感応用レジスト
JPS61294433A (ja) 高解像度感光性樹脂組成物およびこれを使用するサブミクロンパタ−ンの製造方法
JPS5817105A (ja) 電離放射線感応性材料
JPS6374050A (ja) 放射線感応性レジスト材料および微細加工方法
JPS6260691B2 (cg-RX-API-DMAC7.html)
JPS647375B2 (cg-RX-API-DMAC7.html)
JPH052141B2 (cg-RX-API-DMAC7.html)
JPS6091350A (ja) 電離放射線感応ネガ型レジスト
JPS6259950A (ja) 電離放射線感応ポジ型レジスト
JPS5857734B2 (ja) 皮膜形成方法法
JPS59192245A (ja) レジスト材料
JPH033214B2 (cg-RX-API-DMAC7.html)
JPS61160742A (ja) レジストの現像液
JPS595245A (ja) レジストパタ−ン形成方法
JPS6058462B2 (ja) ネガ型レジスト材料
JPS61149947A (ja) レジスト材料
Pethrick Influence of polymer structure on electron beam resist behaviour
JPH0542659B2 (cg-RX-API-DMAC7.html)
JPS60212755A (ja) 感放射線材料